A method is provided for processing code for a circuit design for an integrated circuit using a computer system. The method includes receiving at least a portion of the code for the circuit design for the integrated circuit, wherein the portion of the code comprises an error or has incomplete constraints, making an assumption about the error and the missing constraints using a computer aid design tool, and generating a revised circuit design for the integrated circuit with the error corrected and any missing constraints added based on the assumption and based on the code using the computer aided design tool and a library of components for circuit designs.

A method of generating a layout diagram of an IC device includes assigning a leakage constraint to a first schematic net of the IC device and determining a violation of the leakage constraint based on a dummy gate region. The IC layout diagram includes the dummy gate region between a first component of the first schematic net and a second component of a second schematic net of the IC device. The method includes modifying the IC layout diagram in response to the leakage constraint violation, and generating a layout file based on the modified IC layout diagrams.

In some examples, design parameter data for an object can be received based on user input. A set of design criteria for the object can be received based on the design parameter data. A search of a learned design virtual reality (VR) database can be implemented to identify a set of candidate designs for the object based on the set of design criteria. The learned design VR database can include a plurality of previously determined designs for the object. Each candidate design for the object can be simulated in a simulation environment based on a learned design simulation database and optimization criteria to identify at least one new design for the object. A ranked design list can be generated ranking each candidate design and the at least one new design for the object based on ranking criteria.

Pathways between reference locations in a physical system are generated based on a layout table. Nodes and edges of the directed graph are associated with cell locations of the layout table. The cell locations define features of the reference locations. Parameters of the nodes and edges are defined based on descriptors recalled from the cells associated with the nodes and edges. The nodes and edges are configured based on the descriptors. Path data regarding potential pathways is generated based on the defined nodes and edges.

Methods and apparatus for vaporizing liquid into the surrounding environment, including directing liquid from a liquid source to a vaporization port where the vaporization port has lateral dimensions varying from 10 um to 300 um, applying heat to the liquid in the vaporization port with an at least one heating element located in thermal communication to the vaporization port, and releasing vaporized liquid from the vaporization port into the surrounding environment so that fluid is transported through the depth of the structure.

A computer-implemented method of designing at least a portion of an electronic circuit schematic is described herein. The method comprises receiving requirements for an electronic circuit or at least a portion of an electronic circuit, creating a set of variables and constraints based on the requirements for the electronic circuit, wherein the constraints limit the possible value that may be assigned to the variables, assigning values to the variables using a solver such that the values of the variables satisfy the constraints, and outputting at least a portion of a designed electronic circuit schematic or circuit schematic specification that meets the requirements for the electronic circuit based on the assigned values of the variables.

A method and a computing apparatus for allocating space in a building are provided. The method includes: receiving a first input that includes information that relates to a plurality of persons that intend to occupy the building; receiving a second input that includes information that relates to building specifications; receiving a third input that includes information that relates to constraints that are mandatory and preferences that are not mandatory; and determining, based on each of the first input, the second input, and the third input, an allocation of each person to a corresponding space within the building and a respective schedule for each person to occupy the corresponding space. The determination of the allocation and the respective schedule may be effected by applying an artificial intelligence (AI) algorithm that is configured to satisfy all of the mandatory constraints and to optimize a satisfaction of the preferences.

Pattern centric process control is disclosed. A layout of a semiconductor chip is decomposed into a plurality of intended circuit layout patterns. For the plurality of intended circuit layout patterns, a corresponding plurality of sets of fabrication risk assessments corresponding to respective ones of a plurality of sources is determined. Determining a set of fabrication risk assessments for an intended circuit layout pattern comprises determining fabrication risk assessments based at least in part on: simulation of the intended circuit layout pattern, statistical analysis of the intended circuit layout pattern, and evaluation of empirical data associated with a printed circuit layout pattern. A scoring formula is applied based at least in part on the sets of fabrication risk assessments to obtain a plurality of overall fabrication risk assessments for respective ones of the plurality of intended circuit layout patterns. The plurality of intended circuit layout patterns is ranked based on their fabrication risk assessments, the corresponding overall fabrication risk assessments, or both. At least a portion of ranking information is outputted to facilitate influence or control over the semiconductor fabrication process.

A dynamic optimization method for procurement specifications of BEF raw materials includes: obtaining finished product data; obtaining an initial feasible raw material size set; mapping the initial feasible raw material size set in length and width directions to obtain a complete feasible raw material size set; filtering an unreasonable raw material size out of the complete feasible raw material size set to obtain a final feasible raw material size set; and determining whether a scale of the final feasible raw material size set is larger than a threshold, if not, building and solving an integer programming model, and outputting results; and if yes, batchwise processing the final feasible raw material size set to obtain multiple subsets, and building an integer programming model for each subset, and solving the integer programming model, and outputting results. A dynamic optimization system of BEF is further provided.

A system and method generates a compensation circuit element for an optical circuit design by receiving an optical circuit design. The optical circuit design includes optical circuit elements and channels optically connecting the optical circuit elements. Further, a first compensation length for a first channel of the channels is determined based on a first measured length parameter of the first channel and a first design length parameter associated with the first channel. A compensation circuit element is determined based on the first compensation length. An updated optical circuit design is determined based on the compensation circuit element.