An exemplary embodiment of the application discloses a photocurable composition for pattern formation includes at least one multifunctional (meth)acrylate; at least one monofunctional (meth)acrylate; a release additive; and a photoinitiator, wherein the release additive includes a fluorine-based monomer and a silicon-based monomer.

A method of producing a relief image or mold from a liquid photopolymer resin, said method comprising the steps of: a) placing an image film onto an exposure glass; b) placing a cover film over the image film and drawing a vacuum c) placing substrate material on a bottom glass d) casting a liquid photopolymer resin layer onto the substrate material; d) laminating a flexible polyester sheet onto a backside of the liquid photopolymer resin layer as the liquid photopolymer resin layer is being cast onto the substrate material; and e) exposing the liquid photopolymer resin layer through the image film to selectively crosslink and cure the photopolymerizable resin layer and form a cured relief image, wherein said depth of the cured relief image is less than the height of the cast liquid photopolymerizable resin.

Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.

The method makes it possible to produce a decorated element for a timepiece or piece of jewelry. This decorated element may be, for example, a watch dial. The method includes the steps of taking a base substrate, and micromachining on said base substrate a mold or decorative partitions in a programmed pattern, and filling the mold or the decorative partitions with at least one filler material to obtain the decorated element. The filler material may be an epoxy resin and the mold or the partitions are obtained by melting and solidifying a solder paste or powder.

A method for manufacturing a phase mask and a lens-less camera module comprises the steps of: obtaining a replica mold on which an inverted phase shift pattern is formed in which a phase shift pattern of a master phase mask spaced apart from an image sensor is inverted; calculating a thickness of a phase mask disposed on the image sensor replacing the master phase mask; arranging a photocurable material for implementing the phase mask on the image sensor to a calculated thickness, placing the replica mold on an upper surface of the photocurable material, and then curing the photocurable material; and removing the replica mold from the top of the phase mask, so that the focal distance change or parallel movement does not occur depending on the position of the phase mask.

In an example, a monopolar electrosurgical electrode includes an electrosurgical substrate including an electrically conductive material extending in an axial direction from a proximal end to a distal end. The electrosurgical substrate includes an electrosurgical blade. The electrosurgical blade includes (i) a first lateral surface, (ii) a second lateral surface opposite the first lateral surface, (iii) a first major surface extending between the first lateral surface and the second lateral surface on a first side of the electrosurgical blade, and (iv) a second major surface extending between the first lateral surface and the second lateral surface on a second side of the electrosurgical blade that is opposite the first side. The monopolar electrosurgical electrode also includes a first electrode sensor embedded between a plurality of electrical insulation layers on the first major surface of the electrosurgical blade.

A structure stamp has a flexible stamp which has a microstructured or nanostructured stamp surface for embossing of an embossing structure which corresponds to the stamp surface on an embossing surface, and a frame for clamping the stamp. Moreover, the invention relates to a device for embossing an embossing pattern on an embossing surface with the following features: a stamp receiver for accommodating and moving a structure stamp, an embossing material receiver for accommodating and placing an embossing material opposite the structure stamp, and an embossing element drive for moving an embossing element along the structure stamp.

A method for pattern transfer to a silicone-based microstructure device comprises the steps of molding a silicone-based negative replica from a lithography patterned master mold. An epoxy resin-based master mold is molded from the silicone-based replica. A surface of the epoxy resin-based master mold is coated with a layer of Cr and then with a layer of Au on the CR layer to facilitate demolding of a silicone-based material. The silicone-based microstructure device is then molded from the coated epoxy resin-based master mold, wherein the silicone-based microstructure device has a dimensional pattern that substantially corresponds to the dimensional pattern of the lithography patterned master mold.

A digital roller mold manufacturing system for manufacture of exterior characteristic structures on a roller mold depends on an illuminator for generation and projection of a light source on a Digital Mirror Device (DMD) chip in which micro-mirrors are rotated a controllable angle for defining the light source as an optical image and projecting the optical image on first micro-lenses at which digital light energy is transformed from the optical image and transmitted to first optical fibers, second optical fibers via couplers, and second micro-lenses. Furthermore, the second micro-lenses focus the digital light energy as light spots which are received by a photo-resist layer externally covered on the roller for development of patterns with exterior characteristic structures on the roller mold because a control unit regulates rotations of the roller and horizontal shifts of second micro-lenses.

A diffractive security device is disclosed including at least a first diffractive structure defined in a carrier layer. The first diffractive structure is an on-axis diffractive zone plate structure of a continuously curved surface configured such that when the device is illuminated by on-axis light a first diffraction pattern generated by the first diffractive structure can be viewed from at least a first side of the device at substantially all viewing angles, the first diffraction pattern exhibiting a reference point or reference line relative to which other features of the first diffraction pattern appear to move when the viewing angle is changed.