A computer memory system includes an electro-optical chip, an electrical fanout chip electrically connected to an electrical interface of the electro-optical chip, and at least one dual in-line memory module (DIMM) slot electrically connected to the electrical fanout chip. A photonic interface of the electro-optical chip is optically connected to an optical link. The electro-optical chip includes at least one optical macro that converts outgoing electrical data signals into outgoing optical data signals for transmission through the optical link. The optical macro also converts incoming optical data signals from the optical link into incoming electrical data signals and transmits the incoming electrical data signals to the electrical fanout chip. The electrical fanout chip directs bi-directional electrical data communication between the electro-optical chip and a dynamic random access memory (DRAM) DIMM corresponding to the at least one DIMM slot.

A computer memory system includes an electro-optical chip, an electrical fanout chip electrically connected to an electrical interface of the electro-optical chip, and at least one dual in-line memory module (DIMM) slot electrically connected to the electrical fanout chip. A photonic interface of the electro-optical chip is optically connected to an optical link. The electro-optical chip includes at least one optical macro that converts outgoing electrical data signals into outgoing optical data signals for transmission through the optical link. The optical macro also converts incoming optical data signals from the optical link into incoming electrical data signals and transmits the incoming electrical data signals to the electrical fanout chip. The electrical fanout chip directs bi-directional electrical data communication between the electro-optical chip and a dynamic random access memory (DRAM) DIMM corresponding to the at least one DIMM slot.

A semiconductor storage device according to an embodiment includes a substrate, a first semiconductor chip, and a second semiconductor chip. The first semiconductor chip includes a first surface contacting with the substrate, a second surface on an opposite side to the first surface, and a first pad provided on the second surface. The second semiconductor chip includes a third surface contacting with the second surface, a fourth surface on an opposite side to the third surface, and a cutout portion. The cutout portion is provided at a corner portion where the third surface crosses a lateral surface between the third surface and the fourth surface. The cutout portion overlaps with at least a part of the first pad as viewed from above the fourth surface.

A semiconductor storage device according to an embodiment includes a substrate, a first semiconductor chip, and a second semiconductor chip. The first semiconductor chip includes a first surface contacting with the substrate, a second surface on an opposite side to the first surface, and a first pad provided on the second surface. The second semiconductor chip includes a third surface contacting with the second surface, a fourth surface on an opposite side to the third surface, and a cutout portion. The cutout portion is provided at a corner portion where the third surface crosses a lateral surface between the third surface and the fourth surface. The cutout portion overlaps with at least a part of the first pad as viewed from above the fourth surface.

A memory circuit includes a pre-charging circuit and a control circuit. The pre-charging circuit includes a first pre-charging unit, a second pre-charging unit, a first power supply terminal, a second power supply terminal, a first control terminal, a second control terminal and a data terminal; the first pre-charging unit is connected with the first power supply terminal, the first control terminal and the data terminal; the second pre-charging unit is connected with the second power supply terminal, the second control terminal and the data terminal. The control circuit is configured to in response to a memory being in a row active state and not performing a reading-writing operation, control, through the second pre-charging unit, the data terminal and the second power supply terminal to be disconnected, and control, through the first pre-charging unit, the data terminal and the first power supply terminal to be disconnected.

A memory circuit includes a pre-charging circuit and a control circuit. The pre-charging circuit includes a first pre-charging unit, a second pre-charging unit, a first power supply terminal, a second power supply terminal, a first control terminal, a second control terminal and a data terminal; the first pre-charging unit is connected with the first power supply terminal, the first control terminal and the data terminal; the second pre-charging unit is connected with the second power supply terminal, the second control terminal and the data terminal. The control circuit is configured to in response to a memory being in a row active state and not performing a reading-writing operation, control, through the second pre-charging unit, the data terminal and the second power supply terminal to be disconnected, and control, through the first pre-charging unit, the data terminal and the first power supply terminal to be disconnected.

Methods, systems, and devices for apparatus for differential memory cells are described. An apparatus may include a pair of memory cells comprising a first memory cell and a second memory cell, a word line coupled with the pair of memory cells and a plate line coupled with the pair of memory cells. The apparatus may further include a first digit line coupled with the first memory cell and a sense amplifier and a second digit line coupled with the second memory cell and the sense amplifier. The apparatus may include a select line configured to couple the first digit line and the second digit line with the sense amplifier.

A method for forming a semiconductor device includes the following operations. A stacked structure is provided, which includes a substrate, and sacrificial layers and semiconductor layers alternately stacked on surface of the substrate. Multiple first grooves and semiconductor pillars extending in first direction are included in the sacrificial layers and the semiconductor layers. Word line pillars are formed in second direction, intersect with the semiconductor pillars and surround the semiconductor pillars. Sources and drains are formed respectively on either side of the semiconductor pillars surrounded by the word line pillars by an epitaxial growth process. Bit lines are formed on a side of the sources or the drains, are connected with same, and extend in third direction. The first, second and third directions are pairwise perpendicular. Capacitors are formed on a side of the sources or the drains where the bit lines are not formed to form a semiconductor device.

Embodiments provide a method for fabricating a semiconductor structure and a structure thereof. The method includes: providing a substrate; forming, on the substrate, semiconductor channels arranged in an array along a first direction and a second direction; forming bit lines extending along the first direction, wherein the bit lines are positioned in the substrate, and each of the bit lines is electrically connected to the semiconductor channels arranged along the first direction; forming word lines extending along the second direction, wherein the word lines wrap part of side surfaces of the semiconductor channels arranged along the second direction, where one of the word lines includes two sub word lines arranged at intervals along the first direction, and the sub word lines cover part of opposite side surfaces of the semiconductor channels along the first direction; and forming isolation structures positioned between adjacent word lines and between adjacent sub word lines.

Embodiments relate to a semiconductor device and a forming method. The semiconductor device includes: a substrate; a memory array positioned on the substrate and at least including memory cells spaced along a first direction, each of the memory cells including a transistor, the transistor including a gate electrode, channel regions distributed on two opposite sides of the gate electrode along a third direction, and a source region and a drain region distributed on two opposite sides of each of the channel regions along a second direction, the first direction and the third direction being directions parallel to a top surface of the substrate, the first direction intersecting with the third direction, and the second direction being a direction perpendicular to the top surface of the substrate; and a word line extending along the first direction and continuously electrically connected to the gate electrodes spaced along the first direction.