Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

A scanning probe microscope for high-speed imaging and/or nanomechanical mapping including a scanning probe comprising a cantilever with a tip at the distal end, and means for modulating a tip-sample distance separating the tip from an intended sample to be viewed with the microscope, the means for modulating being adapted to provide a direct cantilever actuation.

Provided is a linear structure for displacement transmission that can be bent in a second direction or a third direction when force in the second direction or the third direction is applied and can transmit a displacement in a first direction from an end of one side to an end of the other side when force in the first direction is applied. The linear structure includes a displacement transmission plate and a plurality of displacement transmission rods disposed radially on the displacement transmission plate to transmit the displacement in the first direction from the end of one side to the end of the other side.

Provided is a linear structure for displacement transmission that can be bent in a second direction or a third direction when force in the second direction or the third direction is applied and can transmit a displacement in a first direction from an end of one side to an end of the other side when force in the first direction is applied. The linear structure includes a displacement transmission plate and a plurality of displacement transmission rods disposed radially on the displacement transmission plate to transmit the displacement in the first direction from the end of one side to the end of the other side.

An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

An atomic-force-microscope-based apparatus and method including hardware and software, configured to collect, in a dynamic fashion, and analyze data representing mechanical properties of soft materials on a nanoscale, to map viscoelastic properties of a soft-material sample. The use of the apparatus as an addition to the existing atomic-force microscope device.

A scanning probe microscope includes a case, an actuator, at least one elastic body, and a probe. The actuator includes a piezoelectric scanner having a cylindrical shape and a sample holder. The piezoelectric scanner is disposed inside the case to be coaxial with the case such that the first end is fixed to the bottom portion. The sample holder is provided at a second end of the piezoelectric scanner. At least one elastic body is disposed so as to be sandwiched between the case and at least one of the piezoelectric scanner and the sample holder.

Diffused reflection of a laser beam is prevented from adversely affecting the processing of an optical axis adjustment of the laser beam in a scanning probe microscope. In a case where a position of a spot of a laser beam identified based on an image captured by an imaging unit is moved in a direction predicted when the laser beam is moved, a control device of the scanning probe microscope sets a position of the identified spot as an initial position. The control device identifies the position that diffusely reflects the laser beam based on the image captured by the imaging unit and moves the spot from the initial position to the tip of the cantilever by avoiding the position that diffusely reflects the laser beam.

Diffused reflection of a laser beam is prevented from adversely affecting the processing of an optical axis adjustment of the laser beam in a scanning probe microscope. In a case where a position of a spot of a laser beam identified based on an image captured by an imaging unit is moved in a direction predicted when the laser beam is moved, a control device of the scanning probe microscope sets a position of the identified spot as an initial position. The control device identifies the position that diffusely reflects the laser beam based on the image captured by the imaging unit and moves the spot from the initial position to the tip of the cantilever by avoiding the position that diffusely reflects the laser beam.