A parameter measurement device of a light deflector includes a photodetector that receives output light from the light deflector, a biaxial translation automatic stage that moves the photodetector to a plurality of positions, and a signal processing device that calculates the wavelength of the output light of a wavelength sweeping light source for each time, calculates the wavelength of the light received from the light deflector by the photodetector based on the output signal of the photodetector and a previously-calculated wavelength, and calculates the incident angle of the output light beam of the wavelength sweeping light source onto the diffraction grating and an angle formed by an L-axis and a line perpendicular to the surface of the diffraction grating by performing fitting so that the coordinates of the photodetector that are obtained for each position of the photodetector and the wavelength of the light conform to a prescribed relational expression.

A five-degree-of-freedom heterodyne grating interferometry system, comprising a single frequency laser device (1) and an acousto-optic modulator (2); the single frequency laser device (1) emits a single frequency laser, and the single frequency laser is coupled by optical fiber and, after being split, enters the acousto-optic modulator (2) to obtain two linearly polarized lights of different frequencies, one being a reference light, and one being a measurement light; an interferometer lens group (3) and a measurement grating (4), used for forming the reference light and the measurement light into a measurement interference signal and a compensation interference signal; and multiple optical fiber bundles (5), respectively receiving the measurement interference signal and the compensation interference signal, each optical fiber bundle (5) having multiple multimode optical fibers respectively receiving signals at different positions on the same plane. The present measurement system has the advantages of high measurement precision, a large measurement range, not being sensitive to temperature drift, and small overall size, and can be used as a photoetching machine ultra-precision workpiece table position measurement system.

The invention relates to a device for measuring a substrate for semiconductor lithography with a reference interferometer for ascertaining the change in the ambient conditions, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, wherein the means is configured to bring about a change in the refractive index.

Furthermore, the invention relates to a method for correcting cyclic error components of a reference interferometer, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, comprising the following method steps: starting up the reference interferometer, continuously detecting measurement values of the reference interferometer, changing the optical path length of the measurement section of the reference interferometer until a path length change of at least one quarter of the wavelength of the reference interferometer is detected, determining the cyclic errors on the basis of the continuously detected measurement values of the reference interferometer, and correcting the current measurement values ascertained by the reference interferometer on the basis of the cyclic errors ascertained.

A photoelectric conversion apparatus includes an interferometer configured to cause interference in wavelength swept light Lx output from a wavelength swept light source X and is configured to convert the interfered wavelength swept light by photoelectric conversion. A signal processing apparatus calculates, in chronological order, relative frequencies fr(t) indicating frequencies relative to interference signals i(t) obtained by the photoelectric conversion of the interference light iL, and measures a difference between a maximum value and a minimum value of the relative frequencies fr(t), as a sweep frequency width Δf of the wavelength swept light Lx.

A light detection and ranging (LIDAR) system includes a LIDAR measurement unit, a reference measurement unit, and a phase cancellation unit. The LIDAR measurement unit estimates a time for which a laser beam travels. The reference measurement unit determines a phase of a laser source. The phase cancellation unit identifies phase noise and cancels the phase noise from the laser beam, at least partially based on the phase of the laser source and the time for which the laser beam travels. The denoised signal is used to determine the range between a laser source and a target.

A light detection and ranging (LIDAR) system includes a laser and a calibration unit. The laser is configured to generate a laser beam based on a particular laser waveform that is associated with at least one parameter of a plurality of parameters. The calibration unit is configured to determine a particular value for the at least one parameter of the plurality of parameters to compensate for distortion characteristics of the laser. The calibration unit is configured to determine the particular value based on an output frequency of the laser beam. The calibration unit is configured to update the particular laser waveform with the particular value of the at least one parameter of the plurality of parameters.

An interferometric distance-measurement device includes a multi-wavelength light source which provides a beam having at least three different wavelengths. An interferometer unit splits the beam into measuring and reference beams. The measuring beam propagates in the direction of a measuring reflector movable along a measuring axis and undergoes a back-reflection, and the reference beam propagates in the direction of a stationary reference reflector and undergoes a back-reflection. The back-reflected measuring and reference beams interfere with each other in an interference beam. A detection unit splits the interference beam such that several phase-shifted partial interference signals result for each wavelength. A signal processing unit determines absolute position information regarding the measuring reflector from the partial interference signals of different wavelengths and an additional coarse position signal.

A light detection and ranging (LIDAR) system includes a LIDAR measurement unit, a reference measurement unit, and a phase cancellation unit. The LIDAR measurement unit estimates a time for which a laser beam travels. The reference measurement unit determines a phase of a laser source. The phase cancellation unit identifies phase noise and cancels the phase noise from the laser beam, at least partially based on the phase of the laser source and the time for which the laser beam travels. The denoised signal is used to determine the range between a laser source and a target.

A light detection and ranging (LIDAR) system includes a LIDAR measurement unit, a reference measurement unit, and a phase cancellation unit. The LIDAR measurement unit estimates a time for which a laser beam travels. The reference measurement unit determines a phase of a laser source. The phase cancellation unit identifies phase noise and cancels the phase noise from the laser beam, at least partially based on the phase of the laser source and the time for which the laser beam travels. The denoised signal is used to determine the range between a laser source and a target.

A light detection and ranging (LIDAR) system includes a LIDAR measurement unit, a reference measurement unit, and a phase cancellation unit. The LIDAR measurement unit estimates a time for which a laser beam travels. The reference measurement unit determines a phase of a laser source. The phase cancellation unit identifies phase noise and cancels the phase noise from the laser beam, at least partially based on the phase of the laser source and the time for which the laser beam travels. The denoised signal is used to determine the range between a laser source and a target.