G03H2224/04

Method for manufacturing holographic blazed grating
09864113 · 2018-01-09 · ·

A method for fabricating a holographic blazed grating is provided. The method includes: coating a photoresist layer on a substrate; performing lithography on the photoresist layer to form a photoresist grating; performing vertical ion beam etching on the substrate by using the photoresist grating as a mask, to form a homogeneous grating by transferring a pattern of the photoresist grating onto the substrate; cleaning the substrate to remove remaining photoresist; performing tilted Ar ion beam scanning etching on the substrate by using the homogeneous grating as a mask, and etching different portions of the substrate by utilizing a obscuring effect of the homogeneous grating mask on the ion beam, to form a triangular groove shape of the blazed grating; and cleaning the substrate to obtain the holographic blazed grating.

DIFFRACTION SHEET AND METHOD FOR MANUFACTURING THE SAME, THREE-DIMENSIONAL DISPLAY DEVICE, LIGHT BEAM REPRODUCTION DEVICE, THREE-DIMENSIONAL SPATIAL DISPLAY SYSTEM, LIGHT BEAM REPRODUCTION METHOD, AND PROGRAM
20240411066 · 2024-12-12 · ·

A three-dimensional display device including a diffraction sheet including a transparent substrate, and a diffraction layer having a first diffraction pattern formed in a first array pattern and a second diffraction pattern formed in a second array pattern on the transparent substrate, the diffraction sheet measuring 10 inches or more in diagonal; one of a liquid crystal device having a plurality of pixels and a color filter having a plurality of types of color filters; and a light source. The first diffraction pattern and the second diffraction pattern are overlapped with the pixels or the color filters in a direction normal to the diffraction sheet with an amount of displacement being 1/10 or less of a pitch of the pixels or the color filters.

Bifocal electron microscope
12216068 · 2025-02-04 · ·

Methods for using a single electron microscope system for investigating a sample with twin electron beams having different focal lengths include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the first electron beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image.

Out-of-plane computer-generated multicolor waveguide holography
12265358 · 2025-04-01 ·

Various examples of out-of-plane multicolor waveguide holography systems, methods of manufacture, and methods of use are described herein. In some examples, a multicolor waveguide holography system includes a planar waveguide to convey optical radiation between a grating coupler and a metasurface hologram. The grating coupler may be configured to couple out-of-plane optical radiation of three different color incident at three different angles into the planar waveguide. The combined multicolor optical radiation may be conveyed by the waveguide to the metasurface hologram. The metasurface hologram may diffractively decouple the three colors of optical radiation for off-plane propagation to form a multicolor holographic image in free space.

BIFOCAL ELECTRON MICROSCOPE
20250155387 · 2025-05-15 · ·

Methods for using a single electron microscope system for investigating a sample with twin electron beams having different focal lengths include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the first electron beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image.

Diffraction sheet and method for manufacturing the same, three-dimensional display device, light beam reproduction device, three-dimensional spatial display system, light beam reproduction method, and program
12392939 · 2025-08-19 · ·

A three-dimensional display device including a diffraction sheet including a transparent substrate, and a diffraction layer having a first diffraction pattern formed in a first array pattern and a second diffraction pattern formed in a second array pattern on the transparent substrate, the diffraction sheet measuring 10 inches or more in diagonal; one of a liquid crystal device having a plurality of pixels and a color filter having a plurality of types of color filters; and a light source. The first diffraction pattern and the second diffraction pattern are overlapped with the pixels or the color filters in a direction normal to the diffraction sheet with an amount of displacement being 1/10 or less of a pitch of the pixels or the color filters.

CORRECTION OF ABERRATIONS IN IN-LINE ELECTRON HOLOGRAPHY
20250371687 · 2025-12-04 ·

Embodiments herein relate to a process for electron holography image aberration reduction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a propagating component that reduces hologram aberration of an electron hologram (EH) image by modifying of a pair of sequenced parameters of an array upon which the EH image is constructed, resulting in a modified array, and a generating component that generates a propagated EH image using a propagator comprising the modified array.

Correction of aberrations in in-line electron holography
12632943 · 2026-05-19 · ·

Embodiments herein relate to a process for electron holography image aberration reduction. A system can comprise a memory that stores, and a processor that executes, computer executable components. The computer executable components can comprise a propagating component that reduces hologram aberration of an electron hologram (EH) image by modifying of a pair of sequenced parameters of an array upon which the EH image is constructed, resulting in a modified array, and a generating component that generates a propagated EH image using a propagator comprising the modified array.