Embodiments described herein relate generally to biosensing garments, and in particular, to systems and methods for monitoring respiration in a biosensing garment, whereby an improved integration of the respiration monitoring circuit into the garment is achieved, resulting in improved signal quality and durability. In some embodiments, an apparatus includes an elongate member having a longitudinal axis and configured to be stretchable along its longitudinal axis. The elongate member includes a plurality of elastic members (e.g., a first elastic member, a second elastic member, and a third elastic member) that extend along the longitudinal axis. A conductive member is coupled to the first, second and third members, and forms a “curved” pattern along the longitudinal axis of the elongate member. The conductive member is configured to change from a first configuration to a second configuration as the elongate member stretches along its longitudinal axis.

Embodiments described herein relate generally to biosensing garments, and in particular, to systems and methods for monitoring respiration in a biosensing garment, whereby an improved integration of the respiration monitoring circuit into the garment is achieved, resulting in improved signal quality and durability. In some embodiments, an apparatus includes an elongate member having a longitudinal axis and configured to be stretchable along its longitudinal axis. The elongate member includes a plurality of elastic members (e.g., a first elastic member, a second elastic member, and a third elastic member) that extend along the longitudinal axis. A conductive member is coupled to the first, second and third members, and forms a “curved” pattern along the longitudinal axis of the elongate member. The conductive member is configured to change from a first configuration to a second configuration as the elongate member stretches along its longitudinal axis.

A strain gauge includes a flexible resin substrate; a functional layer formed of a metal, an alloy, or a metal compound, directly on one surface of the substrate; a resistor formed of a film including Cr, CrN, and Cr.sub.2N, on one surface of the functional layer; and an insulating resin layer with which the resistor is coated.

A strain gauge includes a flexible substrate; a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate; a resistor formed of a Cr composite film, on one surface of the functional layer; and an insulating resin layer with which the resistor is coated.

A strain gauge includes a flexible substrate and a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being directly on one surface of the substrate. The strain gauge includes a resistor formed of a film that includes Cr, CrN, and Cr.sub.2N and that is formed with α-Cr as a main component. The functional layer includes a function of promoting crystal growth of α-Cr and forming an α-Cr based film.

A strain gauge includes a flexible substrate and a functional layer formed of a metal, an alloy, or a metal compound, the functional layer being directly on one surface of the substrate. The strain gauge includes a resistor formed of a film that includes Cr, CrN, and Cr.sub.2N and that is formed with α-Cr as a main component. The functional layer includes a function of promoting crystal growth of α-Cr and forming an α-Cr based film.

A device for detecting wear of a wear member composed of electrically resistive material. The wear member comprises at least two electrodes separated from each other, where each electrode overlies, or is embedded in, an outer surface of the electrically resistive material. One of the electrodes is connected to a resistor at a measurement node to form a resistive voltage divider. A voltage measurement device measures a change in voltage at the measurement node, where the change is voltage is indicative of the degree of removal of resistive material from a face of the wear member and where the change in voltage is continuously variable and not limited to discrete wear levels.

A strain gauge includes: a substrate; a transverse sensitive grid arranged on the substrate; and at least two non-transverse sensitive grids arranged on the substrate so as to be located on opposite sides of the transverse sensitive grid both electrically connected to the transverse sensitive grid. The two non-transverse sensitive grids are connected to each other by a connection and share a common ground lead and a common ground interface. One end of the ground lead is connected to the connection at the middle thereof. The other end of the ground lead is connected to the ground interface. The two non-transverse sensitive grids have equal resistances and are connected to ends of two respective non-ground leads having equal resistances. The other ends of the two non-ground leads are connected to two respective non-ground interfaces.

A strain gauge includes: a substrate; a transverse sensitive grid arranged on the substrate; and at least two non-transverse sensitive grids arranged on the substrate so as to be located on opposite sides of the transverse sensitive grid both electrically connected to the transverse sensitive grid. The two non-transverse sensitive grids are connected to each other by a connection and share a common ground lead and a common ground interface. One end of the ground lead is connected to the connection at the middle thereof. The other end of the ground lead is connected to the ground interface. The two non-transverse sensitive grids have equal resistances and are connected to ends of two respective non-ground leads having equal resistances. The other ends of the two non-ground leads are connected to two respective non-ground interfaces.

A sensor includes a base, and first and second resistance lines. The base extends in a direction intersecting with a central axis. The first resistance lines are arrayed in a circumferential direction on a surface of the base. The second resistance lines are arranged concentrically with the first resistance lines and between the first resistance lines in the circumferential direction on the surface of the base. In the first resistance lines, the number of regions of the resistance line along the circumferential direction is one or less, and the number of regions of the resistance line along a radial direction is one or less.