It is intended to save time for adjusting a position of a detection unit. In a position adjustment process of a detector, a control device moves the detector obliquely with respect to a boundary line partitioning photodiodes on a plane on which the detector moves and moves the detector so that the position of the center of gravity of a spot of a laser beam and the center of a light-receiving surface coincide in response to the incident of at least a part of the laser beam on the light-receiving surface.

A method includes scanning a probe laterally across a surface so that the probe follows a scanning motion across the surface and steering a detection beam onto the probe via a steering mirror, the detection beam reflecting from the probe in the form of a return beam. The method also includes moving the steering mirror so that the detection beam follows a tracking motion which is synchronous with the scanning motion and the detection beam remains steered onto the probe by the steering mirror and using the return beam to obtain image measurements, each indicative of a measured height of a respective point on the surface. An associated height error measurement is obtained for each point on the surface, each measurement being indicative of a respective error in the measured height. The height error measurements are used to correct the image measurements so as to generate corrected image measurements.

To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope.

An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

An atomic force microscope has dual probes composed of a hinge structure, two cantilever beams and needle tips arranged on free ends of the cantilever beams. The hinge structure is a U-shaped body having two ends respectively extended with a first cantilever beam and a second cantilever beam. The free end of the first cantilever beam and the free end of the second cantilever beam are respectively provided with a first needle tip and a second needle tip. The integrated dual probes is operated by the driving function of the probe clamp. Therefore, only a set of motion control and measurement system of the atomic force microscope is required to realize the rapid in-situ switching function of the dual probes.

Diffused reflection of a laser beam is prevented from adversely affecting the processing of an optical axis adjustment of the laser beam in a scanning probe microscope. In a case where a position of a spot of a laser beam identified based on an image captured by an imaging unit is moved in a direction predicted when the laser beam is moved, a control device of the scanning probe microscope sets a position of the identified spot as an initial position. The control device identifies the position that diffusely reflects the laser beam based on the image captured by the imaging unit and moves the spot from the initial position to the tip of the cantilever by avoiding the position that diffusely reflects the laser beam.

Diffused reflection of a laser beam is prevented from adversely affecting the processing of an optical axis adjustment of the laser beam in a scanning probe microscope. In a case where a position of a spot of a laser beam identified based on an image captured by an imaging unit is moved in a direction predicted when the laser beam is moved, a control device of the scanning probe microscope sets a position of the identified spot as an initial position. The control device identifies the position that diffusely reflects the laser beam based on the image captured by the imaging unit and moves the spot from the initial position to the tip of the cantilever by avoiding the position that diffusely reflects the laser beam.