Proposed is a technique that can detect a random noise component at high accuracy without measurement pattern limitation and enables edge roughness measurement at higher accuracy. According to this disclosure, pattern matching and edge position correction are performed with respect to each of the left edge and the right edge of a line pattern in an obtained line pattern image, and an image with no roughness is generated. A PSD value is measured from the image, and the average PSD value of all the frequencies is determined as a random noise component, so that the random noise component can be detected at high accuracy. Further, the PSD value (random noise component) is subtracted from the PSD value of an original image, thereby measuring edge roughness at high accuracy.

Proposed is a technique that can detect a random noise component at high accuracy without measurement pattern limitation and enables edge roughness measurement at higher accuracy. According to this disclosure, pattern matching and edge position correction are performed with respect to each of the left edge and the right edge of a line pattern in an obtained line pattern image, and an image with no roughness is generated. A PSD value is measured from the image, and the average PSD value of all the frequencies is determined as a random noise component, so that the random noise component can be detected at high accuracy. Further, the PSD value (random noise component) is subtracted from the PSD value of an original image, thereby measuring edge roughness at high accuracy.

An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.

According to one or more embodiments, a method of growing crystals on a QCM sensor may include treating a crystal growth surface of the QCM sensor with a coupling agent, applying a cation stream to the crystal growth surface of the QCM sensor, and applying an anion stream to the crystal growth surface of the QCM sensor. The crystals forming a crystal layer may have an average thickness greater than 5 nanometers. According to one or more embodiments, a QCM sensor may include a crystal layer on a crystal growth surface of the QCM sensor, where the crystal layer is formed by a process including treating the crystal growth surface of the QCM sensor with a coupling agent, applying a cation stream to the crystal growth surface of the QCM sensor, and applying an anion stream to the crystal growth surface of the QCM sensor.

According to one or more embodiments, a method of growing crystals on a QCM sensor may include treating a crystal growth surface of the QCM sensor with a coupling agent, applying a cation stream to the crystal growth surface of the QCM sensor, and applying an anion stream to the crystal growth surface of the QCM sensor. The crystals forming a crystal layer may have an average thickness greater than 5 nanometers. According to one or more embodiments, a QCM sensor may include a crystal layer on a crystal growth surface of the QCM sensor, where the crystal layer is formed by a process including treating the crystal growth surface of the QCM sensor with a coupling agent, applying a cation stream to the crystal growth surface of the QCM sensor, and applying an anion stream to the crystal growth surface of the QCM sensor.

Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.

Optical elements that efficiently propagate x-ray radiation over a desired energy range and reject radiation outside the desired energy range are presented herein. In one aspect, one or more optical elements of an x-ray based system include an integrated optical filter including one or more material layers that absorb radiation having energy outside the desired energy band. In general, the integrated filter improves the optical performance of an x-ray based system by suppressing reflectivity within infrared (IR), visible (vis), ultraviolet (UV), extreme ultraviolet (EUV) portions of the spectrum, or any other undesired wavelength region. In a further aspect, one or more diffusion barrier layers prevent degradation of the integrated optical filter, prevent diffusion between the integrated optical filter and other material layers, or both. In some embodiments, the thickness of one or more material layers of an integrated optical filter vary over the spatial area of the filter.

A system for detecting plugging of ground-engaging tools of agricultural implements includes an aft sensor(s) configured to capture data indicative of a post-worked residue coverage of a portion of a field aft of a ground-engaging tool(s). The system includes a controller configured to monitor the data received from the aft sensor(s) and determine the post-worked residue coverage for the portion of the field. The controller is configured to identify when the ground-engaging tool(s) is experiencing a plugged condition based at least in part on the determined post-worked residue coverage for the field.

A system for detecting plugging of ground-engaging tools of agricultural implements includes an aft sensor(s) configured to capture data indicative of a post-worked residue coverage of a portion of a field aft of a ground-engaging tool(s). The system includes a controller configured to monitor the data received from the aft sensor(s) and determine the post-worked residue coverage for the portion of the field. The controller is configured to identify when the ground-engaging tool(s) is experiencing a plugged condition based at least in part on the determined post-worked residue coverage for the field.