G02B27/50

Method and device for measuring wavefront using diffraction grating, and exposure method and device

A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.

High Speed Random Access Variable Focusing and Steering of a Patterned Line
20200041865 · 2020-02-06 ·

A patterned line of optical radiation can be steered in the other two directions (e.g., line patterned in y, steered in x and z) with a 1-D phase shifter array in a Fourier optics configuration. Preferably the patterned line is provided by forming a line focus and modulating it with an array of grating light valve devices in an amplitude modulation configuration. Phase modulation is preferably provided with an array of grating light valve devices in a phase modulation configuration.

EFFICIENT, DYNAMIC, HIGH CONTRAST LENSING WITH APPLICATIONS TO IMAGING, ILLUMINATION AND PROJECTION
20200014895 · 2020-01-09 ·

A new projector design combines one spatial light modulator that affects only the phase of the illumination, and one spatial light modulator that only affects its amplitude (intensity). The phase-only modulator curves the wavefront of light and acts as a pre-modulator for a conventional amplitude modulator. This approach works with both white light and laser illumination, generating a coarse image representation efficiently, thus enabling, within a single image frame, significantly elevated highlights as well as darker black levels while reducing the overall light source power requirements.

EFFICIENT, DYNAMIC, HIGH CONTRAST LENSING WITH APPLICATIONS TO IMAGING, ILLUMINATION AND PROJECTION
20200014895 · 2020-01-09 ·

A new projector design combines one spatial light modulator that affects only the phase of the illumination, and one spatial light modulator that only affects its amplitude (intensity). The phase-only modulator curves the wavefront of light and acts as a pre-modulator for a conventional amplitude modulator. This approach works with both white light and laser illumination, generating a coarse image representation efficiently, thus enabling, within a single image frame, significantly elevated highlights as well as darker black levels while reducing the overall light source power requirements.

Single shot full-field reflection phase microscopy

The present invention relates to a full-field reflection phase microscope. In a preferred embodiment, the invention can combine low-coherence interferometry and off-axis digital holographic microscopy (DHM). The reflection-based DHM provides highly sensitive and a single-shot imaging of cellular dynamics while the use of low coherence source provides a depth-selective measurement. A preferred embodiment of the system uses a diffraction grating in the reference arm to generate an interference image of uniform contrast over the entire field-of-view albeit low-coherence light source. With improved path-length sensitivity, the present invention is suitable for full-field measurement of membrane dynamics in live cells with sub-nanometer-scale sensitivity.

Single shot full-field reflection phase microscopy

The present invention relates to a full-field reflection phase microscope. In a preferred embodiment, the invention can combine low-coherence interferometry and off-axis digital holographic microscopy (DHM). The reflection-based DHM provides highly sensitive and a single-shot imaging of cellular dynamics while the use of low coherence source provides a depth-selective measurement. A preferred embodiment of the system uses a diffraction grating in the reference arm to generate an interference image of uniform contrast over the entire field-of-view albeit low-coherence light source. With improved path-length sensitivity, the present invention is suitable for full-field measurement of membrane dynamics in live cells with sub-nanometer-scale sensitivity.

OPTICAL DETECTION OF AN OBJECT IN A TURBID MEDIUM USING AN OPTICAL VORTEX

A method and system for imaging in degraded visual environments. The system includes a laser that is positioned to transmit a Gaussian beam toward a target object located within the degraded visual environment. An optical receiver is positioned to receive return signals. A helical phase element is positioned between the target object and the optical receiver. The return signals pass through the helical phase element. The helical phase element separates coherent and incoherent light by imparting orbital angular momentum on the coherent returns to form an optical vortex.

Measurement of a change in a geometrical characteristic and/or position of a workpiece

A method for measuring a spatial distortion of a target surface (110) of a workpiece (110A). Light is transmitted twice through a reference pattern-generator (104) and impinged upon a workpiece pattern-generator (108). Then, with an optical detector (116), first and second beams formed by the light as a result of interaction with two pattern- generators (104) (106) is acquired to produce a signal characterizing geometry of interference fringes formed at the detector (116) by the first and second beams. Indicia representing at least one of a type and a value of spatial distortion of the target surface (110) is generated and recorded. A system embodying the implementation of the method.

Measurement of a change in a geometrical characteristic and/or position of a workpiece

A method for measuring a spatial distortion of a target surface (110) of a workpiece (110A). Light is transmitted twice through a reference pattern-generator (104) and impinged upon a workpiece pattern-generator (108). Then, with an optical detector (116), first and second beams formed by the light as a result of interaction with two pattern- generators (104) (106) is acquired to produce a signal characterizing geometry of interference fringes formed at the detector (116) by the first and second beams. Indicia representing at least one of a type and a value of spatial distortion of the target surface (110) is generated and recorded. A system embodying the implementation of the method.

METHOD AND DEVICE FOR MEASURING WAVEFRONT, AND EXPOSURE METHOD AND DEVICE
20190219451 · 2019-07-18 ·

A wavefront measuring device and method obtain wavefront information of an optical system. The method including: irradiating the optical system with a light beam; allowing the light beam passed via the optical system to come into a diffraction grating having periodicity in a first direction; and obtaining the wavefront information based on an interference fringe formed by light beams generated from the diffraction grating. The diffraction grating including: first portions which allow light to pass therethrough; and second portions which shield light, each of the second portions being provided between two of the first portions. A ratio between a width of one of the first portions in the first direction and a width of one of the second portions in the first direction is changed in the first direction, the one of the first portions and the one of the second portions being adjacent to each other.