A liquid crystal device includes: an element substrate; a counter substrate disposed opposite to the element substrate; a sealing material disposed between the element substrate and the counter substrate; and a liquid crystal layer disposed on an inner side of the sealing material and containing liquid crystal. The element substrate includes an alignment film configured to align the liquid crystal and an ion-adsorbing first adsorption film disposed in contact with the sealing material. The alignment film includes a first vapor-deposited film and a second vapor-deposited film disposed between the first vapor-deposited film and the liquid crystal layer. The second vapor-deposited film and the first adsorption film include a column of which a long axis direction intersects a thickness direction of the liquid crystal layer. A thickness of the first adsorption film is thicker than a thickness of the second vapor-deposited film.

An antiscatter grid for radiological imaging, the grid formed as a stack of two or more sheets having a flexible substrate, wherein each sheet has spaced-apart opaque cavities, each opaque cavity containing a radio-opaque material. The opaque cavities define a plurality of channels that extend through the sheets to allow ionizing radiation to pass therethrough. Magnets disposed along the sheets couple each sheet to one or more neighboring sheets of the stack.

An antiscatter grid for radiological imaging, the grid formed as a stack of two or more sheets having a flexible substrate, wherein each sheet has spaced-apart opaque cavities, each opaque cavity containing a radio-opaque material. The opaque cavities define a plurality of channels that extend through the sheets to allow ionizing radiation to pass therethrough. Magnets disposed along the sheets couple each sheet to one or more neighboring sheets of the stack.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

An optical element for a lithographic apparatus, the optical element including an anchor layer selected to support a top layer having self-terminating growth in an operating lithographic apparatus or plasma containing environment. Also described is a method of manufacturing an optical element, the method including depositing a top layer on anchor layer via exposure to plasma, preferably electromagnetically induced plasma. Lithographic apparatuses including such optical elements are also described.

A structure according to an embodiment is disposed between an X-ray emitter and a subject, and includes a scatterer configured to scatter X-rays emitted from the X-ray emitter, and a transmitter configured to transmit X-rays at a predetermined angle, among the X-rays scattered by the scatterer.

A structure according to an embodiment is disposed between an X-ray emitter and a subject, and includes a scatterer configured to scatter X-rays emitted from the X-ray emitter, and a transmitter configured to transmit X-rays at a predetermined angle, among the X-rays scattered by the scatterer.

The present apparatus, system, and method relate to reliably capturing multiple x-ray images for later combination. An exposure shield blocks a portion of the x-rays emitted from a traditional emitter and collimator. The orientation of exposure shield may then be modified to block a second portion of x-rays while ensuring appropriate overlap of the captured images without intentionally moving the emitter or collimator and without the need for a patient to wear protective garb.

The present apparatus, system, and method relate to reliably capturing multiple x-ray images for later combination. An exposure shield blocks a portion of the x-rays emitted from a traditional emitter and collimator. The orientation of exposure shield may then be modified to block a second portion of x-rays while ensuring appropriate overlap of the captured images without intentionally moving the emitter or collimator and without the need for a patient to wear protective garb.