A processing liquid supply system includes: a processing liquid supply apparatus including a first carrier accommodation section that accommodates a carrier, a first bottle accommodation section that accommodates a processing liquid bottle taken out from the carrier, a liquid feeding section that feeds a processing liquid to a substrate processing apparatus from the processing liquid bottle, and a first transfer arm; and a control device configured to control the first transfer arm to take a processing liquid bottle out from the carrier and transfer the processing liquid bottle to the first bottle accommodation section, to transfer the processing liquid bottle from the first bottle accommodation section to the liquid feeding section, and to transfer the consumed processing liquid bottle from the liquid feeding arm and accommodate the consumed processing liquid bottle in the carrier.

A processing liquid supply system includes: a processing liquid supply apparatus including a first carrier accommodation section that accommodates a carrier, a first bottle accommodation section that accommodates a processing liquid bottle taken out from the carrier, a liquid feeding section that feeds a processing liquid to a substrate processing apparatus from the processing liquid bottle, and a first transfer arm; and a control device configured to control the first transfer arm to take a processing liquid bottle out from the carrier and transfer the processing liquid bottle to the first bottle accommodation section, to transfer the processing liquid bottle from the first bottle accommodation section to the liquid feeding section, and to transfer the consumed processing liquid bottle from the liquid feeding arm and accommodate the consumed processing liquid bottle in the carrier.

A method is provided. The method includes detaching an upper shell of a reticle pod from a base. The method further includes while the upper shell is detached from the base, blocking an inlet flow of gas from entering an interior of the reticle pod between the upper shell and the base with a use of a fluid regulating module which is in a sealed state. In the sealed state of the fluid regulating module, an opening of the fluid regulating module is covered with a sealing film. The method also includes removing a reticle positioned on the base to a process tool. In addition, the method includes performing a lithography operation in the process tool with the use of the reticle.

A method is provided. The method includes detaching an upper shell of a reticle pod from a base. The method further includes while the upper shell is detached from the base, blocking an inlet flow of gas from entering an interior of the reticle pod between the upper shell and the base with a use of a fluid regulating module which is in a sealed state. In the sealed state of the fluid regulating module, an opening of the fluid regulating module is covered with a sealing film. The method also includes removing a reticle positioned on the base to a process tool. In addition, the method includes performing a lithography operation in the process tool with the use of the reticle.

The invention discloses a reticle storage device including a top lid, a bottom lid and a soft contact member. The top lid has a ceiling and a cover surrounding the ceiling. The bottom lid has a carrier and a peripheral structure surrounding the carrier. The soft contact member is configured to laterally extend in between the cover and the peripheral structure when the top lid and the bottom lid engage with each other, and to extend from an inside to an outside of the device in order to buffer the contact among the two lids.

The invention discloses a reticle storage device including a top lid, a bottom lid and a soft contact member. The top lid has a ceiling and a cover surrounding the ceiling. The bottom lid has a carrier and a peripheral structure surrounding the carrier. The soft contact member is configured to laterally extend in between the cover and the peripheral structure when the top lid and the bottom lid engage with each other, and to extend from an inside to an outside of the device in order to buffer the contact among the two lids.

A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can include a plurality of reticle retainers configured to contact a side wall of the reticle and limit movement of the reticle in a horizontal direction.

A method for preventing photomask contamination includes generating a first electric field from an electrostatic chuck to attract a charged particle onto the electrostatic chuck, controlling the first electric field to detach the charged particle from the electrostatic chuck, and generating a second electric field below the electrostatic chuck to attract the charged particle.

A method for preventing photomask contamination includes generating a first electric field from an electrostatic chuck to attract a charged particle onto the electrostatic chuck, controlling the first electric field to detach the charged particle from the electrostatic chuck, and generating a second electric field below the electrostatic chuck to attract the charged particle.

Apparatus and methods for automatically handling die carriers are disclosed. In one example, a disclosed apparatus includes: at least one load port each configured for loading a die carrier operable to hold a plurality of dies; and an interface tool coupled to the at least one load port and a semiconductor processing unit. The interface tool comprises: a first robotic arm configured for transporting the die carrier from the at least one load port to the interface tool, and a second robotic arm configured for transporting the die carrier from the interface tool to the semiconductor processing unit for processing at least one die in the die carrier.