Example display devices include a waveguide configured to propagate visible light under total internal reflection in a direction parallel to a major surface of the waveguide. The waveguide has formed thereon an outcoupling element configured to outcouple a portion of the visible light in a direction normal to the major surface of the waveguide. The example display devices additionally include a polarization-selective notch reflector disposed on a first side of the waveguide and configured to reflect visible light having a first polarization while transmitting the portion of the visible light having a second polarization. The example display devices further include a polarization-independent notch reflector disposed on a second side of the waveguide and configured to reflect visible light having the first polarization and the second polarization, where the polarization-independent notch reflector is configured to convert a polarization of visible light reflecting therefrom.

According to an example aspect of the present invention, there is provided a lens for a Microelectrical System, MEMS, mirror apparatus, comprising a circular top surface, the circular top surface being provided with a recess having an inclined surface extending from the circular top surface and a side wall having an inclined section extending from the circular top surface, wherein the inclined section is inclined towards the recess and the inclined surface is inclined outward of the recess towards the inclined section.

A facet assembly is a constituent part of a facet mirror for an illumination optical unit for projection lithography. The facet assembly has a facet with a reflection surface for reflecting illumination light. A facet main body of the facet assembly has at least one hollow chamber. A reflection surface chamber wall of the hollow chamber forms at least one portion of the reflection surface. An actuator control apparatus of the facet assembly is operatively connected to the hollow chamber for the controlled deformation of the reflection surface chamber wall. The result is a facet assembly that is usable flexibly as a constituent part of a facet mirror equipped therewith within an illumination optical unit for projection lithography.

The optical control apparatus includes a light source, a light collecting section, and an optical path control section. The light source emits light. The light collecting section collects the light emitted from the light source and illuminates the light onto an object.

An electro-responsive gel lens having automatic multifocal and image stabilization functions according to the present invention comprises: a first electrode and a second electrode formed on a substrate and having different polarities; and a transmissive part which is formed of an electroactive polymer, and the shape of which is deformed when a voltage is applied to the first electrode and the second electrode, wherein at least one of the first electrode and the second electrode is formed in the plural, and a voltage is individually applied so as to change the shape of the transmissive part in three dimensions, such that the location of the focal point of light passing through the transmissive part is changed in three dimensions.

A method of scanning a laser over a field of view, the method comprising: providing a laser to produce the laser beam; rasterizing the laser beam over a first sub-area of the field of view; deflecting the laser beam to a second sub-area of the field of view; and rasterizing the laser beam over the second sub-area of the field of view; and capturing image information produced by the laser beam so that, for each sub-area of the field of view, the rasterized laser beam defines a plurality of image segments; for each segment calculating an image correction and applying a correction to the laser according to the calculated image correction for the segment, and corresponding system.

An optical transmitting apparatus is disclosed, in the apparatus, an array light source include M*N light sources, and an included angle between any column of light sources in the N columns of light sources and any row of light sources in the M rows of light sources is a preset angle. The array light source is located on a first side of a collimating lens, a plane on which the array light source is located is perpendicular to an optical axis of the collimating lens, and a distance between the plane on which the array light source is located and a center point of the collimating lens is a focal length of the collimating lens. An rotatable scanning mirror is located on a second side of the collimating lens, and a center point of a reflective surface of the scanning mirror is on the optical axis of the collimating lens.

A micromechanical mirror device, a mirror system, and a method for producing a micromechanical mirror device are disclosed. The mirror device comprises a first mirror element, which is flat, and a second mirror element, which is flat. The first and second mirror elements are arranged substantially plane-parallel. An intermediate space between the first and second mirror elements has a lower index of refraction than one or both of the first mirror element and second mirror element. The first and second mirror elements are locally spaced apart from each other by at least one support structure. The support structure overlaps with the first and second mirror elements in an axial direction, which is perpendicular to the first and second mirror elements. The support structure includes a material that is different from a material from which one or both of the first and second mirror elements are formed.

Methods, apparatuses, and methods of manufacture are described that provide one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended which reduces moment of inertia during use.

An optical scanning system includes one or more Micro-Electro-Mechanical System (MEMS) Micro-Mirror Arrays (MMAs) used to scan a field-of-view (FOV) over a field-of-regard (FOR). The MEMS MMA is configured such that optical radiation from each point in the FOV does not land on or originate from out-of-phase mirror segments and a diffraction limited resolution of the optical system is limited by the size of the entrance pupil and not by the size of individual mirrors.