The present invention relates to a method and system for quantitatively evaluating surface roughness of an organic pore of kerogen in shale. The method includes: making a shale sample; applying a circle of silver-painted conductive tape on the edge of the shale sample to obtain a processed sample; conducting image scanning on the processed sample to obtain a scanned image; determining a kerogen area according to the scanned image; determining an organic pore area according to the kerogen area; carrying out gridding treatment on the organic pore area to obtain multiple grid cells; adopting double integral calculation on each of the grid cells to obtain the areas of the multiple grid cells; summing each of the areas to obtain the surface area of the organic pore; and evaluating surface roughness of the organic pore according to the surface area of the pore.

In an approach for providing simulation results of an interaction between a transducer head and a magnetic medium, a computer identifies a first raster scan of a sample via a scanning probe microscope. The computer generates a topography image based on the first raster scan of the sample. The computer identifies one or more reference features within the created topography image. The computer calculates an average height based on the one or more reference features. The computer determines a lift distance associated with a probe of the scanning probe microscope. The computer defines a uniform plane based on the calculated average height and the determined lift distance. The computer performs a second raster scan of the sample based on the defined uniform plane. The computer generates a fly-height image based on the second raster scan. The computer provides simulation results based at least in part on the second raster scan.

A technique for allowing users to efficiently specify a region of interest (ROI) on a sample for a certain physical quantity (e.g. phase) other than the altitude is provided. A range-indicating image showing a range that can be observed on a sample is displayed on a navigation window in a sample observation display screen. An ROI-indicating frame for specifying a magnified observation range is superposed on the range-indicating image. A list of thumbnails of previously taken magnified images for the same sample is displayed on an image history display window. When an observer selects any image from this list, the thumbnail of the selected image is mapped onto the range-indicating image. With reference to this image, the observer can change the position, size and/or angle of the ROI-indicating frame by a mouse operation. In response to this operation, a magnified image of the sample within the new ROI is acquired.

A technique for allowing users to efficiently specify a region of interest (ROI) on a sample for a certain physical quantity (e.g. phase) other than the altitude is provided. A range-indicating image showing a range that can be observed on a sample is displayed on a navigation window in a sample observation display screen. An ROI-indicating frame for specifying a magnified observation range is superposed on the range-indicating image. A list of thumbnails of previously taken magnified images for the same sample is displayed on an image history display window. When an observer selects any image from this list, the thumbnail of the selected image is mapped onto the range-indicating image. With reference to this image, the observer can change the position, size and/or angle of the ROI-indicating frame by a mouse operation. In response to this operation, a magnified image of the sample within the new ROI is acquired.

An apparatus and method of operating an atomic force profiler (AFP), such as an AFM, using a feedforward control signal in subsequent scan lines of a large area sample to achieve large throughput advantages in, for example, automated applications.

The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.

Aspects of the invention include determining, by a first AFM tip, a first snap-off force of a solid surface immersed in a first fluid, determining, by a second AFM tip, a second snap-off force, determining, by a third AFM tip, a third snap-off force, determining, by the first AFM tip, a fourth snap-off force of a droplet of the first fluid immersed in the second fluid on the solid surface, determining, by the second AFM tip, a fifth snap-off force, determining, by the third AFM tip, a sixth snap-off force, determining a first capillary force for first AFM tip and first droplet based on first snap-off force and fourth snap-off force, determining a second capillary force for second AFM tip and first droplet and a third capillary force for third AFM tip and first droplet, and determining interfacial tension between first fluid and second fluid based on the capillary forces.

A lapping system for lapping portions of a workpiece. The lapping system includes, a lap that is defined by a surface. Portions of the surface are a lapping surface. The lapping surface has a coating that enhances material removal from a workpiece in a lapping process. The lapping system further includes, a scanning probe microscope having a tip and a substrate. The scanning probe microscope controls lapping motion of the lap and workpiece.

System and method for optical alignment of a near-field system, employing reiterative analysis of amplitude (irradiance) and phase maps of irradiated field obtained in back-scattered light while adjusting the system to arrive at field pattern indicative of and sensitive to a near-field optical wave produced by diffraction-limited irradiation of a tip of the near-field system. Demodulation of optical data representing such maps is carried out at different harmonics of probe-vibration frequency. Embodiments are operationally compatible with methodology of chemical nano-identification of sample utilizing normalized near-field spectroscopy, and may utilize suppression of background contribution to collected data based on judicious coordination of data acquisition with motion of the tip. Such coordination may be defined without knowledge of separation between the tip and sample. Computer program product with instructions effectuating the method and operation of the system.

System and method for optical alignment of a near-field system, employing reiterative analysis of amplitude (irradiance) and phase maps of irradiated field obtained in back-scattered light while adjusting the system to arrive at field pattern indicative of and sensitive to a near-field optical wave produced by diffraction-limited irradiation of a tip of the near-field system. Demodulation of optical data representing such maps is carried out at different harmonics of probe-vibration frequency. Embodiments are operationally compatible with methodology of chemical nano-identification of sample utilizing normalized near-field spectroscopy, and may utilize suppression of background contribution to collected data based on judicious coordination of data acquisition with motion of the tip. Such coordination may be defined without knowledge of separation between the tip and sample. Computer program product with instructions effectuating the method and operation of the system.