Patent classifications
G01F15/005
Flow rate control system and flow rate measurement method
A control unit 3 of a flow rate control system 1 comprises: a recording unit 31 for recording measured values of a pressure sensor P and a temperature sensor T, a storage unit 32 for storing volume data between a first valve V1 and a second valve V2 corresponding to the measured value of the pressure sensor P, and an arithmetic unit 33 for calculating a flow rate based on a first pressure value P1 and a first temperature value T1 measured after opening the first valve V1 and the second valve V2 to flow a gas and then closing the first valve V1 and the second valve V2 simultaneously in a state where the gas is flowing; a second pressure value P2 and a second temperature value T2 measured after opening the first valve V1 and the second valve V2 to flow a gas, closing the second valve V2 in a state where the gas is flowing, and then closing the first valve V1 after a predetermined time Δt has elapsed; and a volume value V between the first valve V1 and the second valve V2 which corresponds to the second pressure value P2.
Fluid usage monitoring and control system
In a method of monitoring fluid usage in a fluid system, a proportional control valve is provided, including a valve element operable to control fluid flow from a fluid source to the fluid system. A first pressure upstream of the valve element and a second pressure downstream of the valve element are measured to identify a pressure differential across the valve element. In response to the identified pressure differential, the valve element is adjusted to one of a plurality of flow positions to adjust the pressure differential across the valve element to substantially match a predetermined pressure differential. A flow rate through the proportional control valve is determined based on the first pressure, the second pressure, and the adjusted flow position of the valve element. Based on the determined flow rate over time, an amount of fluid usage in the fluid system is determined.
Valve device, adjustment information generating method, flow rate adjusting method, fluid control system, flow rate control method, semiconductor manufacturing system and semiconductor manufacturing method
A valve device is capable of precisely adjusting a flow rate variation with time, aging, or the like without using an external sensor or using as few external sensors as possible. The apparatus includes an adjusting actuator for adjusting the position of the operating member positioned at the open position, a communication unit for receiving adjustment information relating to the adjustment of the opening degree of the flow path by the valve element from the outside of the apparatus, and a control unit for adjusting the position of the operating member by driving the adjusting actuator based on the adjustment information.
Method and apparatus for pulse gas delivery using an external pressure trigger
A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.
Method of inspecting and inspection apparatus
The method for inspecting the flow rate controller for controlling a flow rate of a fluid includes creating and recording a three-dimensional database in which a first pressure, a set flow rate or a second pressure, and a control value of a piezoelectric element are associated with each other, based on reference data, measuring, as target data, control values of the piezoelectric element corresponding to the first pressure detected by a first pressure detector and the set flow rate specified in a recipe of a substrate processing process or the second pressure detected by a second pressure detector, at the time of the execution of the substrate processing process, and determining whether or not there is a problem in a diaphragm valve, by comparing the target data with the reference data included in the three-dimensional database.
Method and apparatus for pulse gas delivery with concentration measurement
A system and method provides a more precise mole delivery amount of a process gas, for each pulse of a pulse gas delivery, by measuring a concentration of the process gas and controlling the amount of gas mixture delivered in a pulse of gas flow based on the received concentration of the process gas. The control of mole delivery amount for each pulse can be achieved by adjusting flow setpoint, pulse duration, or both.
TESTING AND CALIBRATION OF FIXED ORIFICE PLATE FLOW MEASUREMENT EQUIPMENT
This disclosure describes systems, methods, and devices related to a remote calibration controller. The remote calibration controller may be capable of performing the procedure to remotely test and calibrate differential pressure, static pressure, and temperature on a remotely located fixed orifice plate flow measurement device through the use electromechanical and electro pneumatic hardware located at the site of the flow measurement device that are controlled by on-site controller/logic circuitry remotely accessed via bi-directional communications.
Flowing vapor pressure apparatus and related method
A method of determining vapor pressure of a fluid is provided. The method includes the steps of providing a meter (5) having meter electronics (20), the meter (5) being at least one of a flowmeter and a densitometer, and flowing a process fluid through the meter (5). A pressure of the process fluid is measured. The pressure of the process fluid is adjusted until a monophasic/biphasic boundary is reached. The flowing vapor pressure of the process fluid is determined at the monophasic/biphasic boundary.
Apparatus and method for inspecting ventilation
An apparatus for inspecting a ventilation characteristic according to various embodiments may comprise: a seating unit to which an object to be inspected is attached, and which has a lower surface and an upper surface facing in a direction opposite to the lower surface and includes at least one through-hole passing through the lower surface and the upper surface; a measuring unit which includes a groove for accommodating at least a portion of the seating unit including the lower surface of the seating unit, and a fluid supply passage for supplying a fluid in a direction facing the object to be inspected which is attached to the seating unit; and a compressing unit which is disposed to apply a pressing pressure to the seating unit at a position opposite to the upper surface of the seating unit and includes a fluid discharge passage so that a fluid supplied from the measurement unit is discharged through the object to be inspected. Other embodiments are also possible.
Monitoring system for detecting leaks using a system of flow rate sensors and smart valves
Methods, systems, and apparatus, including computer programs encoded on a storage device, for detecting water leaks and mitigating the damage caused by the detected leaks. The system may include a processor and a storage device storing instructions that, when executed by the processor, cause the processor to perform operations. The operations may include obtaining sensor data that is generated by one or more flow rate sensors located at a property, obtaining status data that is generated by one or more connected water shutoff valves located at the property, determining, based on (i) the obtained sensor data and (ii) the obtained status data whether a water leak has been detected at the property, and in response to determining, based on (i) the obtained sensor data and (ii) the obtained status data, that a water leak has been detected at the property, initiating performance of one or more water damage mitigation operations.