G01J4/04

Integrated mid-infrared, far infrared and terahertz optical Hall effect (OHE) instrument, and method of use

System Stage, and Optical Hall Effect (OHE) system method for evaluating such as free charge carrier effective mass, concentration, mobility and free charge carrier type in a sample utilizing a permanent magnet at room temperature.

Light beam measurement device, laser apparatus, and light beam separator

A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF.sub.2.

Light beam measurement device, laser apparatus, and light beam separator

A light beam measurement device includes: a polarization measurement unit including a first measurement beam splitter provided on an optical path of a laser beam and configured to measure a polarization state of the laser beam having been partially reflected by the first measurement beam splitter; a beam profile measurement unit including a second measurement beam splitter provided on the optical path of the laser beam and configured to measure a beam profile of the laser beam having been partially reflected by the second measurement beam splitter; and a laser beam-directional stability measurement unit configured to measure a stability in a traveling direction of the laser beam, while the first measurement beam splitter and the second measurement beam splitter are made of a material containing CaF.sub.2.

Reflectometer, spectrophotometer, ellipsometer and polarimeter system with a super continuum laser source of a beam of electromagnetism, and improved detector system

Reflectometer, spectrophotometer, ellipsometer, and polarimeter systems having a supercontinuum laser source of coherent electromagnetic radiation over a range of between 400 nm to between 4400 nm and 18000 nm, and another source of wavelengths to provide between 400 nm and as high as at least 50000 nm; a stage for supporting a sample and a detector of electromagnetic radiation, wherein the source provides a beam of electromagnetic radiation which interacts with a sample and enters a detector system optionally incorporating a wavelength modifier, where the detector system can be functionally incorporated with combinations of gratings and/or combination dichroic beam splitter-prisms, which can be optimized as regards wavelength dispersion characteristics to direct wavelengths in various ranges to various detectors that are well suited to detect them.

Long wave infrared imaging polarimeter, and method of assembly

A long wave infrared imaging polarimeter (LWIP) is disclosed including a pixilated polarizing array (PPA) in close proximity to a microbolometer focal plane array (MFPA), along with an alignment engine for aligning and bonding the PPA and MFPA and method for assembly.

Long wave infrared imaging polarimeter, and method of assembly

A long wave infrared imaging polarimeter (LWIP) is disclosed including a pixilated polarizing array (PPA) in close proximity to a microbolometer focal plane array (MFPA), along with an alignment engine for aligning and bonding the PPA and MFPA and method for assembly.

Uniaxial Optical Multi-Measurement Sensor

In embodiments, a uniaxial optical multi-measurement sensor comprises a sensor housing having a center axis and a cylindrical surface and an array of electrically coupled light-sensitive pixel elements attached to the cylindrical surface. Each pixel element is positioned having its light-sensitive side facing towards the center axis. In this embodiment, a conical light redistribution optic is positioned along the center axis to direct or reimage uncollimated light entering the sensor housing onto the pixel elements. Also, in this embodiment, the pixel elements are positioned relative to the light redistribution optic to measure or image two or more properties of the uncollimated light entering the sensor housing of a single scene and from a single viewpoint.

Uniaxial Optical Multi-Measurement Sensor

In embodiments, a uniaxial optical multi-measurement sensor comprises a sensor housing having a center axis and a cylindrical surface and an array of electrically coupled light-sensitive pixel elements attached to the cylindrical surface. Each pixel element is positioned having its light-sensitive side facing towards the center axis. In this embodiment, a conical light redistribution optic is positioned along the center axis to direct or reimage uncollimated light entering the sensor housing onto the pixel elements. Also, in this embodiment, the pixel elements are positioned relative to the light redistribution optic to measure or image two or more properties of the uncollimated light entering the sensor housing of a single scene and from a single viewpoint.

System and method for use in high spatial resolution ellipsometry
11262293 · 2022-03-01 · ·

System and method for use in optical monitoring of a sample. The system comprising: a light source unit (140) for providing collimated illumination; polarization modulation unit (160) located in optical path of light propagating from the light source unit; a lens unit (120) for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit (500) configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system parameters and angle of incidence in accordance with corresponding parameters of the reference data to thereby determine calibration data.

System and method for use in high spatial resolution ellipsometry
11262293 · 2022-03-01 · ·

System and method for use in optical monitoring of a sample. The system comprising: a light source unit (140) for providing collimated illumination; polarization modulation unit (160) located in optical path of light propagating from the light source unit; a lens unit (120) for focusing light onto an illumination spot on a surface of a sample, and for collection of light components returning from the sample; a light collection unit configured for collecting light returning from the sample and generate output image data associated with Fourier plane imaging with respect to surface of the sample; and a control unit (500) configured processing said data in accordance with said system calibration. The method provides calibration data, and comprising: providing reference data indicative of complex refractive index of the reference samples on at least two reference samples; collecting ellipsometry data for said at least two reference samples using the ellipsometry system, generating output data having a plurality of data pieces, each associated with unknown angular direction; and for each data piece corresponding to an unknown angular direction, determining simultaneously system parameters and angle of incidence in accordance with corresponding parameters of the reference data to thereby determine calibration data.