Patent classifications
G01B9/04
SYSTEM AND METHOD FOR SUPER-RESOLUTION FULL-FIELD OPTICAL METROLOGY ON THE FAR-FIELD NANOMETRE SCALE
A system of super-resolution full-field optical metrology for delivering information on the surface topography of a sample or object on the far-field nanometre scale, including a light source, an interferometer (1a, 1b, 1c, 1d) including a reference arm incorporating a micro bead and a mirror, an object arm including a micro bead similar to the micro bead and arranged in immediate proximity to the surface of the object, receiving structure for capturing the interference figures, and a processor for processing these interference figures in such a way as to produce surface topography information. The light source is temporally coherent or partially coherent. The interferometer and the processor for processing interference figures are designed to reconstruct the surface of the object by phase shifting interferometry.
SYSTEM AND METHOD FOR SUPER-RESOLUTION FULL-FIELD OPTICAL METROLOGY ON THE FAR-FIELD NANOMETRE SCALE
A system of super-resolution full-field optical metrology for delivering information on the surface topography of a sample or object on the far-field nanometre scale, including a light source, an interferometer (1a, 1b, 1c, 1d) including a reference arm incorporating a micro bead and a mirror, an object arm including a micro bead similar to the micro bead and arranged in immediate proximity to the surface of the object, receiving structure for capturing the interference figures, and a processor for processing these interference figures in such a way as to produce surface topography information. The light source is temporally coherent or partially coherent. The interferometer and the processor for processing interference figures are designed to reconstruct the surface of the object by phase shifting interferometry.
Coherent fluorescence super-resolution microscopy
A microscopy system which includes a light source for illuminating a sample; an objective lens for capturing light emitted from the illuminated sample to form a signal beam; and a dispersive optical element through which the signal beam is directed, wherein the dispersive optical element converts the signal beam to a spatially coherent signal beam.
CHROMATIC CONFOCAL AREA SENSOR
3D measurements of features on a workpiece, such as ball height, co-planarity, component thickness, or warpage, are determined. The system includes a broadband light source, a microlens array, a tunable color filter, a lens system, and a detector. The microlens array can focus a light beam to a points in a focal plane of the microlens array. The tunable color filter can narrow the light beam to a band at a central wavelength. The lens system can provide longitudinal chromatic aberration whereby different wavelengths are imaged at different distances from the lens system.
DATA PROCESSING DEVICE FOR SCANNING PROBE MICROSCOPE
A data processing device for a scanning probe microscope, the data processing device processing biaxial data indicating a change in a second physical quantity with respect to a change in a first physical quantity, the biaxial data being acquired for each of a plurality of measurement points on a sample surface by scanning the sample surface with a probe using a scanning probe microscope, the data processing device includes: a feature amount calculator 41 that acquires one or a plurality of types of feature amounts from the biaxial data at each measurement point; a feature amount selector 42 that causes a user to select one of the one or the plurality of types of feature amounts; a two-dimensional mapping image display unit 43 that displays the feature amount on a screen as a two-dimensional mapping image with each measurement point as one pixel based on selection of the feature amount by the user; and a biaxial data display unit 44 that, when the user selects one of the pixels in the two-dimensional mapping image, displays on the screen the selected pixel and the biaxial data of the measurement point corresponding to one or a plurality of pixels adjacent to the selected pixel.
DATA PROCESSING DEVICE FOR SCANNING PROBE MICROSCOPE
A data processing device for a scanning probe microscope, the data processing device processing biaxial data indicating a change in a second physical quantity with respect to a change in a first physical quantity, the biaxial data being acquired for each of a plurality of measurement points on a sample surface by scanning the sample surface with a probe using a scanning probe microscope, the data processing device includes: a feature amount calculator 41 that acquires one or a plurality of types of feature amounts from the biaxial data at each measurement point; a feature amount selector 42 that causes a user to select one of the one or the plurality of types of feature amounts; a two-dimensional mapping image display unit 43 that displays the feature amount on a screen as a two-dimensional mapping image with each measurement point as one pixel based on selection of the feature amount by the user; and a biaxial data display unit 44 that, when the user selects one of the pixels in the two-dimensional mapping image, displays on the screen the selected pixel and the biaxial data of the measurement point corresponding to one or a plurality of pixels adjacent to the selected pixel.
Method for detecting defects and associated device
A method for determining the size of a void-type defect in a top side of a structure comprising a top layer placed on a substrate, the defect being located in the top layer, includes introducing the structure into a reflected darkfield microscopy device in order to generate, from a light ray scattered by the top side, a defect-related first signal and a roughness-related second signal. The intensity of the roughness-related second signal is captured with a plurality of pixels. The intensity captured by each pixel is compared with the intensities captured by neighboring pixels. It is defined whether or not the pixel is contained in an abnormal zone. The standard deviation of the intensity values captured by the pixels of the abnormal zone is extracted, and the size of the void-type defect associated with the abnormal zone is determined from the extracted standard deviation. A new device may be used for carrying out such a method.
Radiation detection device, recording medium, and positioning method
The radiation detection device includes: a sample holding unit; an optical microscope configured to observe a sample held by the sample holding unit; an irradiation unit that irradiates the sample with radiation; a detection unit that detects radiation generated from the sample; an adjustment unit that adjusts a relationship between a focal position of the optical microscope and a position of the sample such that the optical microscope is focused on one portion of the sample; a change unit that changes a position, on which the optical microscope is to be focused, on the sample; an imaging unit that creates a partial image captured by the optical microscope at the changed position on the sample in a state in which the adjustment unit performs adjustment for focusing; and a sample image creation unit that creates a sample image by combining a plurality of partial images created by the imaging unit.
Radiation detection device, recording medium, and positioning method
The radiation detection device includes: a sample holding unit; an optical microscope configured to observe a sample held by the sample holding unit; an irradiation unit that irradiates the sample with radiation; a detection unit that detects radiation generated from the sample; an adjustment unit that adjusts a relationship between a focal position of the optical microscope and a position of the sample such that the optical microscope is focused on one portion of the sample; a change unit that changes a position, on which the optical microscope is to be focused, on the sample; an imaging unit that creates a partial image captured by the optical microscope at the changed position on the sample in a state in which the adjustment unit performs adjustment for focusing; and a sample image creation unit that creates a sample image by combining a plurality of partial images created by the imaging unit.
Microscope image measuring device and microscope image measuring method
In a measurement of a microscope image, a measurement can be conducted with high accuracy when measuring a measuring object including a step having a depth larger than a depth of focus or comparing patterns at different positions along the optical axis of a microscope. A microscope image measuring device includes: a microscope for obtaining a magnified image of a surface of a measuring object by irradiating the surface with white incident light; a spectral camera for obtaining a spectral image of the magnified image; and an image processing part for extracting the spectral image at each wavelength and performs an image measuring process. The microscope forms an image of a different focal position at each wavelength on the imaging surface of the spectral camera, and the image processing part extracts a spectral image with a wavelength where a measuring point has the highest contrast, and performs edge detection.