G01F7/005

THIN FILM FORMING METHOD
20190346300 · 2019-11-14 ·

A thin film forming method includes: a first operation of supplying a source gas at a first flow rate into a reactor; a second operation of purging the source gas in the reactor to an exhaust unit; a third operation of supplying a reactive gas at a second flow rate into the reactor; a fourth operation of supplying plasma into the reactor; and a fifth operation of purging the reactive gas in the reactor to the exhaust unit, wherein, during the second to fifth operations, the source gas is bypassed to the exhaust unit, and a flow rate of the source gas bypassed to the exhaust unit is less than the first flow rate. According to the thin film forming method, the consumption of the source gas and the reactive gas may be reduced, and the generation of reaction by-products in the exhaust unit may be minimized.

System for Testing Fluid Samples

A system and method for measuring flow resistance of a fluid in a conduit is provided. The system generally includes a reservoir for containing the fluid, a pump connected to the reservoir for distributing the fluid through a conduit having a straight measurement section, one or more pressure sensors connected to the conduit for measuring the pressure of the fluid in the conduit at one end of the straight measurement section and an opposite end of the straight measurement section.

Production of hydrocarbons with metric counter

An improved solution for estimating the flow rate of a fluid in a line of a hydrocarbon production installation, during production. Systems and methods for producing hydrocarbons on a line of a hydrocarbon production installation can include at least two devices adapted each for providing an estimate of the flow rate of a fluid in the line based on respective data. The devices include at least one metric counter, and the data relative to the provision of an estimate of the flow rate by the metric counter include a measurement done by at least one sensor of the metric counter on the fluid. Further, data can be determined relative to the provision of an estimate of the flow rate by the devices, and a DVR process involving the determined data, the reconciliation being conditioned by at least a substantial equality between the estimates of the flow rate of the fluid.

Thin film forming method
12025484 · 2024-07-02 · ·

A thin film forming method includes: a first operation of supplying a source gas at a first flow rate into a reactor; a second operation of purging the source gas in the reactor to an exhaust unit; a third operation of supplying a reactive gas at a second flow rate into the reactor; a fourth operation of supplying plasma into the reactor; and a fifth operation of purging the reactive gas in the reactor to the exhaust unit, wherein, during the second to fifth operations, the source gas is bypassed to the exhaust unit, and a flow rate of the source gas bypassed to the exhaust unit is less than the first flow rate. According to the thin film forming method, the consumption of the source gas and the reactive gas may be reduced, and the generation of reaction by-products in the exhaust unit may be minimized.

Device for measuring mass flow rate of multiphase flow based on ray coincidence measurement
12025481 · 2024-07-02 · ·

A device for measuring a mass flow rate of a multiphase flow based on ray coincidence measurement includes a support frame and a plurality of ray detection assemblies. The support frame includes a central through hole and an outer wall, and the central through hole is configured to receive a fluid pipe. The plurality of ray detection assemblies is distributed along the circumferential direction of the outer wall and is perpendicular to the axis of the central through hole. The plurality of ray detection assemblies each includes a scintillation crystal and a detector, and the scintillation crystal is disposed between the outer wall and the detector.

Flow measuring device having a first and a second flow measuring transducer operating on different operating principles for improved measurement accuracy
12007268 · 2024-06-11 · ·

A method for determining a flowed amount of a medium includes using a first flow measuring transducer according to a first measuring principle and a second flow measuring transducer according to a second measuring principle. The measured values of the first transducer are more reliable in first states of the medium than measured values of the second transducer, and the second measured values are more reliable in second states than the first measured values. A contribution to the flowed amount is ascertained based on the more reliable measured values. The contribution to the flowed amount based on the second measured values is ascertained via a transfer function. An updated version of the transfer function is ascertained when the first measured values are more reliable, and the flowed amount earlier ascertained based on the second measured values is corrected as a function of the updated transfer function.

Device and method for total cross-section measurement of mass flow rate of gas, liquid and solid in multiphase flow
12044565 · 2024-07-23 · ·

A device for total cross-section measurement of a mass flow rate of gas, liquid and solid in a multiphase flow includes a gamma-ray source, a gamma-ray detector, and a differential pressure type flowmeter. The differential pressure type flowmeter includes a throat section, and the gamma-ray source and the gamma-ray detector are respectively disposed at opposite positions on both sides of the throat section. The gamma-ray detector is an array including a plurality of detection units, and the gamma-ray source is configured to emit gamma rays covering the measurement cross-section of the throat section. The gamma-ray detector is configured to receive the gamma rays passing through the measurement cross-section of the throat section.

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
20190071774 · 2019-03-07 · ·

In one embodiment, a semiconductor manufacturing apparatus includes first and second tanks configured to store a gas fed from a gas feeder. The apparatus further includes a chamber configured to process a wafer by using the gas fed from the gas feeder, the first tank or the second tank. The apparatus further includes a controller configured to control feeding of the gas to the first tank, the second tank and the chamber.

Biological fluid flow control apparatus and method

Apparatus, system and method are provided for controlling flow through a biological fluid processing device. Pressure of fluid flow through a flow path is monitored and flow rate in the flow path is increased or decreased based on sensed pressure levels for selected periods of time. This has particular application in controlling flow in an infusion or return flow path of an apheresis device that separates whole blood into one or more blood components.

METHOD AND APPARATUS FOR MODULATING A FLOWPATH

A flowmeter (5) is provided having a sensor assembly (10) connected to meter electronics (20), wherein the sensor assembly (10) comprises at least one driver (104) and at least one pickoff (105) and a variably modulated conduit (300) configured to change a flow area (304) therein.