Patent classifications
G01Q30/02
DEVICE AND METHOD FOR COMPREHENSIVE CHARACTERIZATION, ANALYSIS, HETERO-GENITY AND PURITY QUANTIFICATION OF EXTRACELLULAR VESICLES
An extracellular vesicle characterization and analysis device in terms of their size, phenotype, and cargo content is provided. A method performed with the device to quantify the heterogeneity of extracellular vesicle samples both in terms of size and cargo content and further quantify the purity of extracellular vesicles based on their phenotype and cargo content is further provided. The extracellular vesicle characterization and analysis device includes an atomic force microscope and confocal Raman spectrometer subsystems that will present the phenotypic characterization and cargo analysis of extracellular vesicles, respectively. By processing the topographic images obtained by atomic force microscopy with image processing methods and analyzing them, the dimensional heterogeneity of the extracellular vesicle samples can be quantified and information about their purity can be presented. The confocal Raman spectrometer applies the tip-enhanced Raman spectrum method, performs a heterogeneity quantification and provides data on the purity of the sample.
DEVICE AND METHOD FOR COMPREHENSIVE CHARACTERIZATION, ANALYSIS, HETERO-GENITY AND PURITY QUANTIFICATION OF EXTRACELLULAR VESICLES
An extracellular vesicle characterization and analysis device in terms of their size, phenotype, and cargo content is provided. A method performed with the device to quantify the heterogeneity of extracellular vesicle samples both in terms of size and cargo content and further quantify the purity of extracellular vesicles based on their phenotype and cargo content is further provided. The extracellular vesicle characterization and analysis device includes an atomic force microscope and confocal Raman spectrometer subsystems that will present the phenotypic characterization and cargo analysis of extracellular vesicles, respectively. By processing the topographic images obtained by atomic force microscopy with image processing methods and analyzing them, the dimensional heterogeneity of the extracellular vesicle samples can be quantified and information about their purity can be presented. The confocal Raman spectrometer applies the tip-enhanced Raman spectrum method, performs a heterogeneity quantification and provides data on the purity of the sample.
LASER ANALYSIS DEVICE
A laser analysis device includes a laser analysis unit that a sample is irradiated with laser light, a cover that covers a periphery of the laser analysis unit, so as to prevent the laser light from being emitted to outside, and has a slit in at least a part of the cover, a fastener configured to open and close the slit, and an interlock mechanism including a key provided on the fastener and a detector that detects a state in which the fastener is fully closed, in which in a state where the detector has detected that the fastener is fully closed, laser light having a predetermined intensity or more is introduced into the laser analysis unit.
System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control
In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, using the model to predict the low-probability stochastic defect, determining a process window based on the low-probability stochastic defect, and controlling, based on the process window, a lithography tool to manufacture a device.
System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control
In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, using the model to predict the low-probability stochastic defect, determining a process window based on the low-probability stochastic defect, and controlling, based on the process window, a lithography tool to manufacture a device.
Apparatus and method for examining and/or processing a sample
The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.
Apparatus and method for examining and/or processing a sample
The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.
System and method for low-noise edge detection and its use for process monitoring and control
In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, calibrating, using unbiased measurement data, the model to a specific lithography process, patterning process, or both to generate a calibrated model, using the calibrated model to predict the low-probability stochastic defect; and modifying, based on the low-probability stochastic defect, a variable, parameter, setting, or some combination of a manufacturing process of a device.
System and method for low-noise edge detection and its use for process monitoring and control
In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, calibrating, using unbiased measurement data, the model to a specific lithography process, patterning process, or both to generate a calibrated model, using the calibrated model to predict the low-probability stochastic defect; and modifying, based on the low-probability stochastic defect, a variable, parameter, setting, or some combination of a manufacturing process of a device.
System for simultaneously and microscopically measuring vapor cell coating film energy transfer and relaxation characteristics at nanometer scales
A system for simultaneously and microscopically measuring vapor cell coating film energy transfer and relaxation characteristics at nanometer scales includes a space relaxation characteristic detection unit which includes a laser, an optical isolator, a spatial light filter, a reflector, a Glan-Taylor polarizer, a first quarter-wave plate, a spatial light modulator, a focusing lens, a second quarter-wave plate, a polarizing film, a PD detection unit, an I/V amplification unit, a data acquisition unit, a spectroscope and an optical chopper, an atomic force microscope detection unit for energy transfer micro-areas, a shielding cylinder, a coated alkali metal atomic vapor cell, a data processing unit and a magnetic field controlled coil. The energy transfer micro-area detection unit includes coated samples, a probe, an oscillator, a laser, a four-quadrant photoelectric detection unit, a band-pass filter unit, an automatic gain controller, an adder, a piezoelectric scanning cylinder, a sample table and a PI controller.