An on-line control and reaction process for pH adjustment and a control device for automatically adjusting pH value are provided. The process includes mixing a first enhancer and a second enhancer, optionally after diluting the first enhancer and/or the second enhancer with water, to form a mixture, setting a base pH value (δ1) and a target pH value (δ2), and adding pH adjuster into the mixture via a pH control unit and mixing to obtain a product with the target pH value. The pH control unit adjusts the adding of the pH adjuster by measuring or inputting certain parameters.

An on-line control and reaction process for pH adjustment and a control device for automatically adjusting pH value are provided. The process includes mixing a first enhancer and a second enhancer, optionally after diluting the first enhancer and/or the second enhancer with water, to form a mixture, setting a base pH value (δ1) and a target pH value (δ2), and adding pH adjuster into the mixture via a pH control unit and mixing to obtain a product with the target pH value. The pH control unit adjusts the adding of the pH adjuster by measuring or inputting certain parameters.

A determination method for determining a pattern of a mold is disclosed. The pattern of the mold is used in imprint processing of forming a pattern on imprint material by performing the steps of pressing the imprint material on a substrate against the pattern of the mold in an atmosphere containing condensable gas to be liquefied due to compression, curing the imprint material, and releasing the mold from the imprint material. A processor calculates a shrinkage amount of the pattern on the imprint material. The pattern on the imprint material shrinks by desorbing condensate liquid, which is produced through liquefaction of the condensable gas between the imprint material and the pattern of the mold in the pressing step and which is dissolved in the imprint material, from the imprint material after completion of the pressing step.

A determination method for determining a pattern of a mold is disclosed. The pattern of the mold is used in imprint processing of forming a pattern on imprint material by performing the steps of pressing the imprint material on a substrate against the pattern of the mold in an atmosphere containing condensable gas to be liquefied due to compression, curing the imprint material, and releasing the mold from the imprint material. A processor calculates a shrinkage amount of the pattern on the imprint material. The pattern on the imprint material shrinks by desorbing condensate liquid, which is produced through liquefaction of the condensable gas between the imprint material and the pattern of the mold in the pressing step and which is dissolved in the imprint material, from the imprint material after completion of the pressing step.

The present invention describes methods, systems, and apparatuses for controlled delivery of wellbore fluids including analysis and treatment within the methods, systems, and apparatuses themselves.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

The invention relates to a method for setting a cell concentration and/or a particle concentration in a dispensing device by means of which a liquid sample can be discharged, wherein the cell concentration and/or the particle concentration is ascertained in one region of the dispensing device, and the cell concentration and/or particle concentration that has been ascertained is compared with a target value, and a force exerted on one cell and/or one particle is adjusted based on the result of the comparison.

The invention relates to a method for adjusting concrete rheology requiring only that load size and target rheology value be selected initially rather than requiring inputs into and consultation of a lookup table of parameters such as water and hydration levels, mix components, temperature, humidity, aggregate components, and others. Dosage of particular rheology-modifying agent or combination of rheology-modifying agents is calculated based on a percentage of a nominal dose calculated with reference to a nominal dose response (“NDR”) curve or profile. The NDR profile is based on a correlation between a rheology value (e.g., slump, slump flow, yield stress) and the rheology-modifying agent(s) dose required to change rheology value by one unit (e.g., slump change from 2 to 3 inches) such that exemplary methods can employ corrective dosing based on the NDR and the measured deviation by the system.

The invention relates to a method for adjusting concrete rheology requiring only that load size and target rheology value be selected initially rather than requiring inputs into and consultation of a lookup table of parameters such as water and hydration levels, mix components, temperature, humidity, aggregate components, and others. Dosage of particular rheology-modifying agent or combination of rheology-modifying agents is calculated based on a percentage of a nominal dose calculated with reference to a nominal dose response (“NDR”) curve or profile. The NDR profile is based on a correlation between a rheology value (e.g., slump, slump flow, yield stress) and the rheology-modifying agent(s) dose required to change rheology value by one unit (e.g., slump change from 2 to 3 inches) such that exemplary methods can employ corrective dosing based on the NDR and the measured deviation by the system.