Systems and methods for modeling gas desorption in a subterranean reservoir include measuring a gas sorption parameter using a crushed core sample from the subterranean reservoir; computing a gas storage capacity of the subterranean reservoir at an initial reservoir pressure based on the gas sorption parameter; generating a three-dimensional (3D) distribution of total organic carbon (TOC) in the subterranean reservoir; estimating a 3D distribution of original adsorbed gas in place of the subterranean reservoir by correlating the gas storage capacity with the 3D distribution of TOC; and predicting the amount of gas desorbed from the subterranean reservoir as the reservoir is depleted.

Systems and methods for modeling gas desorption in a subterranean reservoir include measuring a gas sorption parameter using a crushed core sample from the subterranean reservoir; computing a gas storage capacity of the subterranean reservoir at an initial reservoir pressure based on the gas sorption parameter; generating a three-dimensional (3D) distribution of total organic carbon (TOC) in the subterranean reservoir; estimating a 3D distribution of original adsorbed gas in place of the subterranean reservoir by correlating the gas storage capacity with the 3D distribution of TOC; and predicting the amount of gas desorbed from the subterranean reservoir as the reservoir is depleted.

A transepidermal water loss measurement device includes a cylindrical closed chamber having a closed end and an open end to come into contact with the skin at a position at which a rate of water loss is to be measured and a transepidermal water loss measurement unit that measures a rate of transepidermal water loss of the skin by detecting levels of humidity and changes in humidity level in the closed chamber.

A method and an apparatus determine a content of a foreign gas in a process liquid in which a measurement gas, especially CO.sub.2, has been dissolved. A concentration of the measurement gas is ascertained and a concentration of the gas mixture formed by the measurement gas and the foreign gas is ascertained, especially via a manometric measurement method. The measurement values are supplied to an evaluation unit. A concentration of the foreign gas is determined on the basis of the ascertained concentration of the measurement gas and the ascertained concentration of the gas mixture.

An apparatus for measuring the vapor pressure of a liquid hydrocarbon sample is disclosed. The apparatus comprises a sealed chamber (25) for receiving the sample. The chamber (25) is at least partially defined by a moveable element (26) such that moving the moveable element (26) alters the volume of the chamber (25). The apparatus comprises a displacement sensor (29) configured to measure a displacement of the movable element (26).

An apparatus for measuring the vapor pressure of a liquid hydrocarbon sample is disclosed. The apparatus comprises a sealed chamber (25) for receiving the sample. The chamber (25) is at least partially defined by a moveable element (26) such that moving the moveable element (26) alters the volume of the chamber (25). The apparatus comprises a displacement sensor (29) configured to measure a displacement of the movable element (26).

An apparatus for use in determining the relative vapor pressure of a fluid in an environment in which the apparatus is located, the apparatus comprising a first layer (512) configured to enable a flow of charge carriers from a source electrode (505) to a drain electrode (506), a second layer (513) configured to control the conductance of the first layer (512) using an electric field formed between the first (512) and second layers (513) and a third layer (514) positioned between the first and second layers to prevent a flow of charge carriers therebetween to enable formation of the electric field, wherein the second layer (513) is configured to exhibit a charge distribution on interaction with the fluid, the charge distribution giving rise to the electric field between the first (512) and second (513) layers, and wherein the second layer (513) is configured such that the charge distribution and electric field strength are dependent upon the relative vapor pressure of the fluid in the environment (516), thereby allowing the relative vapor pressure to be derived from a measurement of the conductance of the first layer (512).

An apparatus for use in determining the relative vapor pressure of a fluid in an environment in which the apparatus is located, the apparatus comprising a first layer (512) configured to enable a flow of charge carriers from a source electrode (505) to a drain electrode (506), a second layer (513) configured to control the conductance of the first layer (512) using an electric field formed between the first (512) and second layers (513) and a third layer (514) positioned between the first and second layers to prevent a flow of charge carriers therebetween to enable formation of the electric field, wherein the second layer (513) is configured to exhibit a charge distribution on interaction with the fluid, the charge distribution giving rise to the electric field between the first (512) and second (513) layers, and wherein the second layer (513) is configured such that the charge distribution and electric field strength are dependent upon the relative vapor pressure of the fluid in the environment (516), thereby allowing the relative vapor pressure to be derived from a measurement of the conductance of the first layer (512).

A method for following the degassing of a component placed in a vacuum chamber, comprises: measuring partial pressures P.sub.i for a set M of reference atomic masses, by means of a mass spectrometer connected to the vacuum chamber; determining a degassing rate , at least as a function of the measured partial pressures P.sub.i; and, calculating a slope of the variation in the degassing rate. The degassing rate may advantageously be determined by calculation by means of a relationship of the type: $=\frac{\underset{iM}{\overset{}{.Math.}}{}_i{P}_i}{\underset{i=0}{\overset{N}{.Math.}}{}_i{P}_i}$
where M denotes the set of reference atomic masses, P.sub.i denotes the partial pressures for the atomic masses measured by the mass spectrometer, the coefficients .sub.i denote preset weighting coefficients associated with each partial pressure P.sub.i, and N denotes a maximum atomic mass for which the partial pressure P.sub.i can be measured by the mass spectrometer.

A method for following the degassing of a component placed in a vacuum chamber, comprises: measuring partial pressures P.sub.i for a set M of reference atomic masses, by means of a mass spectrometer connected to the vacuum chamber; determining a degassing rate , at least as a function of the measured partial pressures P.sub.i; and, calculating a slope of the variation in the degassing rate. The degassing rate may advantageously be determined by calculation by means of a relationship of the type: $=\frac{\underset{iM}{\overset{}{.Math.}}{}_i{P}_i}{\underset{i=0}{\overset{N}{.Math.}}{}_i{P}_i}$
where M denotes the set of reference atomic masses, P.sub.i denotes the partial pressures for the atomic masses measured by the mass spectrometer, the coefficients .sub.i denote preset weighting coefficients associated with each partial pressure P.sub.i, and N denotes a maximum atomic mass for which the partial pressure P.sub.i can be measured by the mass spectrometer.