In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, unloading the photomask from the inspection system, and performing a second inspection process. In the first inspection process, a common Z calibration map of an objective lens of an optical module with respect to the photomask is generated and stored, and a first image of the photomask is captured by using an image sensor while focusing the objective lens of the optical module based on the common Z calibration map. The photomask is unloaded from the inspection system. In the second inspection process, the photomask is loaded on the inspection system and a second image of the photomask is captured by using an image sensor while focusing an objective lens of an optical module based on the common Z calibration map generated in the first inspection process.

In accordance with some embodiments of the present disclosure, an inspection method of a photomask includes performing a first inspection process, unloading the photomask from the inspection system, and performing a second inspection process. In the first inspection process, a common Z calibration map of an objective lens of an optical module with respect to the photomask is generated and stored, and a first image of the photomask is captured by using an image sensor while focusing the objective lens of the optical module based on the common Z calibration map. The photomask is unloaded from the inspection system. In the second inspection process, the photomask is loaded on the inspection system and a second image of the photomask is captured by using an image sensor while focusing an objective lens of an optical module based on the common Z calibration map generated in the first inspection process.

A photoacoustic remote sensing system for imaging a subsurface structure in a sample, comprising exactly one laser source configured to generate a pulsed or intensity-modulated excitation beam configured to generate ultrasonic pressure signals in the sample at an excitation location, and an interrogation beam incident on the sample at the excitation location, a portion of the interrogation beam returning from the sample that is indicative of the generated ultrasonic pressure signals, an optical system configured to focus the excitation beam and the interrogation beam below a surface of the sample, a detector configured to detect the returning portion of the interrogation beam, and a processor configured to calculate an image of the sample based on a detected intensity modulation of the returning portion of the interrogation beam from below the surface of the sample.

An optical coherence tomography (OCT) engine includes a digital Fourier-Transform (dFT) spectrometer, a tunable delay line, and a high-speed optical phased array (OPA) scanner integrated onto a single chip. The broadband dFT spectrometer offers superior signal-to-noise ratio (SNR) and fine axial resolution; the tunable delay line ensures large imaging depth by circumventing sensitivity roll-off; and the OPA can scan the beams at GHz rates without moving parts. Unlike conventional spectrometers, the dFT spectrometer employs an optical switch network to retrieve spectral information in an exponentially scaling fashion—its performance doubles with every new optical switch added to the network. Moreover, it also benefits from the Fellgett's advantage, which provide a significant SNR edge over conventional spectrometers. The tunable delay line balances the path length difference between the reference and sample arms, avoiding any need to sample high-frequency spectral fringes.

An apparatus and method are provided. The apparatus includes an imaging device; a stage movable relative to the imaging device; an isolation plate provided between the imaging device and the stage, including a horizontal glass plate; and a plurality of interferometers in electronic communication with a processor. The plurality of interferometers include three interferometers disposed on the imaging device, configured to direct a first beam set in a first direction toward the horizontal glass plate; and three interferometers disposed on the stage, configured to direct a second beam set in a second direction toward the horizontal glass plate, the second direction being opposite to the first direction. The processor is configured to measure distances between the imaging device and the isolation plate and distances between the stage and the isolation plate based on the first beam set and the second beam set reflected from the horizontal glass plate.

A system and methods for OCD metrology are provided including receiving reference parameters, receiving multiple sets of measured scatterometric data, and receiving an optical model designed to generate one or more sets of model scatterometric data according to a set of pattern parameters, and training a machine learning model by applying, during the training, target features including the reference parameters, and by applying input features including the sets of measured scatterometric data and the sets of model scatterometric data, such that the trained machine learning model estimates new wafer pattern parameters from subsequently sets of measured scatterometric data.

A displacement meter that measures displacement of an object includes a calculation circuit which calculates a displacement amount of the object using a cross-correlation function of plural images detected at different timings by a photoelectric conversion element array. The calculation circuit performs a Fourier transform on the images, applies a band-pass filter to the images having undergone the Fourier transform, and calculates the cross-correlation function using the images to which the band-pass filter has been applied. Assuming that a magnification of a light-receiving optical assembly is M, the number of pixels in the photoelectric conversion element array is N, and a pixel pitch is P (um), a low cut-off frequency HPF of the band-pass filter and a high cut-off frequency LPF of the band-pass filter satisfy: 3M/(N×P)≤HPF≤10M/(N×P), 40M/(N×P)≤LPF≤60M/(N×P).

Provided are a shape inspection device, a processing device, a height image processing method, and a height image processing program capable of accurately inspecting a measurement object. A profile data generation unit sequentially generates a plurality of pieces of profile data as the measurement object relatively moves in a Y-axis direction. A height image generation unit extracts characteristic points for the respective pieces of profile data, and moves the respective pieces of profile data in a plane intersecting with a Y axis such that the extracted characteristic points are aligned in a line in a direction corresponding to the Y axis. Then, the height image generation unit arranges the moved profile data in a direction corresponding to the Y axis to correct a height image.

Methods, devices and systems provide improved detection, sensing and identification of objects using modulated polarized beams. An example polarization sensitive device includes an illumination source, and a modulator coupled to the illumination source to produce output beams in which polarization states or polarization parameters of the output beams are modulated to produce a plurality of modulated polarized beams. The device further includes a polarization sensitive detector positioned to receive a reflected portion of modulated polarized beams after reflection from an object and to produce information that is indicative of modulation and polarization states of the received beams. The information can be used to enable a determination of a distance between the polarization sensitive device and the object, or a determination of a polarization-specific characteristic of the object.

The present invention relates to a secondary battery and an apparatus and method for measuring a dimension of the secondary battery. The secondary battery according to the present invention comprises: an electrode assembly in which an electrode and a separator are alternately laminated to be combined with each other; a pouch accommodating the electrode assembly therein; and a fluorescent reference marker applied to a portion of an outer surface of the pouch and comprising a fluorescent material, wherein the fluorescent reference marker emits fluorescence when an electromagnetic wave is irradiated so that the fluorescent reference marker serves as a reference point for measuring a dimension of the secondary battery.