Various embodiments for a multi-focal selective illumination microscopy (SIM) system for generating multi-focal patterns of a sample are disclosed. The embodiments of the multi-focal SIM system perform a focusing, scaling and summing operation on each generated multi-focal pattern in a sequence of multi-focal patterns that completely scan the sample to produce a high resolution composite image.

Exemplary reflective display components are described. These reflective display components may include a microwell layer having a first and a second quantum dot well that each include a plurality of nanoparticles configured to emit a color of light. The microwell layer further has a third well. The reflective display components further include an electrowetting layer positioned above the microwell layer, where the electrowetting layer is operable to independently adjust an intensity of light emitted from the first and second quantum dot wells and the third well in the microwell layer.

The present invention discloses a quantum-dot film, wherein the quantum-dot film comprises a binder and a plurality of quantum dots dispersed in the binder, wherein the plurality of quantum dots are capable of being water-resistant and oxygen-resistant.

The present invention discloses a quantum-dot composite optical film comprising: a plurality of quantum dots dispersed in the optical film, wherein the plurality of quantum dots are capable of being water-resistant and oxygen-resistant; and a plurality of prisms, disposed over the quantum-dot layer.

An optical system has an illumination optical assembly, a detection optical assembly, a wavefront shaping device, and a controller. The illumination optical assembly focuses interrogating optical radiation to a focal point on or in a sample. The interrogating optical radiation propagates to the focal point along a first optical axis. The detection optical assembly direct optical radiation emanating from the focal point to a detector. The emanating optical radiation propagates from the focal point along a second optical axis. The wavefront shaping device is disposed in an optical path of the interrogating optical radiation or in an optical path of the emanating optical radiation. The controller sets a configuration of the wavefront shaping device to correct for aberration. The first optical axis is at a non-zero angle with respect to the second optical axis.

An image acquisition method in which a pulsed illumination beam emitted from a light source is scanned while being focused at a sample, signal light generated as a result of a non-linear optical process at each scanning position is detected, and an image of the sample is generated on a basis of the detected signal light, the image acquisition method including: acquiring a mixed image, which includes in-focus signal light generated at a focal position of the illumination beam in the sample and which also includes out-of-focus signal light; acquiring an image of the out-of-focus signal light on a basis of a plurality of mixed images having mutually different intensities of the out-of-focus signal light; and acquiring an image of the in-focus signal light by subtracting the image of the out-of-focus signal light acquired, from the mixed image acquired.

In one embodiment, a microscopy system includes a first objective positioned adjacent to a sample to be imaged, the first objective being configured to both illuminate the sample with light and collect light from the sample, and a remote imaging module positioned remotely from the first objective and the sample, the remote imaging module being configured to rotate the image plane of the collected light.

A scanning microscope includes a light source for generating a light beam having a wavelength, , and beam-forming optics configured for receiving the light beam and generating a quasi-Bessel excitation beam that is directed into a sample. The quasi-Bessel beam has a lateral FWHM and an axial FWHM that is greater than ten times the lateral FWHM, and the beam-forming optics include an excitation objective having an axis oriented in a first direction. The microscope includes beam scanning optics configured for scanning the quasi-Bessel beam in one or more directions that are substantially perpendicular to the first direction, and a detector configured for detecting signal light received from positions within the sample that are illuminated by the quasi-Bessel beam. The signal light is generated in response to an interaction of the excitation beam with the sample, and the signal light is imaged, at least in part, by the excitation objective, onto the detector.

A rigid-scope optical system includes: an image-formation optical system that causes an image in each of wavelength bands to be formed in a predetermined imaging device, the wavelength bands including a fluorescence wavelength band and a visible light wavelength band; and a color-separation-prism optical system having a dichroic film that separates an optical path of light to be imaged into an optical path of the visible light wavelength band and an optical path of the fluorescence wavelength band, in which the image-formation optical system causes the respective images to be formed in a fluorescence imaging device and a visible light imaging device, the fluorescence imaging device and the visible light imaging device being disposed to cause an amount of misalignment to correspond to a difference between an optical path length of fluorescence and an optical path length of visible light.

A phosphor element includes: a phosphor part having an incident face of the excitation light, an opposing face opposing the incident face, and a side face, the phosphor part converting at least a part of the excitation light incident onto the incident face into the fluorescence and emitting the fluorescence from the incident face; an integral low refractive index layer on the side face and opposing face of the phosphor part and having a refractive index lower than that of the phosphor part; and an integral reflection film covering a surface of the low refractive index layer. The area of the incident face of the phosphor part is larger than the area of the opposing face.