The present disclosure concerns an apparatus (10) and method for reading out an optical chip (20). A light source (13) is arranged for emitting single mode source light (S1) from its emitter surface (A1) towards an optical input (21) of the optical chip (20). A light detector (14) is arranged for receiving measurement light (S2) impinging onto its receiver surface (A2) from an optical output (22) of the optical chip (20), and measuring said received measurement light (S2). The emitted source light (S1) is aligned to enter the optical input (21) of the optical chip (20) and the measurement light (S2) is aligned back onto the receiver surface (A2). The receiver surface (A2) is larger than the emitter surface (A1) for facilitating the overall alignment.

An image inspection apparatus includes: an imaging section for capturing an image of a workpiece from a certain direction; an illumination section for illuminating the workpiece from different directions at least three times; an illumination controlling section for sequentially turning on the illumination sections one by one; an imaging generating section for driving the imaging section to generate a plurality of images; a normal vector calculating section for calculating a normal vector with respect to the surface of the workpiece at each of pixels by use of a pixel value of each of pixels having a corresponding relation among the plurality of images; and a contour image generating section for performing differential processing in an X-direction and a Y-direction on the calculated normal vector at each of the pixels, to generate a contour image that shows a contour of inclination of the surface of the workpiece.

A photometric processing part calculates a normal vector of a surface of a workpiece from a plurality of luminance images acquired by a camera in accordance with the photometric stereo method, and performs synthesis processing of synthesizing at least two images out of an inclination image made up of pixel values based on the normal vector calculated from the plurality of luminance images and at least one reduced image of the inclination image, to generate an inspection image showing a surface shape of the inspection target. In particular, a characteristic size setting part sets a characteristic size which is a parameter for giving weight to a component of a reduced image at the time of performing the synthesis processing. The photometric processing part can generate a different inspection image in accordance with the set characteristic size.

A photometric processing part calculates a normal vector of a surface of a workpiece from a plurality of luminance images acquired by a camera in accordance with the photometric stereo method, and performs synthesis processing of synthesizing at least two images out of an inclination image made up of pixel values based on the normal vector calculated from the plurality of luminance images and at least one reduced image of the inclination image, to generate an inspection image showing a surface shape of the inspection target. In particular, a characteristic size setting part sets a characteristic size which is a parameter for giving weight to a component of a reduced image at the time of performing the synthesis processing. The photometric processing part can generate a different inspection image in accordance with the set characteristic size.

The invention relates to a detection apparatus (1) for detecting particles on or close to a particles detection surface (5) in a first optical detection mode and in a second optical detection mode, wherein a component of a light detection system (8) and/or a component of an optical system (9) of the detection apparatus is arranged to be used in the first detection mode and in the second detection mode. Since a component of the light detection system and/or a component of the optical system is arranged to be used in the first detection mode and in the second detection mode, this component does not need to be provided twice, i.e. for being used in the first detection mode and for being used in the second detection mode. This can lead to a reduced number of components and can make the detection apparatus technically less complex.

Disclosed herein are devices, systems, and methods for analyte sensing with optothermally generated bubbles in biphasic liquid samples. For example, disclosed herein are methods comprising: illuminating a first location of an optothermal substrate with electromagnetic radiation; wherein the optothermal substrate is in thermal contact with a biphasic liquid sample comprising an aqueous solution and a droplet comprising a water-immiscible liquid, the aqueous solution comprising water and a plurality of analytes; thereby: generating a bubble in the biphasic liquid sample proximate the first location of the optothermal substrate via optothermal effects, trapping at least a portion of the plurality of analytes at the gas-liquid interface of the bubble and the aqueous solution, and depositing at least a portion of the trapped analytes onto the optothermal substrate.

Fluorescence imaging systems designs, flow cell devices, and methods of are described herein that enable imaging of three or more axially displaced surfaces without using any optical compensators. The optical systems and flow cell devices herein provides higher throughput analysis for genomics and other imaging applications at a lower cost.