A method of carrying out sub-resonant tapping in an atomic force microscope includes causing a probe that is disposed above a sample to be translated in a direction parallel to a horizontal plane defined by the sample and to oscillate in a vertical direction that is perpendicular to the horizontal plane about an equilibrium line that is separated from the horizontal plane by a vertical offset. As a result, the probe repeatedly taps a surface of the sample. Each tap begins with a first contact of the probe on the surface followed by a progressive increase in force exerted by the sample on the probe until a peak force is attained. The vertical offset is controlled by relying at least in part on a feature other than the peak force as a basis for controlling the vertical offset.

A method of carrying out sub-resonant tapping in an atomic force microscope includes causing a probe that is disposed above a sample to be translated in a direction parallel to a horizontal plane defined by the sample and to oscillate in a vertical direction that is perpendicular to the horizontal plane about an equilibrium line that is separated from the horizontal plane by a vertical offset. As a result, the probe repeatedly taps a surface of the sample. Each tap begins with a first contact of the probe on the surface followed by a progressive increase in force exerted by the sample on the probe until a peak force is attained. The vertical offset is controlled by relying at least in part on a feature other than the peak force as a basis for controlling the vertical offset.

The present document describes a device for measuring and/or modifying surface features and/or sub-surface features on or below a surface of a sample. The system comprises a sample carrier, one or more heads, and a support structure. The support structure comprises a reference surface for providing a positioning reference. The heads are separate from the sample carrier and the support structure, and the device further comprises a pick and place manipulator arranged for positioning the heads at respective working positions. The manipulator comprises a gripper and an actuator for moving the gripper, wherein the actuator is arranged for providing a motion in a direction transverse to the reference surface. The gripper is arranged for engaging and releasing the respective heads from the transverse motion. The document also describes a method of measuring and/or modifying surface features on a surface of a sample.

The present document describes a device for measuring and/or modifying surface features and/or sub-surface features on or below a surface of a sample. The system comprises a sample carrier, one or more heads, and a support structure. The support structure comprises a reference surface for providing a positioning reference. The heads are separate from the sample carrier and the support structure, and the device further comprises a pick and place manipulator arranged for positioning the heads at respective working positions. The manipulator comprises a gripper and an actuator for moving the gripper, wherein the actuator is arranged for providing a motion in a direction transverse to the reference surface. The gripper is arranged for engaging and releasing the respective heads from the transverse motion. The document also describes a method of measuring and/or modifying surface features on a surface of a sample.

The present invention provides a scanner capable of achieving both a wide range of measurements and a high-speed and high-precision measurement. A scanner comprising: an outer frame; a first inner frame disposed inside the outer frame; a wide range Y actuator for moving the first inner frame relative to the outer frame in the Y direction; a second inner frame disposed inside the first inner frame; a wide range X actuator for moving the second inner frame relative to the first inner frame in the X direction orthogonal to the Y direction; a third inner frame disposed inside the second inner frame; a narrow range Y actuator for moving the third inner frame relative to the second inner frame in the Y direction; a movable foundation disposed inside the third inner frame; and a narrow range X actuator for moving the movable foundation relative to the third inner frame in the X direction.

The present invention provides a scanner capable of achieving both a wide range of measurements and a high-speed and high-precision measurement. A scanner comprising: an outer frame; a first inner frame disposed inside the outer frame; a wide range Y actuator for moving the first inner frame relative to the outer frame in the Y direction; a second inner frame disposed inside the first inner frame; a wide range X actuator for moving the second inner frame relative to the first inner frame in the X direction orthogonal to the Y direction; a third inner frame disposed inside the second inner frame; a narrow range Y actuator for moving the third inner frame relative to the second inner frame in the Y direction; a movable foundation disposed inside the third inner frame; and a narrow range X actuator for moving the movable foundation relative to the third inner frame in the X direction.

An imaging device for an additive manufacturing system is provided. The additive manufacturing system includes a material. The imaging device includes a high resolution imaging bar including at least one detector array, and an imaging element positioned between the at least one detector array and the material. The high resolution imaging bar is displaced from the material along a first direction and extends along a second direction. The high resolution imaging bar is configured to generate an image of a build layer within the material.

Disclosed herein are devices, systems and methods for in-line, nanoscale metrology. One system comprises monolithic flexure mechanisms with integrated actuators that allow movement and positioning in two axes, with an extremely high degree of accuracy, of a structure comprising one or more scanning probes. This structure is suspended to prevent any destructive interference from a sample, which can be stationary or moving at a nonzero rate, and rigid or flexible in mechanical behavior. This system can be activated at startup and quickly actuate the structure to approach the surface of the sample. Once the system achieves the desired proximity between the one or more probes and the sample, the system maintains that position of the structure to a high degree of accuracy regardless of any disturbances. This array can be moved at varying speeds laterally to match the velocity of any continually moving substrates, thus enabling scanning of moving substrates.

Disclosed herein are devices, systems and methods for in-line, nanoscale metrology. One system comprises monolithic flexure mechanisms with integrated actuators that allow movement and positioning in two axes, with an extremely high degree of accuracy, of a structure comprising one or more scanning probes. This structure is suspended to prevent any destructive interference from a sample, which can be stationary or moving at a nonzero rate, and rigid or flexible in mechanical behavior. This system can be activated at startup and quickly actuate the structure to approach the surface of the sample. Once the system achieves the desired proximity between the one or more probes and the sample, the system maintains that position of the structure to a high degree of accuracy regardless of any disturbances. This array can be moved at varying speeds laterally to match the velocity of any continually moving substrates, thus enabling scanning of moving substrates.

The present invention provides a scanner capable of achieving both a wide range of measurements and a high-speed and high-precision measurement.

A scanner comprising: an outer frame; a first inner frame disposed inside the outer frame; a wide range Y actuator for moving the first inner frame relative to the outer frame in the Y direction; a second inner frame disposed inside the first inner frame; a wide range X actuator for moving the second inner frame relative to the first inner frame in the X direction orthogonal to the Y direction; a third inner frame disposed inside the second inner frame; a narrow range Y actuator for moving the third inner frame relative to the second inner frame in the Y direction; a movable foundation disposed inside the third inner frame; and a narrow range X actuator for moving the movable foundation relative to the third inner frame in the X direction.