A chemical control system for an aquatic application is disclosed. The control system includes an enclosure having a graphic overlay and a reference chart disposed on a front cover thereof and a sensor in communication with the enclosure and designed to detect a level of a first chemical in the water of the aquatic application. A pump receives a signal to dispense at least one chemical into the aquatic application in response to feedback from the sensor to effectuate a change in the chemical composition of the aquatic application.

A chemical control system for an aquatic application is disclosed. The control system includes an enclosure having a graphic overlay and a reference chart disposed on a front cover thereof and a sensor in communication with the enclosure and designed to detect a level of a first chemical in the water of the aquatic application. A pump receives a signal to dispense at least one chemical into the aquatic application in response to feedback from the sensor to effectuate a change in the chemical composition of the aquatic application.

The invention relates to a comparison unit (130) configured for determining if a first pH measuring device of a first tank (104; 106) is affected by a pH-measuring problem, the comparison unit being configured for: receiving a first CO2 concentration and a first pH value, the first CO2 concentration being a CO2 concentration of a first gas volume above a medium in a first tank, the first CO2 concentration and the first pH value being measured at a first time when the medium in the first tank is in pH-CO2 equilibrium state with the first gas volume and before said equilibrium state is modified by the metabolism of a cell culture in the first tank, the first pH value being a measured value provided by a first pH measuring device operatively coupled to the first tank (102); receiving a second CO2 concentration and a second pH value, the second CO2 concentration being a CO2 concentration of a second gas volume above a medium in a second tank, the second CO2 concentration and the second pH value being measured at a second time when the medium in the second tank is in pH-CO2 equilibrium state with the second gas volume and before said equilibrium state is modified by the metabolism of a cell culture, the second pH value being a measured value provided by a second pH measuring device; comparing the first and second pH values and CO2 concentrations for determining if comparing (206), by the comparison unit, the first and second pH values and comparing the first and second CO2 concentrations for determining if the first pH measuring device is affected by the pH-measuring problem.

The invention relates to a comparison unit (130) configured for determining if a first pH measuring device of a first tank (104; 106) is affected by a pH-measuring problem, the comparison unit being configured for: receiving a first CO2 concentration and a first pH value, the first CO2 concentration being a CO2 concentration of a first gas volume above a medium in a first tank, the first CO2 concentration and the first pH value being measured at a first time when the medium in the first tank is in pH-CO2 equilibrium state with the first gas volume and before said equilibrium state is modified by the metabolism of a cell culture in the first tank, the first pH value being a measured value provided by a first pH measuring device operatively coupled to the first tank (102); receiving a second CO2 concentration and a second pH value, the second CO2 concentration being a CO2 concentration of a second gas volume above a medium in a second tank, the second CO2 concentration and the second pH value being measured at a second time when the medium in the second tank is in pH-CO2 equilibrium state with the second gas volume and before said equilibrium state is modified by the metabolism of a cell culture, the second pH value being a measured value provided by a second pH measuring device; comparing the first and second pH values and CO2 concentrations for determining if comparing (206), by the comparison unit, the first and second pH values and comparing the first and second CO2 concentrations for determining if the first pH measuring device is affected by the pH-measuring problem.

This in-line active and reverse calculating mass balance blending system can maintain a chemical at desired control points, such as with respect to concentration, temperature, and/or pressure, while the output flow rate is changing dynamically to a point of use. A blending unit is configured to receive and blend at least two species and deliver a mixture at selected concentrations to points of use. A controller can be configured to determine a mass balance to maintain the concentrations in the mixture using information from metrology systems and a flow in an output to the at least one point of use. The controller also can be configured to maintain a concentration in the mixture within a concentration range by controlling flow rates to the blending unit.

The present invention relates to the preparation of liquid mixtures, and more particularly to the preparation of a liquid mixture, such as a buffer, wherein the conductivity of the liquid mixture is measured and the pH indirectly determined if the buffer concentration is known. Another object of the present invention is to provide a method of preparing a liquid mixture with a predetermined pH value by using conductivity as feedback control parameter.

The present invention relates to the preparation of liquid mixtures, and more particularly to the preparation of a liquid mixture, such as a buffer, wherein the conductivity of the liquid mixture is measured and the pH indirectly determined if the buffer concentration is known. Another object of the present invention is to provide a method of preparing a liquid mixture with a predetermined pH value by using conductivity as feedback control parameter.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.

Methods, systems, and devices for freeze point suppression cycle control are provided in accordance with various embodiments. For example, some embodiments include a method of freeze point suppression cycle control. The method may include flowing a liquid to a first sensor; the liquid may include a mixture of a melted solid and a freeze point suppressant. The method may include determining an indicator value of a freeze point suppressant property of the liquid utilizing the first sensor. The method may include controlling a flow of the liquid to a separator utilizing a flow controller based on at least the determined indicator value of the freeze point suppressant property of the liquid; the separator may form a concentrated freeze point suppressant from the liquid. Freeze point suppression cycle control systems are also provided.