A method of operating a scanning probe system that includes a probe support and probes carried by the probe support is disclosed. Each probe includes a cantilever extending from the support to a free end and a tip carried by the free end. The system is operated to perform interaction cycles, each including in an approach phase, moving the support so that the tips move together towards the sample surface; in a detection step, generating a surface signal on detection of an interaction of the tip(s) of a first subset of the probes with the sample surface before the rest of the probes have interacted with the sample; in a response step changing a shape of the cantilever(s) of the first subset in response to the generation of the surface signal; and in a retract phase moving the support so that the tips retract together away from the sample surface.

The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.

The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.

There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.

There may be provided an evaluation system that may include spatial sensors that include atomic force microscopes (AFMs) and a solid immersion lens. The AFMs are arranged to generate spatial relationship information that is indicative of a spatial relationship between the solid immersion lens and a substrate. The controller is arranged to receive the spatial relationship information and to send correction signals to the at least one location correction element for introducing a desired spatial relationship between the solid immersion lens and the substrate.

The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.

A method of detecting the positions of a plurality of probes. An input beam is directed into an optical device and transformed into a plurality of output beamlets which are not parallel with each other. Each output beamlet is split into a sensing beamlet and an associated reference beamlet. Each of the sensing beamlets is directed onto an associated one of the probes with an objective lens to generate a reflected beamlet which is combined with its associated reference beamlet to generate an interferogram. Each interferogram is measured to determine the position of an associated one of the probes. A similar method is used to actuate a plurality of probes. A scanning motion is generated between the probes and the sample. An input beam is directed into an optical device and transformed into a plurality of actuation beamlets which are not parallel with each other.

A method of detecting the positions of a plurality of probes. An input beam is directed into an optical device and transformed into a plurality of output beamlets which are not parallel with each other. Each output beamlet is split into a sensing beamlet and an associated reference beamlet. Each of the sensing beamlets is directed onto an associated one of the probes with an objective lens to generate a reflected beamlet which is combined with its associated reference beamlet to generate an interferogram. Each interferogram is measured to determine the position of an associated one of the probes. A similar method is used to actuate a plurality of probes. A scanning motion is generated between the probes and the sample. An input beam is directed into an optical device and transformed into a plurality of actuation beamlets which are not parallel with each other.

Provided is a scanning probe microscope, and in particular, a scanning probe microscope capable of scanning a large area using a probe including a plurality of conductive tips and capable of simply generating a surface image of a sample with high resolution by recognizing only two binary states of contact/non-contact between the conductive tips and a surface of the sample.

Provided is a scanning probe microscope, and in particular, a scanning probe microscope capable of scanning a large area using a probe including a plurality of conductive tips and capable of simply generating a surface image of a sample with high resolution by recognizing only two binary states of contact/non-contact between the conductive tips and a surface of the sample.