G02B27/0006

MIRROR

The present invention includes a mirror main body formed in a polygonal shape in a plan view and having a first main face that reflects an image, a second main face that is opposite to the first main face, and a peripheral edge face that connects the first main face and the second main face to each other, in which the peripheral edge face includes a plurality of first end faces and a second end face that connects the adjacent first end faces, and the second end face constitutes a first chamfered portion formed at an outer edge of the mirror main body in a plan view.

LITHOGRAPHY EXPOSURE SYSTEM WITH DEBRIS REMOVING MECHANISM

A lithography system includes an extreme ultraviolet (EUV) light source, a reticle stage, a reflection layer, and a plurality of light permeable protrusions. The EUV light source is configured for generating an EUV light beam. The reticle stage is configured for holding a reticle with a front surface of the reticle facing in a downward direction. The reflection layer is below the reticle stage. The light permeable protrusions are formed on the reflection layer. Each of the light permeable protrusions includes a bouncing surface facing in a direction that forms an acute angle with the downward direction. A first portion of the EUV light beam from the EUV light source passes through the bouncing surface of each of the light permeable protrusions to the reflection layer and is reflected to the reticle by the reflection layer.

OPTICAL WINDOW CLEANING DEVICE, OPTICAL WINDOW CLEANING METHOD AND UNDERWATER OPTICAL DEVICE

Disclosed is an optical window cleaning device, including: a cleaning brush; and a wiper arm. The wiper arm includes a first link, a torsion mechanism, a second link and a wiper arm drive system. A second end of the first link is hinged to a first end of the second link. The cleaning brush is hinged to a first end of the first link, a rotation trajectory of the cleaning brush and a rotation trajectory of a hinge joint between the second end of the first link and the first end of the second link are both located in a first plane. A rotation trajectory of the second link and the rotation trajectory of the hinge joint are located in the first plane. The torsion mechanism provides the first link and the second link with a force that rotates the first link relative to the second link.

DIFFRACTIVE OPTICAL MEMBER AND VIRTUAL IMAGE DISPLAY DEVICE
20220381966 · 2022-12-01 · ·

A diffractive optical member includes a hologram element, a support member that supports the hologram element by contacting the hologram element from one side, and a covering film member that is a first film member and covers the hologram element by contacting the hologram element from a side opposite to the one side. The covering film member includes a coupling portion that is in contact with the support member, and the coupling portion is separated from the hologram element.

AUTOMATED LENS CLEANING FOR A CAMERA ASSEMBLY BASED ON IMAGE RECOGNITION IN A WASHING MACHINE APPLIANCE

A washing machine appliance includes a camera assembly mounted in view of a wash chamber for obtaining images of the wash chamber. The lens of the camera assembly is positioned adjacent a water outlet of a water dispenser and a controller is configured to facilitate an automated cleaning method for the camera assembly, the method including obtaining one or more images of the wash chamber using the camera assembly, analyzing the one or more images to determine an image quality, determining that the image quality has dropped below a quality threshold, and operating the water dispenser to perform a lens cleaning operation in response to determining that the image quality has dropped below the quality threshold.

COUNTERFLOW GAS NOZZLE FOR CONTAMINATION MITIGATION IN EXTREME ULTRAVIOLET INSPECTION SYSTEMS

Systems and methods for mitigating and reducing contamination of one or more components of overlay inspection systems are disclosed. Specifically, embodiments of the present disclosure may utilize a counterflow of purge gas through a counterflow nozzle to reduce the presence of contaminants within one or more portions of an inspection system. The system may include a source chamber, one or more vacuum chambers, an intermediate focus housing having an aperture, an illumination source configured to generate and direct illumination through the aperture in an illumination direction, and a counterflow nozzle configured to direct a counterflow of purge gas into the source chamber in a direction opposite the illumination direction.

Cleaning device and imaging unit including the same

A cleaning device for an imaging unit includes a housing that holds an imaging section, a protection cover provided in the visual field of the imaging section, a vibrator section that vibrates the protection cover, and a cleaning nozzle that discharges a cleaning liquid. The cleaning liquid discharged by the discharge section reaches a surface of side of the protection cover that is opposite to the side thereof adjacent to or in a vicinity of the imaging section. According to the vibrator section vibrating the protection cover, a portion of surface of the protection cover exhibits an amount of displacement larger than that of a portion of surface of the protection cover that the discharged cleaning liquid has reached.

Endoscope defogging

An endoscope includes a light source coupled to emit light, and a lens disposed proximate to a distal tip of the endoscope tube and structured to absorb at least some of the light. A controller is coupled to the light source, and the controller includes logic that when executed by the controller causes the endoscope to perform operations, including adjusting an emission profile of the light source to heat the lens with the light, and heating the lens mitigates formation of fog on the lens.

EUV radiation source apparatus for lithography

An EUV collector mirror for an extreme ultra violet (EUV) radiation source apparatus includes an EUV collector mirror body on which a reflective layer as a reflective surface is disposed, a heater attached to or embedded in the EUV collector mirror body and a drain structure to drain melted metal from the reflective surface of the EUV collector mirror body to a back side of the EUV collector mirror body.

Cleaning apparatus for a detection surface of a detection element
11516371 · 2022-11-29 · ·

A cleaning apparatus that cleans a detection surface of a detection element, comprises an attachment to which a detection apparatus including the detection element can be attached, a communication unit configured to communicate with the detection apparatus, a cleaning unit configured to clean the detection surface of the detection element, and a control unit configured to control a driving unit of the detection element included in the detection apparatus through the communication unit. When cleaning by the cleaning unit, the control unit controls the position of the detection element by driving the driving unit through the communication unit.