A liquid gauge is disclosed. The liquid gauge includes a plurality of holes configured to receive a plurality of liquid droplets of a first size. The liquid gauge also includes a plurality of curved structures configured to form an aggregated liquid droplet of a second size using the plurality liquid droplets of the first size. The liquid gauge further includes a plurality of counting electrodes configured to generate a corresponding electrical signal. The liquid gauge further includes a processing unit configured to count the aggregated liquid droplet of the second size received by each of the counting electrode and also configured to compute a total amount of liquid fall based on the aggregated liquid droplet of the second size.

Embodiments of the invention provide a coupler for use in a closed transfer system configured to selectively engage a container seated in fluid communication with the coupler. The coupler has a body with a slot having an axial component, and an outlet. A probe extends from a first end portion to a second end portion and is at least partially received within the body, the probe is configured to be movable relative to the body between a first position and a second position to selectively control a flow of fluid through the outlet. A probe tip with a cylindrical bore is configured to engage the second end portion of the probe, and a handle is coupled to the probe and configured to interface with the slot. Axial movement of the handle along the slot moves the probe between the first position and the second position.

Embodiments of the invention provide a probe assembly configured to selectively restrict fluid flow through an outlet of a closed transfer system. The probe assembly has an elongate probe body with a top end portion, a bottom end portion, an outer wall, and an internal structure defining a fluid chamber extending from the bottom end portion to the top end portion. The fluid chamber has a fluid chamber inlet at the bottom end portion extending through the outer wall into the fluid chamber and a fluid chamber outlet at the top end portion extending from the fluid chamber through the outer wall. A probe tip with a cylindrical bore is configured to engage the top end portion of the elongate probe body and a probe tip outlet is configured to be in fluid communication with the fluid chamber outlet. A rotating head located circumjacent to the probe tip and adjacent to the probe tip outlet is configured to rotate about the probe tip. The rotating head having an inner surface, an outer surface, and a vane extending from the inner surface through the outer surface.

In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.

In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.

A vehicle surface simulation apparatus for mapping a nozzles spray pattern of a water leak tester configured to spray water onto an exterior of a vehicle. A jig of the apparatus can be configured to simulate a plurality of exterior surface portions of two different vehicles. The jig can include at least a first area configured to represent at least a portion of a side-view profile of the first vehicle and the second vehicle, and at least a second area configured to represent at least a portion of a front-view profile of the first vehicle and at least a portion of a rear-view profile of the second vehicle. The funnel can be supported in one of the areas such that a funnel inlet lies in a plane that represents a predetermined surface of the vehicle. The conduit can be in fluid communication with the funnel and the container.

A coupler for use in a closed transfer system is provided. The coupler includes a body with an axial slot, an outlet, and a probe that extends from a first end portion to a second end portion and at least partially received within the body, the probe configured to be movable relative to the body between a first position and a second position to selectively control the flow of fluid through the outlet. A handle is coupled to the probe and configured to interface with the axial slot, wherein the handle is configured to move axially along the axial slot to move the probe between the first position and the second position.

A coupler for use in a closed transfer system is provided. The coupler includes a body with an axial slot, an outlet, and a probe that extends from a first end portion to a second end portion and at least partially received within the body, the probe configured to be movable relative to the body between a first position and a second position to selectively control the flow of fluid through the outlet. A handle is coupled to the probe and configured to interface with the axial slot, wherein the handle is configured to move axially along the axial slot to move the probe between the first position and the second position.

A method is provided for measuring at least two flow properties of a fluid. The method includes providing at least two nanowires, the resistance of each nanowire varying based on a value of a different respective flow property such that each nanowire is configured to measure the different respective flow property, and operating each of the nanowires in a different respective mode of operation, in order to measure the at least two flow properties simultaneously in real-time. Other embodiments are also described.

In a gas flow monitoring method using a MFC (a flow control device) for controlling a flow rate of process gas from a process gas supply source and supply the process gas to a predetermined process chamber, a start shut-off valve placed upstream of the MFC, and a pressure gauge placed between the start shut-off valve and the MFC, the start shut-off valve is closed and a drop of pressure on an upstream side of the MFC is measured by the pressure gauge to measure a flow rate of the MFC, thereafter, the start shut-off valve is opened to monitor the flow rate of the MFC. The MFC is switched from an ON state to an OFF state before the start shut-off valve is opened. The method enables in-line monitoring a low rate of process gas without affecting a semiconductor manufacturing process.