Patent classifications
G01J9/02
Measurement technique for refractive index inhomogeneity between plates of a lightguide optical element (LOE)
A system and method for measuring refractive index inhomogeneity between plates of a Lightguide Optical Element (LOE) uses an innovative measuring technique based on a shearing interferometric technique conventionally used to observe interference and test the collimation of light beams. Another feature of the current implementation is an innovative method for analyzing the characteristics of the generated interferogram to characterize discrepancies between adjacent plates in an LOE.
Optoelectrical chip
The invention relates to an optoelectronic chip comprising the following elements: a light inlet; a wavelength-sensitive optical filter; a first photoelectric element for measuring a first light intensity, particularly a first photodiode, the first photoelectric element being arranged such that light penetrating the optoelectronic chip via the light inlet, transmitted by the filter, hits the first photoelectric element; and a second photoelectric element for measuring a second light intensity, particularly a second photodiode, the second photoelectric element being arranged such that the light penetrating the optoelectronic chip via the light inlet, which is reflected by the filter, hits the second photoelectric element.
Interferometer and phase shift amount measuring apparatus with diffraction gratings to produce two diffraction beams
The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.
Interferometer and phase shift amount measuring apparatus with diffraction gratings to produce two diffraction beams
The present invention is directed to the provision of an interferometer and a phase shift amount measuring apparatus that can precisely operate in the EUV region. The interferometer according to the invention comprises an illumination source for generating an illumination beam, an illumination system for projecting the illumination beam emitted from the illumination source onto a sample, and an imaging system for directing the reflected beam by the sample onto a detector. The illumination system includes a first diffraction grating for producing a first and second diffraction beams which respectively illuminate two areas on the sample where are shifted from each other by a given distance, and the imaging system includes a second grating for diffracting the first and second diffraction beams reflected by the sample to produce a third and fourth diffraction beams which are shifted from each other by a given distance.
Interferometer
An interferometer includes a first interferometer arm and a second interferometer arm. A first central beam, originating from a central image point of an image, passes through the first interferometer arm. A second central beam, originating from the central image point, passes through the second interferometer arm. The first central beam and the second central beam are superimposed and generate a k.sub.perpendicular=0 interference at a superposition point. A first light beam perpendicular to the first central beam, originating from an image point of the image, passes through the first interferometer arm. A second light beam perpendicular to the second central beam, originating from the image point, passes through the second interferometer arm. The first light beam and the second light beam overlap at the superposition point. At the superposition point, a wave vector component of the first light beam opposes a wave vector component of the second light beam.
High accuracy, high precision, low drift, and concurrent wavelength measurement of a sweeping tunable laser
A tunable laser wavelength measurement system includes an interferometric wavelength tracking system that uses a combination of interferometric and wavelength reference measurements to directly measure the laser output wavelength, The measurement exhibits the following desirable error signal characteristics: directional information, continuity, low latency, absolute information, high accuracy, high precision, and little or no drift, A tunable laser wavelength control system additionally incorporates electronics to compare the measured laser wavelength to a desired wavelength or wavelength function, and to generate a feedback control signal to control the wavelength of the laser output based on the comparison. In one non-limiting example implementation, the desired wavelength function is repetitive. The difference between the desired wavelength function and the interferometrically-measured wavelength function is taken, and a successive approximation technique is employed to calculate and adjust a repetitive controlling signal to obtain the desired wavelength function.
Optical Deflector Parameter Measurement Device, Method, and Program
A parameter measurement device of a light deflector includes a photodetector that receives output light from the light deflector, a biaxial translation automatic stage that moves the photodetector to a plurality of positions, and a signal processing device that calculates the wavelength of the output light of a wavelength sweeping light source for each time, calculates the wavelength of the light received from the light deflector by the photodetector based on the output signal of the photodetector and a previously-calculated wavelength, and calculates the incident angle of the output light beam of the wavelength sweeping light source onto the diffraction grating and an angle formed by an L-axis and a line perpendicular to the surface of the diffraction grating by performing fitting so that the coordinates of the photodetector that are obtained for each position of the photodetector and the wavelength of the light conform to a prescribed relational expression.
Ellipsometer and inspection device for semiconductor device
Provided is an ellipsometer including a polarizing optical device configured to separate light, reflected from a sample that is irradiated with illumination light comprising a linearly polarized light, into a first linearly polarized light in a first polarization direction and a second linearly polarized light in a second polarization direction that is orthogonal to the first polarization direction, and a light-receiving optical system configured to calculate an Ψ and Δ, an amplitude ratio and a phase difference of the two polarized light respectively, from an interference fringe formed by interference between the first linearly polarized light and the second linearly polarized light after passing through an analyzing device with transmission axis different from the first polarization direction and the second polarization direction.
METHODS AND APPARATUS FOR MEASURING AND LOCKING ULTRA-FAST LASER PULSES
Methods and devices are described for performing an all-phase measurement of an ultra-fast laser pulse having a spectral range of greater than one octave. The ultra-fast laser pulse may be split into a first beam comprising a fundamental light with a wavelength λ.sub.0 and a second beam comprising a light with a wavelength 2λ.sub.0. The light with the wavelength 2λ.sub.0 may be frequency doubled to a light with a wavelength λ.sub.0 to generate an interference with the fundamental light. Fourier transform may be performed on an interference spectrum of the interference, and a relative envelope delay (RED) between the fundamental light and the frequency doubled light and a carrier envelope phase (CEP) may be acquired based on a result of the Fourier transform.
ENHANCED LIGHT DETECTOR
Methods for design and production of highly sensitive active and passive light detecting devices and systems. Orders of magnitude improvement in optical signal detection is made possible in high noise or low contrast scenes. The current invention creates a small spectral difference between two parts of a split light stream. When recombined, the altered light streams partially correlate, and that generates full amplitude signal oscillation at a frequency that depends on the constituent spectrum. The full amplitude signals and spectrum dependent oscillation make signal discrimination much better than intensity-only methods. The effect of read noise, amplifier noise, dark current noise, and thermal noise due to photo detector shunt resistance, become less important when compared to light detection using prior art methods