A system and method of fabricating a plurality of devices with reduced isolation regions there between, is provided. The method includes obtaining a substrate with a dielectric layer and a resist layer stacked thereupon. The resist layer has a sensitivity to a radiant energy and has a first exposure time. The method also includes identifying a plurality of device locations on the substrate corresponding to the plurality of devices. The plurality of device locations are separated from one another by a plurality of sub-lithographic isolation regions such that the plurality of devices is electrically insulated from one another. The method includes fabricating the plurality of isolation regions by partially exposing the resist layer to the radiant energy a plurality of times, removing fully exposed portions of the resist layer, and creating sub-lithographic isolation regions by depositing a dielectric material in the openings in the substrate.

A digital masking system includes a supporting structure for supporting a material, and a pattern imaging apparatus. The pattern imaging apparatus includes a light source device, multiple imaging devices that convert light from the light source device into a plurality of light beams each representing an image, and a combiner that combines the light beams into a single light beam which is projected toward a material.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the bow-tie and C-aperture are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

Disclosed is an LM guide assembling method using half division, and a computer readable recording medium having a program for executing the same. The method includes: disposing an LM rail on a base; fastening a first hole and a (2.sup.n+1)-th hole; installing an angle measuring device; fastening a (2.sup.n-1+1)-th hole at step S130; respectively disposing the LM blocks on the first hole and the (2.sup.n-1+1)-th hole; disposing the auxiliary shelf on the LM blocks; setting an angle of the auxiliary shelf to a zero angle; moving the two LM blocks to be on a (2.sup.n-1+1)-th hole and a (2.sup.n+1)-th hole, and measuring an angle of the auxiliary shelf; calculating a straightness correction amount; and moving a position of the (2.sup.n-1+1)-th hole by the straightness correction amount, and fastening the hole, wherein, the steps are repeated until n becomes 1.

Embodiments related to emissive display device structures having an emissive display element and a metamaterial lens having a plurality of nanoparticles over an emissive surface of the emissive display element to control the angular distribution of light emitted from the emissive display element, displays having such controlled emissive display device structures, systems incorporating such controlled emissive display device structures, and methods for fabricating them are discussed.

A method includes providing a substrate including mandrels of a first material positioned on an underlying layer. Each of the mandrels includes a first sidewall and an opposing second sidewall. The method further includes forming sidewall spacers made of a second material and including a first sidewall spacer abutting each respective first sidewall and a second sidewall spacer abutting each respective second sidewall. The mandrels extend above top surfaces of the sidewall spacers. The method also includes forming first capped sidewall spacers by depositing a third material on the first sidewall spacers without depositing on the second sidewall spacers, forming second capped sidewall spacers by depositing a fourth material on the second sidewall spacers without depositing on the first sidewall spacers, and selectively removing at least one of the first material, the second material, the third material, and the fourth material to uncover an exposed portion of the underlying layer.

A pattern forming apparatus comprising: a rotary drum that includes a cylindrical outer circumferential surface which is curved at a predetermined radius from a predetermined center line, that rotates about the center line in a state in which a part of a sheet substrate is supported in a length direction of the sheet substrate along the outer circumferential surface; a pattern forming part that forms the pattern on the sheet substrate at a first specific position; a scale disk that is fixed to an end portion of the rotary drum in a direction in which the center line extends while being coaxial with the center line and that includes a circular scale; and a first reading mechanism that is arranged to oppose with the scale formed at the outer circumferential surface of the scale disk, that is arranged at substantially same azimuth as an azimuth.

A carrying method of carrying a substrate with a substrate holder, including: holding a part of the substrate located above the substrate holder using holding pads; controlling and driving downward the holding pads holding the substrate so that the substrate is supported on the support surface of the substrate holder, when releasing the hold of an other part of the substrate by a substrate carry-in hand that holds the other part of the substrate located above the substrate holder. Accordingly, the substrate carriage to the substrate holder can be swiftly performed.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the bow-tie and C-aperture are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

According to an exemplary embodiment of the present invention, there are provided an organic treatment solution for patterning chemically amplified resist films, an organic treatment solution containing 1 ppm or less of an alkyl olefin having a carbon number of 22 or less and having a metal element concentration of 5 ppm or less for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn, a pattern formation method, an electronic device manufacturing method, and an electronic device use the same.