Through-tubing, cased-hole sealed material density can be evaluated using gamma ray measurements. Density evaluation comprises detecting, by at least one detector positioned within a casing of a wellbore including a sealing material positioned between the casing and a subsurface formation, electromagnetic radiation generated in response to nuclear radiation being emitted outward toward the subsurface formation, determining an electromagnetic radiation count based on the detected electromagnetic radiation, selecting at least one of a first reference material having a density that is less than a density of the sealing material and a second reference material having a density that is greater than the density of the sealing material, adjusting the electromagnetic radiation count based on the density of the at least one of the first reference material and the second reference material, and determining a density of the sealing material based on the adjusted electromagnetic radiation count.

Semiconductor structures can be investigated, e.g., in an in-line quality check. An x-ray scattering measurement, e.g., CD-SAXS, can be used for wafer metrology. The x-ray scattering measurement can be configured based on a slice-and-imaging tomographic measurement using a dual-beam device, e.g., including a focused ion beam device and a scanning electron microscope.

The invention is to provide a defect detection device capable of using a compact optical system to detect a plurality of types of defects with high sensitivity and high speed. The defect detection device includes an irradiation system that irradiates light onto an object to be inspected; an optical system that forms scattered light produced by a light irradiation into an image; a microlens array disposed at an image plane of the optical system; an imaging element that is disposed at a position offset from the imaging plane of the optical system and that images light that passes through the microlens array; a mask image storage unit that stores a plurality of mask images generated for each type of defect or each defect direction; and a calculation unit that carries out mask processing on an image obtained from the imaging element using the plurality of mask images and carries out defect detection processing.

A device for examining a sample by X-radiation having a radiation generation system for generating primary radiation, a first goniometer arm on which the radiation generation system is mounted and which is pivotable about a goniometer axis, a detection system configured to detect secondary radiation emanating from the sample, a second goniometer arm on which the detection system is mounted and which is pivotable about the goniometer axis, and an evacuable sample chamber within which the sample is arrangeable in a sample region encompassing a portion of the goniometer axis, the sample chamber being delimited by a sample chamber wall which has a transmission region which is transmissive to the primary radiation and is vacuum-tight, in order to allow the primary radiation to penetrate into the sample chamber and to impinge on the sample region at different angles of incidence.

Methods for determining metrology sites for products includes detecting corresponding objects in measurement data of one or more product samples, and aligning the detected objects are aligned. The methods also include analyzing the aligned objects, and determining metrology sites based on the analysis. Devices use such methods to determine metrology sites for products.

An analysis apparatus, an analysis method, and an analysis program by which even unskilled ones can perform quantitative analysis of a composition of high-performance cement with high precision. An analysis apparatus 100 for performing quantitative analysis of components of cement, includes: a content percentage conversion unit 120 for converting content percentages of major elements of a cement sample to content ratios of main crystal phases composing the cement sample by predetermined formulae, the content percentages being obtained as an elemental analysis result; a scale factor estimation unit 140 for estimating initial values of scale factors of Rietveld analysis from the content ratios of main crystal phases obtained in the conversion; and a Rietveld analysis unit 150 for performing Rietveld analysis with respect to an X-ray diffraction measurement result of the cement sample using the initial values of scale factors previously been estimated to calculate content percentages of respective phases of the cement sample.

The invention relates to an X-ray CT method and in particular a registration-based dark-field tensor tomography method for testing a sample (60) by means of X-rays, with which method a sample (60) is consecutively scanned by means of X-rays in at least two fixed orientations differing from one another while rotating about a fixed rotation axis, in every orientation of the sample (60) on the basis of dark-field signals a plurality of scatter data sets is recorded, and the scatter data sets for different orientations are matched to one another by registration and combined into a common scatter data set reflecting a possible angular dependence of the scatter present due to the sample (60).

Embodiments of the present disclosure disclose a combined scanning X-ray generator, a composite inspection apparatus and an inspection method. The combined scanning X-ray generator includes: a housing; an anode arranged in the housing, the anode including a first end of the anode and a second end of the anode opposite the first end of the anode; a pencil beam radiation source arranged at the first end of the anode and configured to emit a pencil X-ray beam; and a fan beam radiation source arranged at the second end of the anode and configured to emit a fan X-ray beam; wherein the pencil beam radiation source and the fan beam radiation source are operated independently.

A method is carried out with the aid of a particle beam microscope which includes a particle beam column for producing a beam of charged particles, the particle beam column having an optical axis. Furthermore, the particle beam microscope includes a holding device for holding the extracted micro-sample. The method includes holding the extracted micro-sample and an adjacent hinge element via the holding device. The micro-sample adopts a first spatial orientation relative to the optical axis. The method also includes producing a bending edge in the hinge element by way of irradiation with a beam of charged particles such that the adjacent micro-sample is moved in space and the spatial orientation of the micro-sample is altered. The method further includes holding the micro-sample in a second spatial orientation relative to the optical axis, wherein the second spatial orientation differs from the first spatial orientation.

Information of constituent substances of an object is reconstructed with high accuracy without being influenced by a decrease in measurement accuracy even if measurement in which a tube voltage is changed is not performed. A CT apparatus includes: a detection unit configured to obtain measurement information based on a detection result of radiation irradiated based on a constant tube voltage; an obtaining unit configured to obtain second measurement information of the radiation based on a moment of the measurement information obtained by detecting the radiation a plurality of times; a classification unit configured to classify an object into a plurality of substances; and a reconstruction unit configured to reconstruct the information of the constituent substances of the object based on the second information.