A method for automated flushness measurement of point cloud rivets, including: extracting a rivet outline by adopting an RANSAC circle fitting algorithm, and determining a center, a radius and a normal vector of an outline circle; extracting point cloud of a rivet head for a single rivet outline; extracting point cloud around the rivet for the single rivet outline; and generating a distance color difference map reflecting rivet flushness according to the point cloud of the rivet head and the point cloud around the rivet. According to the present invention, the point cloud of the rivet head and the point cloud around the rivet can be respectively extracted, and the distance color difference map reflecting the rivet flushness is generated according to the point cloud of the rivet head and the point cloud around the rivet, so that the rivet flushness is rapidly and effectively measured.

A fairing skin repair method based on measured wing data includes fairing skin registration. Data set P1 through denoising and filtering wing point cloud data is reorganized to obtain a key point set P. A histogram feature descriptor in a normal direction of any key point in set P and a skin point cloud data Q is calculated. Euclidean distance between feature descriptors of two points is calculated through K-nearest neighbor algorithm, and points with high similarity are added into a set M. A clustering is performed on set M using a Hough voting algorithm to obtain a local point cloud set P′ in set P. The method includes fairing skin repair. The boundary line of the point frame is projected onto Q, and a distance between a projection line on the point cloud and the boundary line is calculated to obtain an amount of skin to be repaired.

An analysis apparatus includes an acquisition part that acquires a plurality of interference images of the object to be measured from the interference measurement apparatus, a calculation part that calculates a sine wave component and a cosine wave component of an interference signal for each pixel in the plurality of interference images, respectively, an error detection part that detects an error between a first Lissajous figure constructed on the basis of the sine wave component and the cosine wave component for each pixel and an ideal second Lissajous figure, a correction part that corrects the sine wave component and the cosine wave component for each pixel on the basis of the error, and a geometry calculation part that calculates surface geometry of the object to be measured on the basis of the corrected sine wave component and cosine wave component.

A system for calibrating a deformable sensor is provided. The system includes a deformable sensor including a housing, a deformable membrane coupled to an upper portion of the housing, and an enclosure defined by the housing and the deformable member; an imaging sensor configured to capture an image of the deformable membrane of the deformable sensor; and a controller. The enclosure is configured to be filled with a medium. The controller is configured to: receive the image of the deformable membrane of the deformable sensor; determine whether a contour of the deformable membrane in the image of the deformable membrane of the deformable sensor corresponds to a predetermined contour; and adjust a volume of the medium in the enclosure of the deformable sensor in response to the determination that the contour of the deformable membrane is different from the predetermined contour.

A system for calibrating a deformable sensor is provided. The system includes a deformable sensor including a housing, a deformable membrane coupled to an upper portion of the housing, and an enclosure defined by the housing and the deformable member; an imaging sensor configured to capture an image of the deformable membrane of the deformable sensor; and a controller. The enclosure is configured to be filled with a medium. The controller is configured to: receive the image of the deformable membrane of the deformable sensor; determine whether a contour of the deformable membrane in the image of the deformable membrane of the deformable sensor corresponds to a predetermined contour; and adjust a volume of the medium in the enclosure of the deformable sensor in response to the determination that the contour of the deformable membrane is different from the predetermined contour.

An optical sensor includes a radiation part that irradiates an object to be measured with laser light, an imaging part that receives laser light reflected by the object to be measured and captures an image of the object to be measured, a first driving part that moves the radiation part in a radiation direction of laser light to the object to be measured, and a second driving part that moves the imaging part in a reflection direction of laser light from the object to be measured and an orthogonal direction to the reflection direction.

An optical sensor includes a radiation part that irradiates an object to be measured with laser light, an imaging part that receives laser light reflected by the object to be measured and captures an image of the object to be measured, a first driving part that moves the radiation part in a radiation direction of laser light to the object to be measured, and a second driving part that moves the imaging part in a reflection direction of laser light from the object to be measured and an orthogonal direction to the reflection direction.

Methods and systems for measurement of wafer tilt and overlay are described herein. In some embodiments, the measurements are based on the value of an asymmetry response metric and known wafer statistics. Spectral measurements are performed at two different azimuth angles, preferably separated by one hundred eighty degrees. A sub-range of wavelengths is selected with significant signal sensitivity to wafer tilt or overlay. An asymmetry response metric is determined based on a difference between the spectral signals measured at the two different azimuth angles within the selected sub-range of wavelengths. The value of the asymmetry response metric is mapped to an estimated value of wafer tilt or overlay. In some other embodiments, the measurement of wafer tilt or overlay is based on a trained measurement model. Training data may be programmed or determined based on one or more asymmetry response metrics at two different azimuth angles.

Methods and systems for measurement of wafer tilt and overlay are described herein. In some embodiments, the measurements are based on the value of an asymmetry response metric and known wafer statistics. Spectral measurements are performed at two different azimuth angles, preferably separated by one hundred eighty degrees. A sub-range of wavelengths is selected with significant signal sensitivity to wafer tilt or overlay. An asymmetry response metric is determined based on a difference between the spectral signals measured at the two different azimuth angles within the selected sub-range of wavelengths. The value of the asymmetry response metric is mapped to an estimated value of wafer tilt or overlay. In some other embodiments, the measurement of wafer tilt or overlay is based on a trained measurement model. Training data may be programmed or determined based on one or more asymmetry response metrics at two different azimuth angles.

A method for coating a part having a surface that has cooling fluid openings that adjoin cooling fluid ducts inside the part. A device analyzes the surface of a part having a surface that has cooling fluid openings which adjoin cooling fluid ducts inside the part, the device being usable in the aforementioned method. The disclosed device and/or the disclosed method is used during the manufacturing and/or overhauling of parts of a turbomachine.