An inspection apparatus for inspecting an inspection target surface arranged on an inspection plane, includes an X-ray generation tube having a target including an X-ray generation portion that generates X-rays by irradiation with an electron beam, and configured to emit X-rays to the inspection plane; and an X-ray detector configured to detect X-rays emitted from a foreign substance existing on the inspection target surface irradiated with the X-rays from the X-ray generation portion and totally reflected by the inspection target surface.

A detection system serves for X-ray inspection of an object. An imaging optical arrangement serves to image the object in an object plane illuminated by X-rays generated by an X-ray source. The imaging optical arrangement comprises an imaging optics to image a transfer field in a field plane into a detection field in a detection plane. A detection array is arranged at the detection field. An object mount holds the object to be imaged and is movable relative to the X-ray source via an object displacement drive along at least one lateral object displacement direction in the object plane. A shield stop with a transmissive shield stop aperture is arranged in an arrangement plane in a light path and is movable via a shield stop displacement drive in the arrangement plane. A control device has a drive control unit, which is in signal connection with the shield stop displacement drive and with the object displacement drive for synchronizing a movement of the shield stop displacement drive and the object displacement drive. The result is an optimization of an X-ray illumination of the object to achieve a high-resolution object imaging.

A defect inspection system includes an X-ray generator that generates X-ray to be irradiated to a structure, and an X-ray detector that detects the X-ray generated by the X-ray generator and transmitted through the structure. In particular, the X-ray generator is configured to be moved by a first transporting means, and the X-ray detector is configured to be moved by a second transporting means. The system further includes a control unit configured to control and operate the first transporting means and the second transporting means.

Described herein is a high-energy x-ray imaging system including a stationary gantry, a conveyor assembly configured to convey an object to be imaged through the gantry, a plurality of linear accelerators, a detector array, and a control system. The linear accelerators are arranged in an array within the gantry and are configured to generate high-energy x-ray fan beams to be transmitted through the object. The detector array is positioned opposite the linear accelerators and is configured to collect the high-energy x-ray fan beams transmitted through the object. The control system is configured to energize the linear accelerators according to a predetermined control sequence to generate the high-energy x-ray fan beams, and construct a 3-D image of the object based on data received from the detector array and representative of the high-energy x-ray fan beams transmitted through the object.

An X-ray imaging apparatus comprises a digital X-ray detector housed in a radiation shielded enclosure with multiple pinhole apertures in the front panel of the housing. An X-ray source illuminates a target and X-rays are backscattered towards the X-ray imaging apparatus. The multiple pinhole apertures arranged in a pattern so that each pinhole generates a respective pinhole image on the X-ray detector. The size of each image is controlled by the thickness of the front panel and the width of the pinhole aperture (acting as optical stops), and the distance to the X-ray detector, and these values are selected to prevent overlap between any pair of pinhole images on the X-ray detector. An image processor is used to generate a synthetic combined image of the object form the multiple pinhole images.

Provided is a method of evaluating a deviation of a trajectory of a primary electron beam in a primary optical system in an electron beam observation device including the primary optical system that irradiates a sample with the primary electron beam including a plurality of primary electrons and a secondary optical system that detects, by a detector, a secondary electron beam including a plurality of secondary electrons emitted from the sample irradiated with the primary electron beam.

An X-ray analyzer comprises at least one detector configured to detect a secondary X-ray from a test object irradiated by an X-ray source, and provide a corresponding energy signal; a temperature sensor configured to sense a temperature related to the detector; and a signal processor configured to process the energy signal and provide a temperature compensated output for an X-ray event.

An X-ray generation apparatus includes an X-ray generation unit, a storage container configured to store the X-ray generation unit, and an insulating component arranged between an inner surface of the storage container and at least a part of the X-ray generation unit. The insulating component includes a first insulating member and a second insulating member, the first insulating member includes a first portion having a first surface, and a second portion having a second surface, a step difference is formed by the first surface and the second surface, and the second portion has a thickness smaller than that of the first portion, an adhesive surface of the second insulating member and the second surface of the first insulating member are connected by an adhesive material, and a flatness of the second surface is better than a flatness of the first surface.

A device keeps an electrochemical cell under current and at operating temperature during an X-ray beam diffraction analysis of a first electrode, the cell comprising a solid electrolyte interposed between the electrodes. The device comprises: first and second interconnectors having contact faces contacting the electrodes, which allow a gas flow and exchange between the interconnectors and the electrodes. The contact face of the first interconnector allows an X-ray beam to pass to the first electrode. A thermal and atmospheric containment chamber has an inner cavity housing a stack formed from the cell between the interconnectors and a cover closing the cavity, provided with a window allowing X-rays to pass through, the first interconnector being intended to be arranged facing the cover. The contact face of each interconnector is a slotted element; slotted portions of the slotted element are uniformly arranged and form 30% to 80% of the element's surface area.

The present disclosure provides a wafer inspection technology that involves less degradation of the image quality even when an object to be observed has a variation in height due to warpage, etc. of a wafer. This wafer inspection apparatus obtains an image with less degradation by: adjusting the focal point of an observation optical system to a height measured by a height sensor for measuring wafer surface heights; and further, correcting a switching signal for a CCD line sensor on the basis of stage position data and optical magnification data corresponding to the height so as to make a correction corresponding to the wafer surface height.