Patent classifications
G01L21/30
In-situ etch rate determination for chamber clean endpoint
Embodiments described herein relate to methods for determining a cleaning endpoint. A first plasma cleaning process may be performed in a clean chamber environment to determine a clean time function defined by a first slope. A second plasma cleaning process may be performed in an unclean chamber environment to determine a clean time function defined by a second slope. The first and second slope may be compared to determine a clean endpoint time.
Long lifetime cold cathode ionization vacuum gauge design
A Long Lifetime Cold Cathode Ionization Vacuum Gauge Design with an extended anode electrode having an axially directed tip, a cathode electrode, and a baffle structure. The axially directed tip of the anode electrode can have a rounded exterior with a diameter at least 10% greater than the diameter of the anode electrode.
Long lifetime cold cathode ionization vacuum gauge design
A Long Lifetime Cold Cathode Ionization Vacuum Gauge Design with an extended anode electrode having an axially directed tip, a cathode electrode, and a baffle structure. The axially directed tip of the anode electrode can have a rounded exterior with a diameter at least 10% greater than the diameter of the anode electrode.
Nano deposition and ablation for the repair and fabrication of integrated circuits
An apparatus for and methods of repairing and manufacturing integrated circuits using the apparatus. The apparatus, comprising: a vacuum chamber containing: a movable stage configured to hold a substrate; an inspection and analysis probe; a heat source; a gas injector; and a gas manifold connecting multiple gas sources to the gas injector.
Ionization Pressure Gauge With Bias Voltage And Emission Current Control And Measurement
Devices and corresponding methods are provided to operate a hot cathode ionization pressure gauge (HCIG). A transistor circuit can be configured to pass the electron emission current with low input impedance and to control cathode bias voltage. Emission current and cathode bias voltage can be controlled independently of each other, without a servo settling time. HCIGs can be calibrated with respect to leakage current.
Method for operating a group of pressure sensors
Method for operating a group 1 of pressure sensors which are arranged in such a manner that they can measure the pressure in a common measurement volume 2, wherein the group of pressure sensors comprises at least a first pressure sensor 1 with a first pressure measurement range and a second pressure sensor 1 with a second pressure measurement range, wherein the first and second pressure measurement ranges overlap in an overlap pressure measurement range, wherein the first and second pressure sensors are each based on an indirect pressure measurement principle and are configured to output a measurement signal calibrated to a reference gas, and wherein the method comprises the steps of: a) providing calibration data specific to the type of gas for the first measurement signal and for the second measurement signal, which calibration data describe a dependence of the first and second measurement signals on the effective pressure and on a list of types of gas, respectively; b) recording a first and a second measured value of the first and second measurement signals, respectively; c) determining a resultant type of gas which best matches the combination of the recorded first measured value and the recorded second measured value, taking into account the first and second calibration data. In one variant, a resultant pressure which is independent of the type of gas is additionally determined. The invention is also directed to an apparatus for earring out the method and to a computer program product.