Patent classifications
G01B9/04
SYSTEMS AND METHODS FOR INTERFEROMETRIC MULTIFOCUS MICROSCOPY
A system to generate image representations includes a first objective that receives a first light beam emitted from a sample and a second objective that receives a second light beam emitted from the sample, where the first light beam and the second light beam have conjugate phase. The system also includes a first diffractive element to receive the first light beam and separate it into a first plurality of diffractive light beams that are spatially distinct, and a second diffractive element to receive the second light beam and separate it into a second plurality of diffractive light beams that are spatially distinct. The system further includes a detector that receives the first and second plurality of diffractive light beams. The first plurality of diffractive light beams and the second plurality of diffractive light beams are simultaneously directed and focused onto different portions of an image plane of the detector.
Imaging system
An imaging system is described for measuring the position or movement of a particle having a size of less than about 20 microns. The system comprises an optional sample holder configured to hold a sample with a particle, an optional illumination source configured to illuminate the sample, a lens having a magnification ratio from about 1:5 to about 5:1 and configured to generate the image of the sample, an image sensor having a pixel size of up to about 20 microns and configured to sense the image of the sample, and an image processor operatively connected to the image sensor to process the image of the particle in order to determine the position or movement of the particle. The dimension of the image of each particle is at least about 1.5 times the dimension of the particle multiplied by the magnification ratio of the lens, and the image of each particle is distributed on at least two pixels of the sensor. The imaged area of the sample is at least about one millimeter squared.
Imaging system
An imaging system is described for measuring the position or movement of a particle having a size of less than about 20 microns. The system comprises an optional sample holder configured to hold a sample with a particle, an optional illumination source configured to illuminate the sample, a lens having a magnification ratio from about 1:5 to about 5:1 and configured to generate the image of the sample, an image sensor having a pixel size of up to about 20 microns and configured to sense the image of the sample, and an image processor operatively connected to the image sensor to process the image of the particle in order to determine the position or movement of the particle. The dimension of the image of each particle is at least about 1.5 times the dimension of the particle multiplied by the magnification ratio of the lens, and the image of each particle is distributed on at least two pixels of the sensor. The imaged area of the sample is at least about one millimeter squared.
MEASUREMENT DEVICE EMPLOYING COLOR APPEARING DUE TO INTERFERENCE OF WHITE LIGHT, SYSTEM, AND PROGRAM
A device including: a storage section that stores information for measuring a light path difference of two light paths relating to interference of a white light, from a color appearing due to the interference; and a calculation section that measures, from an image configured by a plurality of pixels each including information representing a color, the light path difference relating to each of the pixels, based on at least the information stored in the storage section.
Arrangement and Method for Robust Single-Shot Interferometry
The present invention relates to an arrangement and a method for single-shot interferometry which can be used for detecting distance, profile, shape, undulation, roughness or the optical path length in or on optically rough or smooth objects or else for optical coherence tomography (OCT). The arrangement comprises a light source, an interferometer, in which an end reflector is arranged in the reference beam path, and also a detector for detecting an interferogram. In the reference beam path of the interferometer, the end reflector can be embodied with three plane reflecting surfaces as a prism mirror or air mirror assembly in order to generate between reference and object beams a lateral shear of magnitude delta_q for obtaining a spatial interferogram. The embodiment of said assembly with regard to the angles and the arrangement of the reflecting surfaces makes possible a large aperture angle for a high numerical aperture. In the method, in the reference beam path it is possible to carry out a reduction of the aperture angle of the reference beam using beam-limiting means in order to achieve an optimum adaptation to the geometrically given aperture angle of the end reflector in the reference beam path, which is designed to be smaller than the aperture angle in the object beam path. The end reflector in the reference beam path can also be used as part of a second interferometer for high-resolution measurement of the displacement of the arrangement for single-shot interferometry, wherein said displacement serves for focusing. The end reflector is embodied as a triple reflection arrangement (e.g. a prism arrangement) having three reflecting surfaces. The triple reflection arrangement can have an M- or W-beam path, a non-intersecting zigzag beam path or an intersecting (zigzag) beam path.
