Concepts and technologies disclosed herein are directed to automated control loop grading and data labeling (“ACLGDL”). According to one aspect disclosed herein, an ACLGDL system analyzes results of an execution, by a control loop system, of a control loop. The ACLGDL system can grade the results. The ACLGDL system also can instruct, based at least in part upon the grade of the results of the execution, the control loop system to collect additional data. The ACLGDL system can label the additional data for use by an output system. The ACLGDL system can establish plurality of policies including a grading-analysis policy, a grading-results policy, a labeling-collection policy, a labeling policy, a publishing policy, and a notification policy. The ACLGDL system can publish the data labeled in accordance with the labeling policy based, at least in part, upon the publishing policy. The ACLGDL system can notify the output system based, at least in part, upon the notification policy.

Various embodiments of the teachings herein include a closed-loop and open-loop control device without integrated facility or with reduced integrated facility for operating and/or monitoring. The device may include: an attachment apparatus for attaching an external operating device; and a communication connection to receive user input from an input unit of the external operating device. The communication connection is used to provide information to an output unit of the external operating device.

Various embodiments of the teachings herein include a closed-loop and open-loop control device without integrated facility or with reduced integrated facility for operating and/or monitoring. The device may include: an attachment apparatus for attaching an external operating device; and a communication connection to receive user input from an input unit of the external operating device. The communication connection is used to provide information to an output unit of the external operating device.

An electronic device is disclosed. The electronic device according to one embodiment comprises: a display; and a processor functionally connected with the display, wherein the processor can determine a timeline for a plurality of cooking processes, in which at least one cooking appliance is used, by using recipe information, link the determined timeline with the at least one cooking appliance so as to output the same on the display, update the timeline so as to respond to a changed setting value when the setting value of the at least one cooling appliance is changed, and output the updated timeline on the display. Additional various embodiments identified through the specification are possible.

System and methods for processing a substrate using a reactor with multiple heating zones and control of said heating zones using a common terminal shared between two power supplies are provided. The reactor includes a heater assembly for supporting the substrate and a showerhead for supplying process gases into the reactor. An inner heater and an outer heater are integrated in the heater assembly. An inner power supply has a positive terminal connected to a first end of the inner heater and a negative terminal is connected to a second end of the inner heater that is coupled to a common terminal. An outer power supply has a positive terminal connected to a first end of the outer heater and a negative terminal connected to a second end of the outer heater that is coupled to the common terminal. A common-terminal heater module is configured to receive a measured temperature that is proximate to the inner heater. A desired temperature setting is received and a servo control law is processed to identify a direct control setting of an inner voltage of the inner power supply and an open-loop control setting of an outer voltage for the outer power supply. The outer voltage is defined as a ratio of the inner voltage.

System and methods for processing a substrate using a reactor with multiple heating zones and control of said heating zones using a common terminal shared between two power supplies are provided. The reactor includes a heater assembly for supporting the substrate and a showerhead for supplying process gases into the reactor. An inner heater and an outer heater are integrated in the heater assembly. An inner power supply has a positive terminal connected to a first end of the inner heater and a negative terminal is connected to a second end of the inner heater that is coupled to a common terminal. An outer power supply has a positive terminal connected to a first end of the outer heater and a negative terminal connected to a second end of the outer heater that is coupled to the common terminal. A common-terminal heater module is configured to receive a measured temperature that is proximate to the inner heater. A desired temperature setting is received and a servo control law is processed to identify a direct control setting of an inner voltage of the inner power supply and an open-loop control setting of an outer voltage for the outer power supply. The outer voltage is defined as a ratio of the inner voltage.

System and methods for processing a substrate using a reactor with multiple heating zones and control of said heating zones using a common terminal shared between two power supplies are provided. The reactor includes a heater assembly for supporting the substrate and a showerhead for supplying process gases into the reactor. An inner heater and an outer heater are integrated in the heater assembly. An inner power supply has a positive terminal connected to a first end of the inner heater and a negative terminal is connected to a second end of the inner heater that is coupled to a common terminal. An outer power supply has a positive terminal connected to a first end of the outer heater and a negative terminal connected to a second end of the outer heater that is coupled to the common terminal. A common-terminal heater module is configured to receive a measured temperature that is proximate to the inner heater. A desired temperature setting is received and a servo control law is processed to identify a direct control setting of an inner voltage of the inner power supply and an open-loop control setting of an outer voltage for the outer power supply. The outer voltage is defined as a ratio of the inner voltage.

System and methods for processing a substrate using a reactor with multiple heating zones and control of said heating zones using a common terminal shared between two power supplies are provided. The reactor includes a heater assembly for supporting the substrate and a showerhead for supplying process gases into the reactor. An inner heater and an outer heater are integrated in the heater assembly. An inner power supply has a positive terminal connected to a first end of the inner heater and a negative terminal is connected to a second end of the inner heater that is coupled to a common terminal. An outer power supply has a positive terminal connected to a first end of the outer heater and a negative terminal connected to a second end of the outer heater that is coupled to the common terminal. A common-terminal heater module is configured to receive a measured temperature that is proximate to the inner heater. A desired temperature setting is received and a servo control law is processed to identify a direct control setting of an inner voltage of the inner power supply and an open-loop control setting of an outer voltage for the outer power supply. The outer voltage is defined as a ratio of the inner voltage.

An example method includes receiving data representing a target rotational position of an output shaft of a brushless motor configured to control a rotational position of the output shaft with continuous resolution, determining a plurality of control signals via an algorithm configured for open-loop control of the rotational position of the output shaft, and providing the plurality of control signals to respective input terminals of the brushless motor to cause the brushless motor to rotate the output shaft to the target rotational position. An example system includes a brushless motor comprising an output shaft, and a control module configured to provide a plurality of control signals to respective input terminals of the brushless motor via an algorithm configured for open-loop control of a rotational position of the output shaft. The system is configured to control the rotational position of the output shaft with continuous resolution.

An example method includes receiving data representing a target rotational position of an output shaft of a brushless motor configured to control a rotational position of the output shaft with continuous resolution, determining a plurality of control signals via an algorithm configured for open-loop control of the rotational position of the output shaft, and providing the plurality of control signals to respective input terminals of the brushless motor to cause the brushless motor to rotate the output shaft to the target rotational position. An example system includes a brushless motor comprising an output shaft, and a control module configured to provide a plurality of control signals to respective input terminals of the brushless motor via an algorithm configured for open-loop control of a rotational position of the output shaft. The system is configured to control the rotational position of the output shaft with continuous resolution.