A method of designing a semiconductor device and system for designing a semiconductor device are provided. The method of designing a semiconductor device includes providing a standard cell layout which includes an active region and a dummy region; determining a first fin pitch between a first active fin and a second active fin in the active region and a second fin pitch between a first dummy fin and a second dummy fin in the dummy region; placing the first and second active fins in the active region and the first and second dummy fins in the dummy region using the first and second fin pitches; and verifying the standard cell layout.

A method for modifying an integrated circuit layout design includes providing an initial multiple-patterned circuit layout design comprising a first pattern exposure and a second pattern exposure; modifying the initial multiple-patterned circuit layout design by providing a subresolution assist feature to the first pattern exposure; determining whether the presence of any overlapping areas between the subresolution assist feature of the first pattern exposure and the second pattern exposure; and further modifying the initial multiple-patterned circuit layout design by: maintaining the size of any portion of the subresolution assist feature in the overlapping areas; and shrinking the size of any portion of the subresolution assist feature that is not in the overlapping areas.

A method of handling integrated circuit dies with defects is provided. After forming a plurality of dies on one or more silicon wafers, test equipment may be used to identify defects on the dies and to create corresponding defect maps. The defect maps can be combined to form an aggregate defect map. Circuit design tools may create keep-out zones from the aggregate defect map and run learning experiments on each die, while respecting the keep-out zones, to compute design metrics. The circuit design tools may further create larger keep-out zones and run additional learning experiments on each die while respecting the larger keep-out zones to compute additional design metrics. The dies can be binned into different Stock Keeping Units (SKUs) based on one or more of the computed design metrics. Circuit design tools automatically respect the keep-out regions for these dies to program them correctly in the field.

A SEB resistance evaluation method includes: disposing an excitation source within a model of a semiconductor device; and determining an energy of the excitation source at which the semiconductor device exhibits thermal runaway, while varying a voltage applied to the model of the semiconductor device and the energy of the excitation source.

A Register Transfer Level (RTL) representation is recovered from a netlist representing an integrated circuit (IC). The netlist is converted to a graph comprising nodes belonging to a set of node types and edges connecting the nodes. The set of node types includes an instance node type representing an electronic component and a wire node type representing signal transfer between components. The graph is converted to a standardized graph by replacing subgraphs of the graph with standardized subgraphs. An RTL representation of the standardized graph is generated by operations including building signal declarations in a hardware description language (HDL) from the wire nodes of the standardized graph and building signal assignments in the HDL from instance nodes of the standardized graph.

Methods, apparatus, systems and articles of manufacture are disclosed to simulate metastability for circuit design verification. An example apparatus includes an input handler to receive circuit design data indicative of a circuit design, a circuit modeler to generate a simulation model based on the circuit design data, a simulator to simulate operation of the circuit design based on the simulation model, a metastability injector to insert metastability logic into the simulation model during the simulation, and a metastability controller to control the metastability logic during the simulation.

Variation-aware delay fault testing suitable for carbon nanotube field-effect transistor circuits can be accomplished using an electronic design automation tool that performs long path selection by generating random variation scenarios, wherein a random variation scenario (RVS) is an instance of an input netlist where values for a set of process parameters for each gate are chosen from a set of values for each process parameter of the set of process parameters for that gate, the set of values being sampled from a distribution of that particular process parameter for that gate and includes a nominal value for that particular process parameter; calculating a total delay through a path for each RVS; and selecting at least two paths having highest total delays for each fault site under random variations of the RVSs. Delay test patterns can then be generated for the selected paths.

Methods, apparatus, systems and articles of manufacture are disclosed to simulate metastability for circuit design verification. An example apparatus includes an input handler to receive circuit design data indicative of a circuit design, a circuit modeler to generate a simulation model based on the circuit design data, a simulator to simulate operation of the circuit design based on the simulation model, a metastability injector to insert metastability logic into the simulation model during the simulation, and a metastability controller to control the metastability logic during the simulation.

One embodiment provides a method and a system for generating test vectors for testing a computational system. During operation, the system obtains a design of the computational system, the design comprising an original system. The system generates a design of a fault-augmented system block by adding a plurality of fault-emulating subsystems to the original system; generates a design of an equivalence-checking system based on the original system and the fault-augmented system block; encodes the design of the equivalence-checking system into a logic formula, with variables within the logic formula comprising inputs and outputs of the original system and inputs and outputs of the fault-augmented system block; and solves the logic formula to obtain a test vector used for testing at least one fault in the computational system.

A method includes generating a first bitmap for a cell. The first bitmap is indicative of mapping constraints of the cell. The method also includes generating a second bitmap for a PSC filler cell. The second bitmap is indicative of the mapping constraints of the PSC filler cell. The method also includes a bitwise logical operation between a portion of the first bitmap and a respective portion of the second bitmap and determining a compatibility between the cell and the PSC filler cell based on at least a result of the bitwise logical operation.