A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.

A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.

A reticle enclosure includes a base including a first surface, a cover including a second surface and coupled to the base with the first surface facing the second surface. The base and the cover form an internal space that includes a reticle. The reticle enclosure includes restraining mechanisms arranged in the internal space and for securing the reticle, and structures disposed adjacent the reticle in the internal space. The structures enclose the reticle at least partially, and limit passage of contaminants between the internal space and an external environment of the reticle enclosure. The structures include barriers disposed on the first and second surfaces. In other examples, a padding is installed in gaps between the barriers and the first and second surfaces. In other examples, the structures include wall structures disposed on the first and second surfaces and between the restraining mechanisms.

A reticle enclosure includes a base including a first surface, a cover including a second surface and coupled to the base with the first surface facing the second surface. The base and the cover form an internal space that includes a reticle. The reticle enclosure includes restraining mechanisms arranged in the internal space and for securing the reticle, and structures disposed adjacent the reticle in the internal space. The structures enclose the reticle at least partially, and limit passage of contaminants between the internal space and an external environment of the reticle enclosure. The structures include barriers disposed on the first and second surfaces. In other examples, a padding is installed in gaps between the barriers and the first and second surfaces. In other examples, the structures include wall structures disposed on the first and second surfaces and between the restraining mechanisms.

An apparatus for storing a mask includes a main body comprising a first region and a second region, the first region having a plurality of mask containers, a gas supply pipe having an outer portion outside of the main body, a fan in the first region to propel the gas from the second region to the first region, a filter disposed at a front end and/or a rear end of the fan, a heat exchanger in the second region and configured to exchange heat with the flowing gas, a Peltier element at the outer portion of the gas supply pipe, a first sensor installed in the gas supply pipe upstream of the Peltier element, a second sensor installed in the second region in a lower position to the heat exchanger, and a controller connected to the first and second sensors and the Peltier element.

An apparatus for storing a mask includes a main body comprising a first region and a second region, the first region having a plurality of mask containers, a gas supply pipe having an outer portion outside of the main body, a fan in the first region to propel the gas from the second region to the first region, a filter disposed at a front end and/or a rear end of the fan, a heat exchanger in the second region and configured to exchange heat with the flowing gas, a Peltier element at the outer portion of the gas supply pipe, a first sensor installed in the gas supply pipe upstream of the Peltier element, a second sensor installed in the second region in a lower position to the heat exchanger, and a controller connected to the first and second sensors and the Peltier element.

A method is provided for inspecting a photomask. The photomask is formed with upper and lower faces and four lateral faces. The method includes using a transparent pod to contain the photomask, inserting the transparent pod in an inspecting machine, using a light source to cast light over one of the upper and lower faces of the photomask, using an image sensor to receive at least some of the light from the upper or lower face of the photomask via the transparent pod, and determining whether there is contamination on the upper or lower face of the photomask based on the light received by the image sensor.

A method is provided for inspecting a photomask. The photomask is formed with upper and lower faces and four lateral faces. The method includes using a transparent pod to contain the photomask, inserting the transparent pod in an inspecting machine, using a light source to cast light over one of the upper and lower faces of the photomask, using an image sensor to receive at least some of the light from the upper or lower face of the photomask via the transparent pod, and determining whether there is contamination on the upper or lower face of the photomask based on the light received by the image sensor.

A pod is used to contain a photomask formed with two parallel faces. The pod includes two lens units respectively connected to two portions of the pod corresponding to the faces of the photomask. Each of the lens units includes a lens of a transmittance equal to or larger than 90%. The lens of each of the lens units includes a visible portion equal to or larger than a pattern formed on the photomask. Light is allowed to reach or leave the photomask via the visible portion of the lens of each of the lens units when the photomask is contained in the pod.

A pod is used to contain a photomask formed with two parallel faces. The pod includes two lens units respectively connected to two portions of the pod corresponding to the faces of the photomask. Each of the lens units includes a lens of a transmittance equal to or larger than 90%. The lens of each of the lens units includes a visible portion equal to or larger than a pattern formed on the photomask. Light is allowed to reach or leave the photomask via the visible portion of the lens of each of the lens units when the photomask is contained in the pod.