A pressure control device 20 includes a pressure control valve 25, a flow resistance 23 provided downstream of the pressure control valve, for restricting a gas flow, a first pressure sensor 21 for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor 22 for measuring a gas pressure downstream of the flow resistance, and an arithmetic control circuit 26 connected to the first pressure sensor and the second pressure sensor. The pressure control device is configured to control the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculate the flow rate of the gas downstream of the flow resistance based on the output of the first pressure sensor and the output of the second pressure sensor.

A pressure control device 20 includes a pressure control valve 25, a flow resistance 23 provided downstream of the pressure control valve, for restricting a gas flow, a first pressure sensor 21 for measuring a gas pressure between the pressure control valve and the flow resistance, a second pressure sensor 22 for measuring a gas pressure downstream of the flow resistance, and an arithmetic control circuit 26 connected to the first pressure sensor and the second pressure sensor. The pressure control device is configured to control the gas pressure downstream of the flow resistance by adjusting an opening degree of the pressure control valve based on an output of the second pressure sensor regardless of an output of the first pressure sensor control, and calculate the flow rate of the gas downstream of the flow resistance based on the output of the first pressure sensor and the output of the second pressure sensor.

Provided is a concentration control module that improve responsiveness of concentration control of a vaporization system, and is used in a vaporization system. The concentration control module includes a concentration measuring part configured to measure a concentration of a source gas; a valve provided in a lead-out pipe configured to lead out the source gas from the tank; a pressure target value calculating part configured to calculate a pressure target value inside the tank by using a concentration target value of the source gas, and a concentration measured value of the concentration measuring part; a delay filter configured to generate a pressure control value by applying a predetermined time delay to the pressure target value obtained by the pressure target value calculating part; and a valve control part configured to feedback-control the valve by using a deviation between the pressure control value obtained by the delay filter, and a pressure inside the tank.

A system for precision liquid delivery includes a gas reservoir having a known volume. The system has a tightly load-coupled pneumatic driver (a “TLCP driver”) that is configured to receive input power to cause the TLCP driver to move gas into the gas reservoir to produce a gas drive pressure. A valve is configured to couple the gas reservoir with a fluid reservoir having an unknown volume. The valve is further configured to selectively isolate or pneumatically couple pressures in the gas reservoir and the fluid reservoir. A gas-fluid interface couples pressure in the fluid reservoir to pressure in a fluid path. The fluid path is configured so that the fluid drive pressure driving the liquid in the fluid path is substantially the same as the fluid reservoir pressure. The system also has a pressure sensor configured to detect pressure in the gas reservoir and/or the fluid reservoir.

Implementations described herein relate to pressure control for vacuum chuck substrate supports. In one implementation, a process chamber defines a process volume and a vacuum chuck support is disposed within the process volume. A pressure controller is disposed on a fluid flow path upstream from the vacuum chuck and a flow restrictor is disposed on the fluid flow path downstream from the vacuum chuck. Each of the pressure controller and flow restrictor are in fluid communication with a control volume of the vacuum chuck.

Systems, methods, and computer-readable media for enhancing the reliability of a pneumatically driven surgical tool by providing a redundant, backup pneumatic circuit for supplying the surgical tool with pneumatic pressure at a normal pressure.

There is provided an air pressure system for controlling an air compressor in real time in accordance with the actual usage of compressed air by a plurality of terminals. Furthermore, in case pressure losses change abruptly, unwanted electric power is prevented from being consumed by a stable operation free of response delays on the basis of a predicted model that assesses time lags of volume responses. There is provided an air pressure system for supplying compressed air discharged from an air compressor through an air tank and a piping system to a plurality of terminals that consume the compressed air, including a compressor pressure sensor for measuring the pressure of compressed air discharged from the air compressor, a plurality of terminal pressure sensors for measuring the pressures of compressed air supplied respectively to the terminals, a flow rate difference calculating device for calculating deviation information on the basis of a capacity of the air tank, information on the piping system, the pressure of compressed air discharged from the air compressor, and the pressures of compressed air supplied respectively to the terminals, and a control device for controlling operation of the air compressor on the basis of the deviation information.

Provided herein are systems and methods for generating gas and delivering the gas at multiple output pressures. The system includes a plurality of gas generators and a plurality of applications, each application having a different header pressure. A plurality of header valves directs the gas flow to the plurality of applications such that energy loss is minimized.

In view of the problems of complex downhole conditions, low control precision of bottomhole pressure, low one-time success rate of well-killing and the like during a high-temperature and high-pressure deep well-killing operation, a well-killing operation wellbore flowing model is established according to measured data during throttled well-killing. The fluid distribution and flowing states in a wellbore annulus are analyzed in real time, and during a measured standpipe pressure deviation design, a pressure control value is calculated accurately in consideration of the effects of a pressure wave propagation speed and a back pressure application delay, and a throttle valve is automatically adjusted and automatically controlled to actuate.

A heating, ventilation, and air conditioning (“HVAC”) system includes an evaporator coil and a compressor fluidly coupled to the evaporator coil via a suction line. A condenser coil is fluidly coupled to the compressor via a discharge line and fluidly coupled to a metering device via a liquid line. A charge compensator is fluidly coupled to the liquid line via a connection line. A charge compensator re-heat valve is disposed in the connection line.