Patent classifications
G03F7/12
Deposition mask, method of manufacturing deposition mask device, and method of manufacturing deposition mask
A deposition mask has a central axis extending in a first direction, arranged at a central position in a second direction orthogonal to the first direction. Spaced apart point P1 and Q1 are provided on one side of the central axis, and spaced apart points Q1 and Q2 are provided on another side of the central axis. When a dimension from point P1 to point Q1 is X1, a dimension from point P2 to a point Q2 is X2, and a design value is α.sub.x, the deposition mask satisfies the following.
Photosensitive stencils and methods
A photosensitive stencil includes a porous stencil carrier that can be a sheet of woven material with crisscrossing filaments. The stencil carrier is coated with a photopolymer emulsion that is water based to form a stencil blank. In use, a light mask is disposed atop the stencil blank. The light mask can be contained on a sheet of paper or a transparent film. Alternatively the stencil blank is fed through an inkjet printer and the light mask is printed directly onto the stencil blank using common inks. The stencil blank is then exposed to light for a few minutes, which cross-links the photopolymer emulsion in unmasked regions. After exposure, the stencil blank is developed by being washed out with water. The water removes emulsion and adhesive, where present, within areas that were masked by the light mask, revealing open or open regions through which ink or paint can be applied.
Photosensitive stencils and methods
A photosensitive stencil includes a porous stencil carrier that can be a sheet of woven material with crisscrossing filaments. The stencil carrier is coated with a photopolymer emulsion that is water based to form a stencil blank. In use, a light mask is disposed atop the stencil blank. The light mask can be contained on a sheet of paper or a transparent film. Alternatively the stencil blank is fed through an inkjet printer and the light mask is printed directly onto the stencil blank using common inks. The stencil blank is then exposed to light for a few minutes, which cross-links the photopolymer emulsion in unmasked regions. After exposure, the stencil blank is developed by being washed out with water. The water removes emulsion and adhesive, where present, within areas that were masked by the light mask, revealing open or open regions through which ink or paint can be applied.
MASK ASSEMBLY, MANUFACTURING DEVICE AND MANUFACTURING METHOD THEREOF
The present disclosure discloses a manufacturing device of mask assembly including at least one mask, comprising a first stretching mechanism configured to clamp the edges of the mask in a first direction and stretch the mask in a second direction and a second stretching mechanism configured to clamp the edges of the mask in the second direction and stretch the mask in the first direction, wherein the first direction being perpendicular to the second direction. The disclosure also relates to a method of manufacturing a mask assembly and a mask assembly.
APPARATUS FOR SECURING PRINTING SCREEN FRAME
An apparatus for securing a printing screen frame is configured so that, when a piston rod moves backward due to the supply of air pressure, tensile force applied to a support frame of a printing screen unit by a coupling protrusion of a tension member is released and the printing screen unit can be replaced, and, when the piston rod moves forward as an elastic spring extends due to the stop of the supply of the air pressure, the coupling protrusion of the tension member is caught on the support frame of the printing screen unit and applies pressure thereto due to elastic force so as to tension the printing screen, and then reverse pressure can be applied thereto by using air pressure, as needed.
APPARATUS FOR SECURING PRINTING SCREEN FRAME
An apparatus for securing a printing screen frame is configured so that, when a piston rod moves backward due to the supply of air pressure, tensile force applied to a support frame of a printing screen unit by a coupling protrusion of a tension member is released and the printing screen unit can be replaced, and, when the piston rod moves forward as an elastic spring extends due to the stop of the supply of the air pressure, the coupling protrusion of the tension member is caught on the support frame of the printing screen unit and applies pressure thereto due to elastic force so as to tension the printing screen, and then reverse pressure can be applied thereto by using air pressure, as needed.
Process and apparatus for automatic measurement of density of photopolymer printing plates
A method and apparatus for measurement of density of a photosensitive printing plate (130) having a mask (132) embodying image information corresponding to an image to be printed. A density measurement system includes a first radiation source (112) spaced apart from and adjacent the plate and configured to emit radiation having a first wavelength or range of wavelengths toward the plate. A densitometer (110) spaced apart from and adjacent the plate in a fixed relationship relative to the first radiation source receives and measures an amount of the first radiation transmitted through or reflected by the plate and the mask during relative movement between the plate and the density measurement system. The densitometer readings are processed to provide an output correlating to quality of the mask. The density measurement system may be coupled to an exposure system (120,122,124) for curing the plate.
Process and apparatus for automatic measurement of density of photopolymer printing plates
A method and apparatus for measurement of density of a photosensitive printing plate (130) having a mask (132) embodying image information corresponding to an image to be printed. A density measurement system includes a first radiation source (112) spaced apart from and adjacent the plate and configured to emit radiation having a first wavelength or range of wavelengths toward the plate. A densitometer (110) spaced apart from and adjacent the plate in a fixed relationship relative to the first radiation source receives and measures an amount of the first radiation transmitted through or reflected by the plate and the mask during relative movement between the plate and the density measurement system. The densitometer readings are processed to provide an output correlating to quality of the mask. The density measurement system may be coupled to an exposure system (120,122,124) for curing the plate.
Method for generative production of relief printing plates by monomer diffusion through an integral mask layer
The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.
Method for generative production of relief printing plates by monomer diffusion through an integral mask layer
The invention relates to a method for generative production of relief printing plates, wherein a support with a polymeric substrate layer and a laser-ablatable mask layer is provided, the polymeric substrate layer containing a first binder. A mask with openings corresponding to pixels is produced by imagewise laser ablation of the mask layer. A liquid containing a reactive monomer is then applied over the surface of the mask-covered polymeric substrate layer, and the liquid or the reactive monomer diffuses through the openings of the mask into the polymeric substrate layer for a defined exposure time so as to form a relief. The excess liquid or the excess monomer and optionally the mask are removed from the surface, and the resulting relief is fixed by crosslinking.