An optical measuring device includes: an emission device configured to emit a scanning light, of which an optical axis parallelly moves, to an object; a light receiving element configured to perform photoelectric conversion with respect to the scanning light after passing over the object; a calculation device configured to calculate, from a voltage wave obtained from time change of an electrical signal that is output by the light receiving element, a distance corresponding to a time range from a first edge with respect to a voltage value where the scanning light is not interrupted by the object and a second edge with respect to a voltage value where the scanning light is interrupted by the object, when a part of the scanning light is interrupted by the object for the time range.

An optical measuring device includes: an emission device configured to emit a scanning light, of which an optical axis parallelly moves, to an object; a light receiving element configured to perform photoelectric conversion with respect to the scanning light after passing over the object; a calculation device configured to calculate, from a voltage wave obtained from time change of an electrical signal that is output by the light receiving element, a distance corresponding to a time range from a first edge with respect to a voltage value where the scanning light is not interrupted by the object and a second edge with respect to a voltage value where the scanning light is interrupted by the object, when a part of the scanning light is interrupted by the object for the time range.

A method of measuring lens shape of a spectacle lens, the method comprising: a) providing a spectacle lens on a surface; b) providing an image recording apparatus comprising a camera and a display; c) positioning the image recording apparatus so that the camera is largely parallel to the surface; d) capturing an image of the spectacle lens, the captured image comprising a total surface area of a camera-facing side of the spectacle lens; e) indicating positions of features of the spectacle lens in the captured image; and f) measuring a shape of the spectacle lens and determining image coordinates of the spectacle lens features.

A method of measuring lens shape of a spectacle lens, the method comprising: a) providing a spectacle lens on a surface; b) providing an image recording apparatus comprising a camera and a display; c) positioning the image recording apparatus so that the camera is largely parallel to the surface; d) capturing an image of the spectacle lens, the captured image comprising a total surface area of a camera-facing side of the spectacle lens; e) indicating positions of features of the spectacle lens in the captured image; and f) measuring a shape of the spectacle lens and determining image coordinates of the spectacle lens features.

A device for performing a measurement of a strand-shaped object comprises at least one transmission apparatus configured to emit measuring radiation onto the strand-shaped object, which reflects the measuring radiation. At least one receiving apparatus is configured to receive the measuring radiation reflected by the strand-shaped object. An evaluation apparatus is configured to determine at least one of (1) the diameter and (2) the outer contour of the strand-shaped object based on the measuring radiation received by the at least one receiving apparatus. At least one retroreflector is configured to surround at least a portion of the strand-shaped object and retroreflect at least some of the measuring radiation reflected by the strand-shaped object.

A device for performing a measurement of a strand-shaped object comprises at least one transmission apparatus configured to emit measuring radiation onto the strand-shaped object, which reflects the measuring radiation. At least one receiving apparatus is configured to receive the measuring radiation reflected by the strand-shaped object. An evaluation apparatus is configured to determine at least one of (1) the diameter and (2) the outer contour of the strand-shaped object based on the measuring radiation received by the at least one receiving apparatus. At least one retroreflector is configured to surround at least a portion of the strand-shaped object and retroreflect at least some of the measuring radiation reflected by the strand-shaped object.

A turbine blade or vane inspection apparatus comprising a controller, mounting for holding a turbine blade or vane, a source of illumination, and a camera. At least two of the source of illumination, the camera, and the mounting are moveable components. The controller is configured to control the moveable components to (a) position the turbine blade or vane mounted thereon relative to the illumination source so as to provide a contrast of illumination between a feature of the turbine blade or vane and an adjacent surface of the turbine blade or vane and (b), position the camera so that the optical axis of the camera is directed towards the feature. The controller is further configured to determine a dimension and/or shape of the feature based on an image obtained by the camera.

A turbine blade or vane inspection apparatus comprising a controller, mounting for holding a turbine blade or vane, a source of illumination, and a camera. At least two of the source of illumination, the camera, and the mounting are moveable components. The controller is configured to control the moveable components to (a) position the turbine blade or vane mounted thereon relative to the illumination source so as to provide a contrast of illumination between a feature of the turbine blade or vane and an adjacent surface of the turbine blade or vane and (b), position the camera so that the optical axis of the camera is directed towards the feature. The controller is further configured to determine a dimension and/or shape of the feature based on an image obtained by the camera.

The present disclosure relates generally to ion implantation, and more particularly, to systems and processes for measuring the temperature of a wafer within an ion implantation system. An exemplary ion implantation system may include a robotic arm, one or more load lock chambers, a pre-implantation station, an ion implanter, a post-implantation station, and a controller. The pre-implantation station is configured to heat or cool a wafer prior to the wafer being implanted with ions by the ion implanter. The post-implantation station is configured to heat or cool a wafer after the wafer is implanted with ions by the ion implanter. The pre-implantation station and/or post-implantation station are further configured to measure a current temperature of a wafer. The controller is configured to control the various components and processes described above, and to determine a current temperature of a wafer based on information received from the pre-implantation station and/or post-implantation station.

The present disclosure relates generally to ion implantation, and more particularly, to systems and processes for measuring the temperature of a wafer within an ion implantation system. An exemplary ion implantation system may include a robotic arm, one or more load lock chambers, a pre-implantation station, an ion implanter, a post-implantation station, and a controller. The pre-implantation station is configured to heat or cool a wafer prior to the wafer being implanted with ions by the ion implanter. The post-implantation station is configured to heat or cool a wafer after the wafer is implanted with ions by the ion implanter. The pre-implantation station and/or post-implantation station are further configured to measure a current temperature of a wafer. The controller is configured to control the various components and processes described above, and to determine a current temperature of a wafer based on information received from the pre-implantation station and/or post-implantation station.