A vaporization device includes a cartridge having a reservoir that holds a vaporizable material, a heating element, and a wicking element that can draw the vaporizable material to the heating element to be vaporized. The wicking element can include two ends in contact with the reservoir. The cartridge can include an airflow control feature for controlling airflow in the cartridge.

A pressure equalization structure is provided. The pressure equalization structure includes a vehicle component comprising an internal cavity having a first volume, and a first passageway coupled to the internal cavity, and an equalization structure for equalizing air pressure in the internal cavity with ambient pressure. The equalization structure includes a first end coupled to the first passageway, a second end exposed to the ambient pressure, and a second passageway between the first end and the second end, the second passageway having a second volume. The equalization structure has an installed orientation in which the first end is arranged above the second end.

A pressure equalization structure is provided. The pressure equalization structure includes a vehicle component comprising an internal cavity having a first volume, and a first passageway coupled to the internal cavity, and an equalization structure for equalizing air pressure in the internal cavity with ambient pressure. The equalization structure includes a first end coupled to the first passageway, a second end exposed to the ambient pressure, and a second passageway between the first end and the second end, the second passageway having a second volume. The equalization structure has an installed orientation in which the first end is arranged above the second end.

An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

A pressure regulator includes a downstream body delimiting a low pressure chamber; an upstream body delimiting a high pressure chamber and carrying an expansion seat; a movable piston having an inner channel having an upper end forming a discharging seat and a lower end opening onto an intermediate chamber connected to a leakage circuit; a tubular valve rod passing through the inner channel of the piston and an inner channel of the upstream body, having an upper end forming a discharging valve and a lower end forming a regulating flap suitable for bearing on the expansion seat; a first biasing member compressed between the piston and the upstream body by biasing the piston towards the downstream body; and a second biasing member compressed between the piston and a plate secured to the valve rod, biasing the rod in the direction of pressing the discharging valve against the discharging seat.

An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

An apparatus for controlling precursor flow. The apparatus may include a processor; and a memory unit coupled to the processor, including a flux control routine. The flux control routine may be operative on the processor to monitor the precursor flow and may include a flux calculation processor to determine a precursor flux value based upon a change in detected signal intensity received from a cell of a gas delivery system to deliver a precursor.

A gas regulator includes a valve chamber body that houses two valves of the regulator. Valve elements that move to open and close the two valves are received via a same opening into the valve chamber body, which is closed by a plug. The plug can define a first valve seat as well as a piercing element used to pierce a compressed gas cylinder. A retainer can hold a gasket at a valve seat as well as provide a bore or other support for a valve element and valve element spring.

Methods of using vapor cells may involve providing a vapor cell including a body defining a cavity within the body. At least a portion of at least one surface of the vapor cell within the cavity may include at least one pore having an average dimension of about 500 microns or less, as measured in a direction parallel to the at least one surface. A vapor pressure of a subject material within the cavity may be controlled utilizing the at least one pore by inducing an exposed surface of a subject material in a liquid state within the at least one pore to have a shape different than a shape the exposed surface of the subject material in a liquid state would have on a flat, nonporous surface.