Patent classifications
G03B27/32
CONTROL APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
The present invention provides a control apparatus for performing synchronous control to synchronize driving of a second moving member so as to follow driving of a first moving member, including a feedforward control system that includes a calculator configured to obtain an input/output response of the second moving member and position deviations of the first moving member and the second moving member while driving the first moving member and the second moving member in synchronism with each other, and calculate a feedforward manipulated variable based on the input/output response of the second moving member and the synchronous error between the first moving member and the second moving member obtained from the position deviations of the first moving member and the second moving member.
Apparatus for dispensing liquid material and method for fabricating semiconductor device
The present disclosure provides an apparatus for dispensing liquid material, including a dispensing arm, a wafer holder against the dispensing arm, a first nozzle on the dispensing arm, a first distance laterally spacing the first nozzle and a center of the wafer holder, and a first height vertically spacing the first nozzle and a surface of the wafer holder, and a second nozzle on the dispensing arm, a second distance laterally spacing the second nozzle and the center of the wafer holder, and a second height vertically spacing the second nozzle and the surface of the wafer holder, wherein the second distance is greater than the first distance, and the first height is greater than the second height.
Substrate processing apparatus, substrate processing method and recording medium
A substrate processing apparatus includes a film forming processing unit configured to form a metal-containing resist film on a substrate; a heat treatment unit configured to perform a heating processing on the substrate on which the film is formed and in which an exposure processing is performed on the film; a developing processing unit configured to perform a developing processing on the film formed on the substrate on which the heating processing is performed; and an adjustment controller configured to reduce a difference between substrates in an amount of water that reacts in the film formed on the substrate during the heating processing.
Image reading apparatus
An image reading apparatus includes a medium mounting portion configured to mount a medium; a feeding means configured to feed a medium from the medium mounting portion; at least one edge guide each configured to regulate a corresponding one of at least one medium width direction edge of the medium having been mounted on the medium mounting portion; a reading means configured to read the medium and disposed on a further downstream side than the at least one edge guide in the medium feeding direction; and at least one medium detection means configured to detect the medium and disposed on a further downstream side than the at least one edge guide in the medium feeding direction and further outside in the medium width direction than at least one edge regulation position for the edge regulation by the at least one edge guide.
Image reading apparatus
An image reading apparatus includes a medium mounting portion configured to mount a medium; a feeding means configured to feed a medium from the medium mounting portion; at least one edge guide each configured to regulate a corresponding one of at least one medium width direction edge of the medium having been mounted on the medium mounting portion; a reading means configured to read the medium and disposed on a further downstream side than the at least one edge guide in the medium feeding direction; and at least one medium detection means configured to detect the medium and disposed on a further downstream side than the at least one edge guide in the medium feeding direction and further outside in the medium width direction than at least one edge regulation position for the edge regulation by the at least one edge guide.
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
SYSTEM AND METHOD FOR RADIATION EXPOSURE CONTROL
The present disclosure directs to a system and method for controlling a radiation exposure on a subject. The method includes obtaining exposure instructions including an exposure state of an imaging device. The method also includes determining first components associated with the imaging device and one or more target operations of the first components corresponding to the exposure state. The method further includes generating target operation instructions based on the one or more target operations of the first components. The method still further includes controlling the first components to implement the target operation instructions.
Control apparatus, exposure apparatus, and method of manufacturing article
The present invention provides a control apparatus for performing synchronous control to synchronize driving of a second moving member so as to follow driving of a first moving member, including a feedforward control system that includes a calculator configured to obtain an input/output response of the second moving member and position deviations of the first moving member and the second moving member while driving the first moving member and the second moving member in synchronism with each other, and calculate a feedforward manipulated variable based on the input/output response of the second moving member and the synchronous error between the first moving member and the second moving member obtained from the position deviations of the first moving member and the second moving member.
Film positioning devices and methods
A film positioning device can include a housing, a feed mechanism, and a controller. The housing defines a film receptacle. The feed mechanism is positioned at the film receptacle and configured to move film along the film receptacle. The controller is coupled to the feed mechanism. The controller is configured to control the feed mechanism to move film along the film receptacle. And, based on control of the feed mechanism, the controller is configured to output a camera actuation signal to cause a camera to capture an image of the film.
IMAGE EXPOSURE DEVICE, IMAGE EXPOSURE METHOD, AND PROGRAM
The image exposure device includes an image display device that has a plurality of pixels and radiates light according to a display image represented by the plurality of pixels; a support portion that supports a photosensitive recording medium for recording a recorded image according to the display image in a state in which an exposure surface of the photosensitive recording medium faces the image display device; a louver film that is provided between the image display device and the support portion, and limits an angle of the light radiated from the image display device to the photosensitive recording medium; and a controller that controls the image display device to display the display image in which an image quality of an input image represented by input image data is deteriorated by emphasizing a density difference of a high-frequency component of the input image.