The present invention relates to improvements to an induction smelting process. It relates to a hybrid combination of plasma over induction for a superefficient continuous smelting process; and real-time monitoring and adjustment of the smelting process. Disclosed is a hybrid smelting system comprising a real-time controller and a reduction zone in which plasma over induction heating continuously smelt feed material(s) fed into the reduction zone. Slag and reduced metals (alloy) are discharged under supervision of the real-time controller.

Flicker values to be expected may be determined and achieve a high probability from suitable state and operating variables which are acquired during the first minutes in the initial smelting phase. In this way, flicker can effectively be reduced and kept below predefined limiting values. This is in particular suitable during steel production using electric arc furnaces.

A dual annealing apparatus and use thereof for precision annealing of an article are provided. In one aspect, an annealing apparatus includes: a first heating plate opposite a second heating plate; a first cooling source associated with the first heating plate; and a second cooling source associated with the second heating plate, wherein the first heating plate and the second heating plate are independently controllable, and wherein the first cooling source and the second cooling source are independently controllable. A method for annealing an article using the annealing apparatus is also provided.

A method includes supporting a wafer on a heating element, wherein the heating element is located in a baking chamber. The method further includes heating the wafer for a first duration using the heating element. The method further includes measuring a temperature of the heating element and a temperature of the wafer during the first duration to obtain temperature information. The method further includes adjusting an amount of heat provided by the heating element during the first duration, wherein the adjusting of the amount of heat includes decreasing the amount of heat provided by the heating element as a rate of change of the temperature information versus time increases.

At least one measurement value of a measurement variable characterizing the operating state of each of a plurality of system components that influence the operating conditions of an arc furnace is detected and compared to a respective currently permissible threshold value for the measurement variable. A maximum power that can be supplied to the arc furnace within a time window while satisfying all currently permissible threshold values is determined based on the result of the comparison.

An adaptive baking system includes a baking chamber configured to receive a wafer, and a heating element configured to support the wafer. The adaptive baking system further includes a controller configured to receive temperature information related to the heating element and the wafer, wherein the controller is further configured to adjust an amount of heat provided by the heating element during a baking process in response to the temperature information.

A control system for a vacuum arc remelting (VAR) process for a metal includes a direct current (DC) power source, a ram drive, voltage drip short sensor, and a controller, which includes a processor. The drip short sensor may be configured to measure a drip short frequency of the electric arc over a period of time. The controller is configured to determine a real time arc gap length between the electrode tip and the melt pool based on a correlation between the drip short frequency and arc gap length. The controller is further configured to control power input to the electrode by the DC power supply by determining an input power level to input to the electrode based on the real time arc gap length, the input power level configured to generate a desired arc gap length, by the DC power supply, at the input power level.

A controller includes a non-transitory computer readable medium configured to store information related to a target temperature of a wafer, a target temperature of a heating element, a temperature of the wafer, and a temperature of the heating element. The controller further includes a processor connected to the non-transitory computer readable medium, the processor configured to generate at least one heating signal during a baking process to adjust a duration of an entirety of the baking process in response to the temperature of the wafer and the temperature of the heating element.

A dual annealing apparatus and use thereof for precision annealing of an article are provided. In one aspect, an annealing apparatus includes: a first heating plate opposite a second heating plate; a first cooling source associated with the first heating plate; and a second cooling source associated with the second heating plate, wherein the first heating plate and the second heating plate are independently controllable, and wherein the first cooling source and the second cooling source are independently controllable. A method for annealing an article using the annealing apparatus is also provided.

A controller includes a non-transitory computer readable medium configured to store information related to a target temperature of a wafer, a target temperature of a heating element, a temperature of the wafer, and a temperature of the heating element. The controller further includes a processor connected to the non-transitory computer readable medium, the processor configured to generate at least one heating signal during a baking process to adjust a duration of an entirety of the baking process in response to the temperature of the wafer and the temperature of the heating element.