F17C2203/0648

HYDROGEN GAS STORAGE TANK

A hydrogen gas storage tank includes a body including a steel bulk region and a passivating metal oxide layer adjacent to the steel bulk region, the oxide layer comprising a number of metal oxide molecules, all having a morphology, wherein at least about 51 wt. % of the number of metal oxide molecules are Fe.sub.2O.sub.3 molecules having morphologies of (012), (001), and/or (110) surface facets such that the oxide layer is configured to lower hydrogen adsorption into the steel bulk region by at least 25% compared to a steel bulk region free from the passivating metal oxide layer.

SUPPLY CONTROL SYSTEM FOR A PLURALITY OF TANKS

A supply control system for a tank utilized in a semiconductor manufacturing process is disclosed. The supply control system for the tank according to an embodiment of the present disclosure includes a plurality of tanks for storing a large amount of process material used to manufacture a semiconductor; a main-supply pipe configured to communicate with sub-supply pipes respectively coupled to the plurality of tanks and to supply process material to a semiconductor manufacturing device; a plurality of flow control devices respectively included in the sub-supply pipes and configured to control a process material flow rate discharged from each of the plurality of tanks; a sensor included in the main-supply pipe and configured to measure in real time the process material flow rate and a process material supply pressure supplied from each of the plurality of tanks to the semiconductor manufacturing device; a back-up portion coupled to the main-supply pipe and configured to supplementally discharge stored process material, such that process material is stably supplied to the semiconductor manufacturing device; and a controller configured to control the plurality of flow control devices and the back-up portion based on information on the process material flow rate or information on the process material supply pressure measured by the sensor, such that a set process material flow rate is supplied to the semiconductor manufacturing device through the main-supply pipe.

CLADDING

Cladding of the interior of a component part of a pressure vessel is shown. A lining which conforms to at least a portion of the interior geometry of the component is positioned in the interior of the component. The lining is then pressed into the component past its yield strength. The lining is then fused to the component.

Pressure accumulation container

An accumulator vessel (10) includes a screwable portion (3) and a lid portion (2) that is positioned at an axially inner side of the screwable portion and an axially inner surface configures a pressure bearing plane. The lid portion includes a protruding portion (22) extending axially outward on an inner circumferential side, and the protruding portion configured to abut against an axially inner end side of the screwable portion to separate an axially inner surface of the screwable portion on an outer circumferential side thereof apart from an axially outer surface of the lid portion on an outer circumferential side thereof.

Storage tank
10962172 · 2021-03-30 · ·

A storage tank includes a frame, tank assembly, and scrubber system. The tank assembly including a vessel supported by the frame and having a first end, a second end, and a polygonal sidewall extending from the first end to the second end. The vessel further having a top, a bottom, at least one side, and an internal surface, and an outlet fluidly coupled with the bottom; and a chemical-resistant lining associated with the internal surface of the sidewall and being substantially flexible. A scrubber tank is supported by the frame and fluidly connected to the vessel to receive vapors from the vessel in a way that when a vapor absorption material is disposed in the scrubber tank, the vapors pass into the vapor absorption material.

POLYMORPHOUS RESERVOIR
20210033246 · 2021-02-04 · ·

A deformable reservoir for storing solid hydrogen, containing at least one compound that can absorb or release hydrogen, and wherein it includes at least two rigid bars each including a polymer liner defining at least one compartment for storing the compound and accommodated inside a reinforcing structure having globally the shape of a hollow cylinder closed at each of its longitudinal ends by a closing flange, a connection attached to the reinforcing structure of at least one of the bars so as to be sealed to the liner, a flexible union member joining two adjacent bars so as to allow the totality of the storage reservoir to be deformable in spite of the rigidity of each bar.

STORAGE TANK
20210215296 · 2021-07-15 ·

A storage tank includes a frame, tank assembly, and scrubber system. The tank assembly including a vessel supported by the frame and having a first end, a second end, and a sidewall extending from the first end to the second end. The vessel further has a top, a bottom, at least one side, an internal surface, and an outlet fluidly coupled with the bottom. A scrubber tank is supported by the frame and fluidly connected to the a top of the vessel to receive vapors from the vessel in a way that when a vapor absorption material is disposed in the scrubber tank, the vapors pass into the vapor absorption material.

High-pressure container
10900609 · 2021-01-26 · ·

A high-pressure container has a body part, and a cap inserted in the body part, and the body part has a cylindrical liner, and a reinforcement layer provided on an outer circumferential surface of the liner for reinforcing the liner. The cap has a contact portion that contacts with an inner circumferential surface of the liner, a through-hole that communicates the inside of the body part with the outside, and a projecting portion that is pressed outward in radial directions of the body part, and bites into the reinforcement layer, so as to inhibit the cap from moving in the axial direction.

Gas storage cylinder, deposition system, and method of manufacturing semiconductor device

A method of manufacturing a semiconductor device includes disposing a gas-storage cylinder storing monochlorosilane within a gas supply unit. The monochlorosilane is supplied from the gas-storage cylinder into a process chamber to form a silicon containing layer therein. The gas-storage cylinder includes manganese.

HIGH PRESSURE GAS CONTAINER
20200408360 · 2020-12-31 ·

In a high pressure gas container including a liner, a reinforcement layer, bosses (caps), and openings (vent holes), the reinforcement layer includes an inner side reinforcement layer that surrounds the liner, and an outer side reinforcement layer that surrounds the inner side reinforcement layer, gas guide passages that guide, to the openings (vent holes), a gas leaking from the liner are formed in the inner side reinforcement layer, and the gas guide passages are voids formed between sections of a reinforcing member by arranging alongside one another and stacking the sections of the reinforcing member along the liner.