A mask for thin film deposition of a display apparatus having both end portions coupleable to a frame in a state of tension in a lengthwise direction thereof, the mask including: a first portion having a first thickness and a plurality of pattern holes through which a deposition material may pass; a second portion comprising a welding portion having a second thickness configured to be coupled to a frame; and a third portion connecting the first portion and the third portion, wherein the first thickness is less than the second thickness, and the third portion includes an inclined surface connecting the first portion and the second portion.

The present disclosure in some embodiments provides a mask plate, including: a metal mask plate body provided with a plurality of first openings; and an insulation film arranged on the metal mask plate body and provided with a plurality of second openings. An orthogonal projection of at least one second opening in the plurality of second openings onto the metal mask plate body falls within the corresponding first opening or first openings.

The present disclosure in some embodiments provides a mask plate, including: a metal mask plate body provided with a plurality of first openings; and an insulation film arranged on the metal mask plate body and provided with a plurality of second openings. An orthogonal projection of at least one second opening in the plurality of second openings onto the metal mask plate body falls within the corresponding first opening or first openings.

The present invention provides a method of making a hydrophobic coating on a curved surface shell and an endoscope. The method forms the hydrophobic coating on the curved surface shell through the following steps. A nanoimprint elastic template is provided, and a nanoimprint structure is formed on the nanoimprint elastic template. A curved surface shell is provided, and a nanoimprint adhesive layer is arranged on the curved surface shell. A side where the nanoimprint structure is located in the nanoimprint elastic template and the nanoimprint adhesive layer are bonded together, and the nanoimprint structure is printed on the nanoimprint adhesive layer, and the nanoimprint adhesive layer is cured.

The present invention provides a method of making a hydrophobic coating on a curved surface shell and an endoscope. The method forms the hydrophobic coating on the curved surface shell through the following steps. A nanoimprint elastic template is provided, and a nanoimprint structure is formed on the nanoimprint elastic template. A curved surface shell is provided, and a nanoimprint adhesive layer is arranged on the curved surface shell. A side where the nanoimprint structure is located in the nanoimprint elastic template and the nanoimprint adhesive layer are bonded together, and the nanoimprint structure is printed on the nanoimprint adhesive layer, and the nanoimprint adhesive layer is cured.

A mask and a fabrication method thereof are provided. The mask includes: a frame, which includes a hollow portion and a border surrounding the hollow portion; an opening plate, which is provided on the frame and includes an opening and a body surrounding the opening, the opening corresponding to the hollow portion, and the body being connected with the border; and a pattern plate, which is provided on the opening plate and includes a pattern portion and a non-pattern portion positioned in a periphery of the pattern portion, the pattern portion corresponding to the opening, the non-pattern portion being connected with the body of the opening plate, and the non-pattern portion and the frame being separated from each other at a position of the border.

A method of manufacturing a mask includes attaching a first mask base substrate and a second mask base substrate to opposite sides of an adhesive layer, forming a photoresist layer on the first and second mask base substrates, exposing and developing the photoresist layer to remove the photoresist layer on effective area at centers of surfaces of the first and second mask base substrates such that the first photoresist layer remains on non-effective areas at edges of surfaces of the first mask base substrate and the second mask base substrate, etching the effective area to form a stepped groove on the first and second mask base substrates, separating the first and second mask base substrates from the adhesive layer, and forming a pattern hole in the effective area of first and second mask base substrates, each with the first stepped groove thereon.

A method of manufacturing a mask includes attaching a first mask base substrate and a second mask base substrate to opposite sides of an adhesive layer, forming a photoresist layer on the first and second mask base substrates, exposing and developing the photoresist layer to remove the photoresist layer on effective area at centers of surfaces of the first and second mask base substrates such that the first photoresist layer remains on non-effective areas at edges of surfaces of the first mask base substrate and the second mask base substrate, etching the effective area to form a stepped groove on the first and second mask base substrates, separating the first and second mask base substrates from the adhesive layer, and forming a pattern hole in the effective area of first and second mask base substrates, each with the first stepped groove thereon.

A system for manufacturing a membrane filter is provided. The system includes a radiation source operative to emit radiation that contacts discrete portions of a filter substrate so as to facilitate the formation of openings within the filter substrate, and a collimator disposed between the filter substrate and the radiation source and operative to restrict some of the radiation from contacting the filter substrate.

A system for manufacturing a membrane filter is provided. The system includes a radiation source operative to emit radiation that contacts discrete portions of a filter substrate so as to facilitate the formation of openings within the filter substrate, and a collimator disposed between the filter substrate and the radiation source and operative to restrict some of the radiation from contacting the filter substrate.