Patent classifications
G01Q20/02
Automated optimization of AFM light source positioning
An atomic force microscope is provided having a controller configured to store one or more positional parameters output by a sensor assembly when a light spot is located at a first preset position on the surface of the cantilever. The controller is further configured to operate an actuator assembly so as to induce movement of the spot away from the first preset position, to detect said movement of the first spot based on a change in the one or more positional parameters output by the sensor assembly, and to operate an optical assembly in response to the detected movement of the first spot to return the first spot to the first preset position.
Automated optimization of AFM light source positioning
An atomic force microscope is provided having a controller configured to store one or more positional parameters output by a sensor assembly when a light spot is located at a first preset position on the surface of the cantilever. The controller is further configured to operate an actuator assembly so as to induce movement of the spot away from the first preset position, to detect said movement of the first spot based on a change in the one or more positional parameters output by the sensor assembly, and to operate an optical assembly in response to the detected movement of the first spot to return the first spot to the first preset position.
APPARATUS AND METHOD FOR IDENTIFYING TARGET POSITION IN ATOMIC FORCE MICROSCOPE
Provided are an apparatus and a method for identifying a target position in an atomic microscope. An apparatus is configured to acquire result data identifying the cantilever from an image using an identification model learned to identify the cantilever based on the image photographed by a photographing unit, and calculate a target position from the cantilever using the acquired result data, in which the result data include at least one of bounding box data representing a bounding box including a boundary of the cantilever and segmentation data obtained by segmenting the cantilever and an object other than the cantilever.
APPARATUS AND METHOD FOR IDENTIFYING TARGET POSITION IN ATOMIC FORCE MICROSCOPE
Provided are an apparatus and a method for identifying a target position in an atomic microscope. An apparatus is configured to acquire result data identifying the cantilever from an image using an identification model learned to identify the cantilever based on the image photographed by a photographing unit, and calculate a target position from the cantilever using the acquired result data, in which the result data include at least one of bounding box data representing a bounding box including a boundary of the cantilever and segmentation data obtained by segmenting the cantilever and an object other than the cantilever.
Chemical nano-identification of a sample using normalized near-field spectroscopy
Apparatus and method for nano-identification a sample by measuring, with the use of evanescent waves, optical spectra of near-field interaction between the sample and optical nanoantenna oscillating at nano-distance above the sample and discriminating background backscattered radiation not sensitive to such near-field interaction. Discrimination may be effectuated by optical data acquisition at periodically repeated moments of nanoantenna oscillation without knowledge of distance separating nanoantenna and sample. Measurement includes chemical identification of sample on nano-scale, during which absolute value of phase corresponding to near-field radiation representing said interaction is measured directly, without offset. Calibration of apparatus and measurement is provided by performing, prior to sample measurement, a reference measurement of reference sample having known index of refraction. Nano-identification is realized with sub-50 nm resolution and, optionally, in the mid-infrared portion of the spectrum.
Chemical nano-identification of a sample using normalized near-field spectroscopy
Apparatus and method for nano-identification a sample by measuring, with the use of evanescent waves, optical spectra of near-field interaction between the sample and optical nanoantenna oscillating at nano-distance above the sample and discriminating background backscattered radiation not sensitive to such near-field interaction. Discrimination may be effectuated by optical data acquisition at periodically repeated moments of nanoantenna oscillation without knowledge of distance separating nanoantenna and sample. Measurement includes chemical identification of sample on nano-scale, during which absolute value of phase corresponding to near-field radiation representing said interaction is measured directly, without offset. Calibration of apparatus and measurement is provided by performing, prior to sample measurement, a reference measurement of reference sample having known index of refraction. Nano-identification is realized with sub-50 nm resolution and, optionally, in the mid-infrared portion of the spectrum.
Method and apparatus for examining a measuring tip of a scanning probe microscope
The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.
Method and apparatus for examining a measuring tip of a scanning probe microscope
The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.
Evaluation system and a method for evaluating a substrate
There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.
Evaluation system and a method for evaluating a substrate
There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.