Patent classifications
G02B21/18
Systems and methods for conducting contact-free thickness and refractive-index measurements of intraocular lenses using a self-calibrating dual confocal microscopy
Systems and methods for conducting contact-free thickness and refractive-index measurements of transparent objects, such as intraocular lenses using a dual confocal microscopy system are disclosed.
Systems and methods for conducting contact-free thickness and refractive-index measurements of intraocular lenses using a self-calibrating dual confocal microscopy
Systems and methods for conducting contact-free thickness and refractive-index measurements of transparent objects, such as intraocular lenses using a dual confocal microscopy system are disclosed.
Expediting spectral measurement in semiconductor device fabrication
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Expediting spectral measurement in semiconductor device fabrication
A device and method for expediting spectral measurement in metrological activities during semiconductor device fabrication through interferometric spectroscopy of white light illumination during calibration, overlay, and recipe creation.
Method and systems for ballistics imaging and comparison
Methods and systems for collecting high definition images of spent firearm cartridges under different illumination conditions described herein. Features indicative of firing pin impact with each spent firearm cartridge are extracted and compared to features extracted from different spent firearm cartridges. The likelihood that the cartridges were fired from the same firearm is determined based on the differences between the extracted features. A cartridge fixture locates a spent firearm cartridge inside an imaging chamber illuminated by different combinations of illumination devices located in different locations with respect to the spent firearm cartridge. Collected images are filtered by a trained image feature filter to extract features indicative of a firing pin strike. Features extracted from different spent firearm cartridges are compared to determine the likelihood that the spent firearm cartridges were fired from the same firearm based on one or more error metrics characterizing feature differences.
Method and systems for ballistics imaging and comparison
Methods and systems for collecting high definition images of spent firearm cartridges under different illumination conditions described herein. Features indicative of firing pin impact with each spent firearm cartridge are extracted and compared to features extracted from different spent firearm cartridges. The likelihood that the cartridges were fired from the same firearm is determined based on the differences between the extracted features. A cartridge fixture locates a spent firearm cartridge inside an imaging chamber illuminated by different combinations of illumination devices located in different locations with respect to the spent firearm cartridge. Collected images are filtered by a trained image feature filter to extract features indicative of a firing pin strike. Features extracted from different spent firearm cartridges are compared to determine the likelihood that the spent firearm cartridges were fired from the same firearm based on one or more error metrics characterizing feature differences.
Illumination apparatus optimized for synthetic aperture optics imaging using minimum selective excitation patterns
A synthetic aperture optics (SAO) imaging method minimizes the number of selective excitation patterns used to illuminate the imaging target, based on the objects' physical characteristics corresponding to spatial frequency content from the illuminated target and/or one or more parameters of the optical imaging system used for SAO. With the minimized number of selective excitation patterns, the time required to perform SAO is reduced dramatically, thereby allowing SAO to be used with DNA sequencing applications that require massive parallelization for cost reduction and high throughput. In addition, an SAO apparatus optimized to perform the SAO method is provided. The SAO apparatus includes a plurality of interference pattern generation modules that can be arranged in a half-ring shape.
Illumination apparatus optimized for synthetic aperture optics imaging using minimum selective excitation patterns
A synthetic aperture optics (SAO) imaging method minimizes the number of selective excitation patterns used to illuminate the imaging target, based on the objects' physical characteristics corresponding to spatial frequency content from the illuminated target and/or one or more parameters of the optical imaging system used for SAO. With the minimized number of selective excitation patterns, the time required to perform SAO is reduced dramatically, thereby allowing SAO to be used with DNA sequencing applications that require massive parallelization for cost reduction and high throughput. In addition, an SAO apparatus optimized to perform the SAO method is provided. The SAO apparatus includes a plurality of interference pattern generation modules that can be arranged in a half-ring shape.
Illumination device
An illumination device for an optical device, a microscope or a macroscope includes a first illumination source configured to emit light which is directed via an illumination beam path onto an object to be illuminated that is arranged in an object plane. At least one second illumination source is positionable in the illumination beam path, and is transparent or semitransparent as well as self-luminous. The at least one second illumination source is configured to allow light emitted from the first illumination source to pass through at least in part. The object plane having the object to be illuminated is configured to be illuminated both by the first and by the at least one second illumination source.
Illumination device
An illumination device for an optical device, a microscope or a macroscope includes a first illumination source configured to emit light which is directed via an illumination beam path onto an object to be illuminated that is arranged in an object plane. At least one second illumination source is positionable in the illumination beam path, and is transparent or semitransparent as well as self-luminous. The at least one second illumination source is configured to allow light emitted from the first illumination source to pass through at least in part. The object plane having the object to be illuminated is configured to be illuminated both by the first and by the at least one second illumination source.