The present disclosure describes a patterning process for a strap region in a memory cell for the removal of material between polysilicon lines. The patterning process includes depositing a first hard mask layer in a divot formed on a top portion of a polysilicon layer interposed between a first polysilicon gate structure and a second polysilicon gate; depositing a second hard mask layer on the first hard mask layer. The patterning process also includes performing a first etch to remove the second hard mask layer and a portion of the second hard mask layer from the divot; performing a second etch to remove the second hard mask layer from the divot; and performing a third etch to remove the polysilicon layer not covered by the first and second hard mask layers to form a separation between the first polysilicon gate structure and the second polysilicon structure.

A memory device includes transistors and a memory cell array disposed over and electrically coupled to the transistors. The memory cell array includes word lines, bit line columns, and data storage layers interposed between the word lines and the bit line columns. A first portion of the word lines on odd-numbered tiers of the memory cell array is oriented in a first direction, and a second portion of the word lines on even-numbered tiers of the memory cell array is oriented in a second direction that is angularly offset from the first direction. The bit line columns pass through the odd-numbered tiers and the even-numbered tiers, and each of the bit line columns is encircled by one of the data storage layers. A semiconductor die and a manufacturing method of a semiconductor structure are also provided.

A data storage device includes a memory device and a controller coupled to the memory device. The memory device is arranged in a plurality of logical planes and the controller is configured to write log data and user data to separate planes within the memory device, such that the log data and user data are isolated from each other on separate planes. The controller is configured to read log data from one plane and user data on another plane simultaneously, where the log data and the user data are isolated from each other on separate planes.

A semiconductor device is provided that can include a stack formed of word line layers and insulating layers that are alternatingly stacked over a substrate. A first staircase of a first block can be formed in the stack and extend between first array regions of the first block. A second staircase of a second block can be formed in the stack and extend between second array regions of the second block. The semiconductor device further can have a connection region that is formed in the stack between the first staircase and second staircase.

A semiconductor device is provided that can include a stack formed of word line layers and insulating layers that are alternatingly stacked over a substrate. A first staircase of a first block can be formed in the stack and extend between first array regions of the first block. A second staircase of a second block can be formed in the stack and extend between second array regions of the second block. The semiconductor device further can have a connection region that is formed in the stack between the first staircase and second staircase.

Memory systems having flying bitlines for improved burst mode read operations and related methods are provided. A memory system comprises a memory array including a first set of memory cells coupled to a first inner wordline and a second set of memory cells coupled to a first outer wordline. The memory system includes a control unit configured to generate control signals for simultaneously: asserting a first wordline signal on the first inner wordline coupled to each of a plurality of inner bitlines, and asserting a second wordline signal on the first outer wordline coupled to each of a plurality of outer bitlines, where each of the plurality of outer bitlines includes a first portion configured to fly over or fly under a corresponding inner bitline, and outputting data from each of the first set of memory cells and the second set of memory cells as part of a burst.

Configurations of metal layers of interconnect structures are disclosed herein that can improve memory performance, such as static random-access memory (SRAM) memory performance, and/or logic performance. For example, embodiments herein place bit lines in a metal one (M1) layer, which is a lowest metallization level of an interconnect structure of a memory cell, to minimize bit line capacitance, and configure bit lines as the widest metal lines of the metal one layer to minimize bit line resistance. In some embodiments, the interconnect structure has a double word line structure to reduce word line resistance. In some embodiments, the interconnect structure has a double voltage line structure to reduce voltage line resistance. In some embodiments, jogs are added to a word line and/or a voltage line to reduce its respective resistance. In some embodiments, via shapes of the interconnect structure are configured to reduce resistance of the interconnect structure.

Methods, systems, and devices for a decoding architecture for memory devices are described. Word line plates of a memory array may each include a sheet of conductive material that includes a first portion extending in a first direction within a plane along with multiple fingers extending in a second direction within the plane. Two word line plates in a same plane may be activated via a shared electrode. Memory cells coupled with the two word line plates sharing the electrode, or a subset thereof, may represent a logical page for accessing memory cells. A memory cell may be accessed via a first voltage applied to a word line plate coupled with the memory cell and a second voltage applied to a pillar electrode coupled with the memory cell. Parallel or simultaneous access operations may be performed for two or more memory cells within a same page of memory cells.

A memory device includes: a substrate; a bit line which is vertically oriented from the substrate; a plate line which is vertically oriented from the substrate; and a memory cell provided with a transistor and a capacitor that are positioned in a lateral arrangement between the bit line and the plate line, wherein the transistor includes: an active layer which is laterally oriented to be parallel to the substrate between the bit line and the capacitor; and a line-shaped lower word line and a line-shaped upper word line vertically stacked with the active layer therebetween and oriented to intersect with the active layer.

The present disclosure relates to circuits, systems, and methods of operation for a memory device. In an example, a memory device includes a memory array including a plurality of memory cells, each memory cell having an impedance that varies in accordance with a respective data value stored therein; and a tracking memory cell having an impedance based on a tracking data value stored therein; and a read circuit coupled to the memory array, the read circuit configured to determine an impedance of a selected memory cells with respect to the impedance of the tracking memory cell; read a data value stored within the selected memory cell based upon a voltage change of a signal node voltage corresponding to the impedance of the selected memory cell.