IMAGING SYSTEM
An imaging system is described for measuring the position or movement of a particle having a size of less than about 20 microns. The system comprises an optional sample holder configured to hold a sample with a particle, an optional illumination source configured to illuminate the sample, a lens having a magnification ratio from about 1:5 to about 5:1 and configured to generate the image of the sample, an image sensor having a pixel size of up to about 20 microns and configured to sense the image of the sample, and an image processor operatively connected to the image sensor to process the image of the particle in order to determine the position or movement of the particle. The dimension of the image of each particle is at least about 1.5 times the dimension of the particle multiplied by the magnification ratio of the lens, and the image of each particle is distributed on at least two pixels of the sensor. The imaged area of the sample is at least about one millimeter squared.
IMAGING SYSTEM
An imaging system is described for measuring the position or movement of a particle having a size of less than about 20 microns. The system comprises an optional sample holder configured to hold a sample with a particle, an optional illumination source configured to illuminate the sample, a lens having a magnification ratio from about 1:5 to about 5:1 and configured to generate the image of the sample, an image sensor having a pixel size of up to about 20 microns and configured to sense the image of the sample, and an image processor operatively connected to the image sensor to process the image of the particle in order to determine the position or movement of the particle. The dimension of the image of each particle is at least about 1.5 times the dimension of the particle multiplied by the magnification ratio of the lens, and the image of each particle is distributed on at least two pixels of the sensor. The imaged area of the sample is at least about one millimeter squared.
Data processing device for scanning probe microscope
A data processing device for a scanning probe microscope, the data processing device processing biaxial data indicating a change in a second physical quantity with respect to a change in a first physical quantity, the biaxial data being acquired for each of a plurality of measurement points on a sample surface by scanning the sample surface with a probe using a scanning probe microscope, the data processing device includes: a feature amount calculator 41 that acquires one or a plurality of types of feature amounts from the biaxial data at each measurement point; a feature amount selector 42 that causes a user to select one of the one or the plurality of types of feature amounts; a two-dimensional mapping image display unit 43 that displays the feature amount on a screen as a two-dimensional mapping image with each measurement point as one pixel based on selection of the feature amount by the user; and a biaxial data display unit 44 that, when the user selects one of the pixels in the two-dimensional mapping image, displays on the screen the selected pixel and the biaxial data of the measurement point corresponding to one or a plurality of pixels adjacent to the selected pixel.
Data processing device for scanning probe microscope
A data processing device for a scanning probe microscope, the data processing device processing biaxial data indicating a change in a second physical quantity with respect to a change in a first physical quantity, the biaxial data being acquired for each of a plurality of measurement points on a sample surface by scanning the sample surface with a probe using a scanning probe microscope, the data processing device includes: a feature amount calculator 41 that acquires one or a plurality of types of feature amounts from the biaxial data at each measurement point; a feature amount selector 42 that causes a user to select one of the one or the plurality of types of feature amounts; a two-dimensional mapping image display unit 43 that displays the feature amount on a screen as a two-dimensional mapping image with each measurement point as one pixel based on selection of the feature amount by the user; and a biaxial data display unit 44 that, when the user selects one of the pixels in the two-dimensional mapping image, displays on the screen the selected pixel and the biaxial data of the measurement point corresponding to one or a plurality of pixels adjacent to the selected pixel.
PROCESS AND SYSTEM FOR SIZING TWO-DIMENSIONAL NANOSTRUCTURES
A process for sizing two-dimensional nanostructures includes providing the nanostructures to a liquid-liquid interface, providing probe particles to the liquid-liquid interface, obtaining an image of the nanostructures and the probe particles, and processing the image to ascertain a size property of the nanostructures.